A semiconductor substrate including a gallium arsenide layer is obtained by executing a step of preparing a first substrate having a separating layer constituted of germanium and a gallium arsenide layer on the separating layer, a step of preparing a bonded substrate by bonding the first substrate a
A semiconductor substrate including a gallium arsenide layer is obtained by executing a step of preparing a first substrate having a separating layer constituted of germanium and a gallium arsenide layer on the separating layer, a step of preparing a bonded substrate by bonding the first substrate and a second substrate, and a step of dividing the bonded substrate at a portion of the separating layer.
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The invention claimed is: 1. A method for producing a semiconductor substrate including a gallium arsenide layer, comprising: a step of preparing a first substrate having a separating layer comprising a first porous germanium layer of a first porosity and a second porous germanium layer of a second
The invention claimed is: 1. A method for producing a semiconductor substrate including a gallium arsenide layer, comprising: a step of preparing a first substrate having a separating layer comprising a first porous germanium layer of a first porosity and a second porous germanium layer of a second porosity larger than the first porosity, and a gallium arsenide layer on said separating layer; a step of preparing a bonded substrate by bonding said first substrate and a second substrate; and a step of dividing said bonded substrate at a portion of said separating layer, wherein a germanium layer is provided on said separating layer, and said gallium arsenide layer is formed on said germanium layer provided on said separating layer. 2. A method for producing a semiconductor substrate according to claim 1, wherein said preparation step for said first substrate includes a step of forming said first and second porous germanium layers as said separating layer by anodizing of a substrate constituted of germanium, and forming said gallium arsenide layer on said first and second porous germanium layers. 3. A method for producing a semiconductor substrate according to claim 2, wherein: said preparation step for said first substrate includes a step of forming said gallium arsenide layer by an epitaxial growth. 4. A method for producing a semiconductor substrate according to claim 1, wherein: said preparation step for said first substrate includes a step of forming a compound semiconductor layer on said gallium arsenide layer. 5. A method for producing a semiconductor substrate according to claim 1, wherein: said dividing step includes a step of dividing the portion of said separating layer by a jet stream or a static pressure of a fluid. 6. A method for producing a semiconductor substrate according to claim 1, wherein: said dividing step includes a step of dividing the portion of said separating layer by applying a heat treatment to said bonded substrate. 7. A method for producing a semiconductor substrate according to claim 1, wherein: said dividing step includes a step of dividing the portion of said separating layer by inserting a member into said separating layer. 8. A method for producing a semiconductor substrate according to claim 1, further comprising: after said dividing step, a step of eliminating a part of said separating layer, remaining on said gallium arsenide layer on the second substrate. 9. A method for producing a semiconductor substrate according to claim 1, further comprising: after said dividing step, a step of planarizing the surface of said gallium arsenide layer on the second substrate. 10. A method for producing a semiconductor substrate according to claim 1, further comprising: after said dividing step, a step of eliminating a part of said separating layer, remaining on the first substrate. 11. A method for producing a semiconductor substrate according to claim 1, further comprising: after said dividing step, a step of planarizing a surface of the first substrate and re-using the same in said preparation step of the first substrate. 12. A method for producing a semiconductor substrate according to claim 1, wherein said germanium layer provided on said separating layer is a single crystalline germanium layer. 13. A method for producing a light emitting diode, comprising: a step of preparing a porous germanium layer comprising a first porous germanium layer of a first porosity and a second porous germanium layer of a second porosity larger than the first porosity on a semiconductor substrate constituted of germanium; a step of forming plural semiconductor layers, including a gallium arsenide layer, on said porous germanium layer; a step of forming a light emitting diode area in said semiconductor layers; a step of forming a reflective layer on said light emitting diode area; and a step of separating said semiconductor substrate at said porous germanium layer, wherein a germanium layer is provided on said porous germanium layer, and said gallium arsenide layer is formed on said germanium layer provided on said porous germanium layer. 14. A method for producing a light emitting diode according to claim 13, further comprising: after said separating step, a step of forming an electrode. 15. A method for producing a light emitting diode according to claim 13, further comprising: after said separating step, a step of forming a light emitting window. 16. A method for producing a light emitting diode according to claim 13, wherein said plural semiconductor layers including the gallium arsenide layer are constituted of AlGaAs semiconductors of different Al compositions. 17. A method for producing a light emitting diode according to claim 13, wherein said reflective layer is constituted of a metal layer, which partly serves also as a metal electrode. 18. A method for producing a light emitting diode according to claim 13, wherein an insulation layer is provided between said reflective layer and the semiconductor layers, and an absorbing layer for partially reducing light reflection is provided between said insulation layer and the semiconductor layers. 19. A method for producing a light emitting diode according to claim 13, wherein an electrode at a light emitting side of said light emitting diode is so formed as to surround a light emitting window, and a light absorbing layer is formed on a surface of said electrode in contact with the semiconductor layers. 20. A method for producing a light emitting diode, comprising: a step of preparing a porous germanium layer comprising a first porous germanium layer of a first porosity and a second porous germanium layer of a second porosity larger than the first porosity on a semiconductor substrate constituted of germanium; a step of forming plural semiconductor layers, including a gallium arsenide layer, on said porous germanium layer; a step of forming a metal electrode layer in an uppermost layer of said plural semiconductor layers; a step of adhering a supporting substrate to a surface of said metal layer; a step of separating said semiconductor substrate at said porous germanium layer; and a step of forming a light emitting diode area in said semiconductor layers after the separation, wherein a germanium layer is provided on said porous germanium layer, and said gallium arsenide layer is formed on said germanium layer provided on said porous germanium layer. 21. A method for producing a light emitting diode according to claim 20, wherein said plural semiconductor layers including the gallium arsenide layer are constituted of AlGaAs semiconductors of different Al compositions. 22. A method for producing a light emitting diode according to claim 20, wherein said metal electrode layer has a function of a reflective mirror. 23. A method for producing a light emitting diode according to claim 20, wherein said supporting substrate is transparent to the emitted light, and said metal electrode layer is partially eliminated corresponding to a light emitting area. 24. A method for producing a light emitting diode according to claim 20, wherein an absorbing layer for partially reducing a light reflection is provided between said metal electrode layer and the semiconductor layers. 25. A method for producing a light emitting diode according to claim 13 or 20, wherein said germanium layer provided on said porous germanium layer is a single crystalline germanium layer.
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