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Method of separating a mold from a solidified layer disposed on a substrate 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/31
  • H01L-021/02
  • H01L-021/469
출원번호 UP-0108208 (2005-04-18)
등록번호 US-7635445 (2010-01-08)
발명자 / 주소
  • Choi, Byung Jin
  • Cherala, Anshuman
  • Choi, Yeong jun
  • Meissl, Mario J.
  • Sreenivasan, Sidlgata V.
  • Schumaker, Norman E.
  • Lu, Xiaoming
  • McMackin, Ian M.
  • Babbs, Daniel A.
출원인 / 주소
  • Molecular Imprints, Inc.
대리인 / 주소
    Wood, Laura C.
인용정보 피인용 횟수 : 13  인용 특허 : 24

초록

The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the

대표청구항

What is claimed is: 1. A method of separating a mold, included in a template, from a layer disposed on a substrate, said method comprising: applying a separation force to said template to separate said template from said layer; and facilitating localized deformation in said substrate, wherein facil

이 특허에 인용된 특허 (24)

  1. Stagaman Gregory J. (Dallas TX), Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer.
  2. Akimoto Masami (Kumamoto JPX) Yoshioka Kazutoshi (Kumamoto JPX) Iida Naruaki (Kumamoto JPX), Apparatus for processing wafer-shaped substrates.
  3. Kempf Stefan (Alzenau DEX) Sichmann Eggo (Gelnhausen DEX), Apparatus for the transfer of substrates.
  4. Meissl, Mario J.; Choi, Byung J., Assembly and method for transferring imprint lithography templates.
  5. Garcia Ernest J., Compound floating pivot micromechanisms.
  6. Inoue Takashi,JPX ; Nagano Hiroyuki,JPX ; Ishii Yoshimichi,JPX, Exposure apparatus for transferring a mask pattern onto a substrate.
  7. Sreenivasan, Sidlgata V.; Choi, Byung J.; Colburn, Matthew; Bailey, Todd, High-resolution overlay alignment methods for imprint lithography.
  8. Camarota,Rafael C., Input buffer with selectable threshold and hysteresis option.
  9. Loewenhardt Peter K. ; Hanawa Hiroji ; Gristi Raymond ; Yin Gerald Zheyao ; Ye Yan, Lift pin for dechucking substrates.
  10. Akiyama Nobuyuki (Yokohama JPX) Kembo Yukio (Yokohama JPX) Nakagawa Yasuo (Yokohama JPX) Aiuchi Susumu (Yokohama JPX) Nomoto Mineo (Yokohama JPX), Light exposure device and method.
  11. Mett Richard ; Salimian Siamak, Method and apparatus for minimizing plasma destabilization within a semiconductor wafer processing system.
  12. Joseph A Levert ; Daniel Lynne Towery ; Denis Endisch, Method for integrated circuit planarization.
  13. Choi, Byung J.; Voisin, Ronald D.; Sreenivasan, Sidlgata V.; Watts, Michael P. C.; Willson, C. Grant; Schumaker, Norman E.; Meissl, Mario J., Method for modulating shapes of substrates.
  14. Clark, Lawrence T.; Mozdzen, Thomas J., Output buffer for high and low voltage bus.
  15. Studley David K. (Sunnyvale CA) Keller Ernest (Sunnyvale CA), Perimeter wafer seal.
  16. Viswanath Ram S. ; Martin Philip R., Pickup chuck with an integral heatsink.
  17. Drapkin Oleg,CAX ; Temkine Grigori,CAX, Powerup sequence artificial voltage supply circuit.
  18. Kinoshita Yoshimi (Amagasaki JPX) Kanda Tomoyuki (Amagasaki JPX) Kitano Katsuhisa (Amagasaki JPX) Yoshida Kazuo (Amagasaki JPX) Ohnishi Hiroshi (Amagasaki JPX) Yamanishi Kenichiro (Amagasaki JPX) Sas, Semiconductor producing apparatus comprising wafer vacuum chucking device.
  19. Masuyuki Takashi,JPX ; Ishimaru Katsuaki,JPX, Substrate adjuster, substrate holder and substrate holding method.
  20. Tsukamoto, Izumi; Fujita, Itaru; Nogawa, Hideki; Takabayashi, Yukio, Substrate attracting and holding system for use in exposure apparatus.
  21. Nimmakayala,Pawan Kumar; Sreenivasan,Sidlgata V., Substrate support method.
  22. Howald, Arthur M., System and method for dechucking a workpiece from an electrostatic chuck.
  23. Berman, Michael J.; Barber, Rennie G., System and method for optimizing the electrostatic removal of a workpiece from a chuck.
  24. Ledger Anthony (Newfairfield CT) Power Michael (Newtown CT), Transparent optical chuck incorporating optical monitoring.

이 특허를 인용한 특허 (13)

  1. Babbs, Daniel A.; Choi, Byung-Jin; Cherala, Anshuman, Chucking system for nano-manufacturing.
  2. Sreenivasan, Sidlgata V.; Yang, Shuqiang; Xu, Frank Y.; Singh, Vikramjit, Functional nanoparticles.
  3. Lu, Xiaoming; Schumaker, Philip D., High throughput imprint based on contact line motion tracking control.
  4. Bowen, M. Shane; Gunderson, Kevin L.; Lin, Shengrong; Rogert Bacigalupo, Maria Candelaria; Vijayan, Kandaswamy; Wu, Yir-Shyuan; Venkatesan, Bala Murali; Tsay, James; Beierle, John M.; Berti, Lorenzo; Park, Sang Ryul, Microarray fabrication system and method.
  5. Bowen, M. Shane; Gunderson, Kevin L.; Lin, Shengrong; Rogert Bacigalupo, Maria Candelaria; Vijayan, Kandaswamy; Wu, Yir-Shyuan; Venkatesan, Bala Murali; Tsay, James; Beierle, John M.; Berti, Lorenzo; Park, Sang Ryul, Microarray fabrication system and method.
  6. Singh, Vikramjit; Xu, Frank Y.; Sreenivasan, Sidlgata V., Nanoimprint lithography formation of functional nanoparticles using dual release layers.
  7. Xu, Frank Y.; Sreenivasan, Sidlgata V.; Yang, Shuqiang, Nanoimprint lithography processes for forming nanoparticles.
  8. Lin, Shengrong; Wu, Yir-Shyuan; Gunderson, Kevin; Moon, John A., Patterned flow-cells useful for nucleic acid analysis.
  9. Nguyen, Houng T.; Xu, Ren; Barnes, Michael S., Process for optimization of island to trench ratio in patterned media.
  10. Im, Se-Hyuk; GanapathiSubramanian, Mahadevan; Fletcher, Edward Brian; Khusnatdinov, Niyaz; Schmid, Gerard M.; Meissl, Mario Johannes; Cherala, Anshuman; Xu, Frank Y.; Choi, Byung-Jin; Sreenivasan, Sidlgata V., Safe separation for nano imprinting.
  11. Choi, Byung-Jin; Ganapathisubramanian, Mahadevan, Separation in an imprint lithography process.
  12. Khusnatdinov, Niyaz; Xu, Frank Y.; Meissl, Mario Johannes; Miller, Michael N.; Thompson, Ecron D.; Schmid, Gerard M.; Nimmakayala, Pawan Kumar; Lu, Xiaoming; Choi, Byung-Jin, Strain and kinetics control during separation phase of imprint process.
  13. Resnick, Douglas J.; Meissl, Mario Johannes; Choi, Byung-Jin; Sreenivasan, Sidlgata V., Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template.
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