초록 ▼

A surface inspection of the system applies a first oblique illumination beam and may also apply a second illumination beam to illuminate a surface either sequentially or simultaneously. Radiation reflected or scattered is collected by preferably three collection channels and detected by three corres

A surface inspection of the system applies a first oblique illumination beam and may also apply a second illumination beam to illuminate a surface either sequentially or simultaneously. Radiation reflected or scattered is collected by preferably three collection channels and detected by three corresponding detector arrays, although a different number of channels and detector arrays may be used. One or both illumination beams are focused to a line on the surface to be inspected and each line is imaged onto one or more detector arrays in the up to three or more detection and collection channels. Relative motion is caused between the lines and the surface inspected in a direction perpendicular to the lines, thereby increasing throughput while retaining high resolution and sensitivity. The same detection channels may be employed by detecting scattered or reflected radiation from both illumination beams. Fourier filters may be employed to filter out diffraction at one or more different spatial frequencies.

대표청구항 ▼

What is claimed is: 1. A apparatus for detecting anomalies and/or features of a surface, comprising: a source of pulsed radiation comprising at least one ultraviolet or deep ultraviolet wavelength; first optics focusing the pulsed radiation into a focused beam at an oblique incidence angle to a lin

What is claimed is: 1. A apparatus for detecting anomalies and/or features of a surface, comprising: a source of pulsed radiation comprising at least one ultraviolet or deep ultraviolet wavelength; first optics focusing the pulsed radiation into a focused beam at an oblique incidence angle to a line focused on the surface, said beam and a direction that is through the beam and that is normal to the surface defining an incidence plane of the beam, said line being substantially in the plane of incidence of the beam, said beam comprising pulsed radiation; an array of detectors; and imaging optics imaging said line onto the array of detectors, each detector in the array detecting light from a corresponding portion of the line. 2. The apparatus of claim 1, said pulsed radiation being pulsed at a frequency that exceeds about 10 MHz. 3. The apparatus of claim 1, further comprising second optics focusing a beam of radiation into a second focused beam at a second incidence angle to illuminated area illuminated area on the surface of the sample, said second incidence angle being different from the first incidence angle. 4. The apparatus of claim 1, said illuminated area being in the shape of a rectangle or a line. 5. A method for detecting anomalies and/or features of a surface, comprising: providing pulsed radiation comprising at least one ultraviolet or deep ultraviolet wavelength; focusing the pulsed radiation into a focused beam at an oblique incidence angle to a line focused on the surface, said beam and a direction that is through the beam and that is normal to the surface defining an incidence plane of the beam, said line being substantially in the plane of incidence of the beam, said beam comprising pulsed radiation; and imaging said line onto an array of detectors, each detector in the array detecting light from a corresponding portion of the line. 6. The method of claim 5, said pulsed radiation being pulsed at a frequency that exceeds about 10 MHz. 7. The method of claim 5, further comprising focusing a beam of radiation into a second focused beam at a second incidence angle to illuminated area illuminated area on the surface of the sample, said second incidence angle being different from the first incidence angle. 8. The method of claim 5, said illuminated area being in the shape of a rectangle or a line.