초록 ▼

A method of processing a workpiece in a plasma reactor includes coupling RF power from at least three RF power source of three respective frequencies to plasma in the reactor, setting ion energy distribution shape by selecting a ratio between the power levels of a first pair of the at least three RF

A method of processing a workpiece in a plasma reactor includes coupling RF power from at least three RF power source of three respective frequencies to plasma in the reactor, setting ion energy distribution shape by selecting a ratio between the power levels of a first pair of the at least three RF power sources, and setting ion dissociation and ion density by selecting a ratio between the power levels of a remaining one of the three RF power sources and an applied magnetic field. The three respective frequencies can be an LF frequency, an HF frequency and a VHF frequency, wherein the first pair corresponds to the LF and HF frequencies and the second pair corresponds to the HF and VHF frequencies.

대표청구항 ▼

What is claimed is: 1. A method of processing a workpiece in a plasma reactor, comprising: coupling RE power from three RE power sources of three respective frequencies and a magnetic field to plasma in said reactor, by: (a) applying plasma source power of a VHF frequency of at least 60 MHz from a

What is claimed is: 1. A method of processing a workpiece in a plasma reactor, comprising: coupling RE power from three RE power sources of three respective frequencies and a magnetic field to plasma in said reactor, by: (a) applying plasma source power of a VHF frequency of at least 60 MHz from a first one of said three RE power sources to a ceiling electrode of said plasma reactor; (b) applying plasma bias power of a first bias frequency greater than an ion transit frequency of said plasma and less than said VHF frequency from a second one of said three RE power sources to a workpiece support electrode of said plasma reactor; (c) applying plasma bias power of a second bias frequency less than said ion transit frequency of said plasma from a third one of said three RE power sources to said workpiece support electrode of said plasma reactor; setting ion energy distribution shape by selecting a ratio between the power levels of said second and third ones of said three RF power sources; and setting ion dissociation and ion density by selecting a ratio between the power level of said first one of said three RF power sources and the strength of said magnetic field. 2. The method of claim 1 wherein said VHF frequency is 60 MHz or greater. 3. The method of claim 1 wherein said magnetic field has a frequency on the order of 10 Hz. 4. The method of claim 1 wherein the step of setting said ion energy distribution comprises adjusting the energy difference between a pair of peaks of the ion energy distribution. 5. The method of claim 1 wherein the step of setting said ion energy distribution comprises adjusting the ion population near one of a pair of peaks of the ion energy distribution relative to the other. 6. The method of claim 1 wherein the step of setting said ion energy distribution comprises adjusting the energy of one of a pair of peaks of the ion energy distribution.