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Embodiments of the invention provide an apparatus for generating a precursor gas used in a vapor deposition process system. The apparatus contains a canister or an ampoule for containing a chemical precursor and a splash guard contained within the ampoule. The splash guard is positioned to obstruct

Embodiments of the invention provide an apparatus for generating a precursor gas used in a vapor deposition process system. The apparatus contains a canister or an ampoule for containing a chemical precursor and a splash guard contained within the ampoule. The splash guard is positioned to obstruct the chemical precursor in a liquid state from being bumped or splashed into a gas outlet during the introduction of a carrier gas into the ampoule. The carrier gas is usually directed into the ampoule through a gas inlet and combines with the vaporized chemical precursor to form a precursor gas. The splash guard is also positioned to permit the passage of the precursor gas from the gas outlet. In one example, the gas outlet contains a stem with a tapered tip and the splash guard is positioned at an angle parallel to the plane of the tapered tip.

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The invention claimed is: 1. An apparatus for generating a precursor gas used in a vapor deposition process system, comprising: an ampoule comprising a lid and a body assembly containing a bottom; a gas outlet assembly disposed on the lid and configured to accept a process gas flow from within the

The invention claimed is: 1. An apparatus for generating a precursor gas used in a vapor deposition process system, comprising: an ampoule comprising a lid and a body assembly containing a bottom; a gas outlet assembly disposed on the lid and configured to accept a process gas flow from within the ampoule; and a gas inlet assembly disposed on the lid and configured to accept a carrier gas flow into the ampoule, wherein the gas inlet assembly comprises an inlet stem disposed within the ampoule and having a first stem tip positioned away from the gas outlet assembly and tapered at a first angle within a range from about 5° to about 45°, relative to a horizontal plane extending along the bottom of the ampoule. 2. The apparatus of claim 1, further comprising an outlet stem connected to the gas outlet assembly, disposed within the ampoule, and having a second stem tip tapered at a second angle, relative to a horizontal plane extending along the lid of the ampoule. 3. The apparatus of claim 2, wherein the second angle is within a range from about 0° to about 70°. 4. The apparatus of claim 2, wherein the first and second stem tips are positioned to face substantially away from each other. 5. The apparatus of claim 2, further comprising a splash guard disposed within the ampoule and positioned to obstruct a liquid precursor from entering or substantially entering the gas outlet assembly. 6. The apparatus of claim 5, wherein the splash guard is positioned at a third angle within a range from about 0° to about 70°, relative to the horizontal plane extending along the lid of the ampoule. 7. The apparatus of claim 1, further comprising pentakis(dimethylamino) tantalum precursor within the ampoule. 8. An apparatus for generating a precursor gas used in a vapor deposition process system, comprising: an ampoule comprising a lid and a body assembly containing a bottom; a gas inlet disposed on the ampoule and configured to accept a carrier gas flow into the ampoule; a gas outlet configured to receive a process gas flowing from the ampoule; an outlet stem disposed within the ampoule, connected to the gas outlet, and containing a first stem tip positioned away from the gas inlet and tapered at a first angle, relative to a horizontal plane extending along the lid of the ampoule, wherein the first angle is within a range from about 10° to about 50°; and a splash guard disposed within the ampoule and positioned to obstruct a liquid precursor from entering or substantially entering the first stem tip. 9. The apparatus of claim 8, wherein the splash guard is positioned at a second angle within a range from about 0° to about 70°, relative to the horizontal plane extending along the lid of the ampoule. 10. The apparatus of claim 9, wherein the first angle and the second angle are equal or substantially equal to each other. 11. The apparatus of claim 8, further comprising an inlet stem coupled to the gas inlet, wherein the inlet stem comprises a second stem tip tapered at a third angle, relative to a horizontal plane extending along the bottom of the ampoule. 12. The apparatus of claim 11, wherein the third angle is within a range from about 0° to about 45°. 13. The apparatus of claim 12, wherein the third angle is within a range from about 5° to about 30°. 14. An apparatus for generating a precursor gas used in a vapor deposition process system, comprising: an ampoule comprising a lid and a body assembly containing a bottom; a gas inlet disposed on the ampoule and configured to accept a carrier gas flow into the ampoule, the gas inlet comprising a gas inlet stem disposed within the ampoule and having a first stem tip tapered at a first angle ranging from about 5° to about 30°, relative to a horizontal plane extending along the bottom of the ampoule; and a gas outlet disposed on the lid and configured to accept a process gas flow from the ampoule, the gas outlet comprising a gas outlet stem disposed within the ampoule and having a second stem tip tapered at a second angle ranging from about 10° to about 50°, relative to a horizontal plane extending along the lid of the ampoule, wherein the first and second stem tips are positioned to face substantially away from each other. 15. The apparatus of claim 14, further comprising a splash guard disposed within the ampoule and positioned to obstruct a liquid precursor from entering or substantially entering the second stem tip. 16. The apparatus of claim 15, wherein the splash guard is positioned at a third angle within a range from about 0° to about 70°, relative to the horizontal plane extending along the lid of the ampoule. 17. The apparatus of claim 16, wherein the second angle and the third angle are equal or substantially equal to each other.