[특허]Apparatus including showerhead electrode and heater for plasma processing

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C23C-016/509 C23C-016/505 C23F-001/00 H01L-021/306 C23C-016/06 C23C-016/22
출원번호	UP-0835400 (2004-04-30)
등록번호	US-7712434 (2010-06-03)
발명자 / 주소	Dhindsa, Rajinder Lenz, Eric
출원인 / 주소	Lam Research Corporation
대리인 / 주소	Buchanan Ingersoll & Rooney PC
인용정보	피인용 횟수 : 33 인용 특허 : 46

초록 ▼

A plasma processing apparatus includes a heater in thermal contact with a showerhead electrode, and a temperature controlled top plate in thermal contact with the heater to maintain a desired temperature of the showerhead electrode during semiconductor substrate processing. A gas distribution member

A plasma processing apparatus includes a heater in thermal contact with a showerhead electrode, and a temperature controlled top plate in thermal contact with the heater to maintain a desired temperature of the showerhead electrode during semiconductor substrate processing. A gas distribution member supplies a process gas and radio frequency (RF) power to the showerhead electrode.

대표청구항 ▼

What is claimed is: 1. A showerhead electrode assembly, comprising: a showerhead electrode adapted to be mounted in an interior of a vacuum chamber and supply process gas to a gap in which plasma is generated between the showerhead electrode and a substrate support; a gas distribution member compri

What is claimed is: 1. A showerhead electrode assembly, comprising: a showerhead electrode adapted to be mounted in an interior of a vacuum chamber and supply process gas to a gap in which plasma is generated between the showerhead electrode and a substrate support; a gas distribution member comprising an axially extending hub and a laterally extending metal plate attached to the showerhead electrode, the gas distribution member including a first gas passage which supplies process gas to a central plenum between the showerhead electrode and the metal plate and a second gas passage which supplies process gas to an outer plenum between the showerhead electrode and the metal plate; a thermal path member comprising a plate of electrically insulating material surrounding the hub and attached to the gas distribution member; and a heater comprising a plate of thermally conductive material surrounding the hub and attached to the thermal path member; wherein the heater transmits heat to the showerhead electrode through a thermal path comprising the gas distribution member and the thermal path member. 2. The showerhead electrode assembly of claim 1, wherein the thermal path member comprises an annular plate of a thermally conducting, electrically insulating material. 3. The showerhead electrode assembly of claim 1, wherein the thermal path member comprises a nitride material. 4. The showerhead electrode assembly of claim 1, wherein the thermal path member comprises aluminum nitride or boron nitride. 5. A vacuum chamber comprising the showerhead electrode assembly of claim 1, wherein the hub of the gas distribution member extends into an opening in a temperature controlled top wall of the vacuum chamber and the laterally extending metal plate of the gas distribution member extends completely over the showerhead electrode. 6. The vacuum chamber comprising the showerhead electrode assembly of claim 5, wherein the temperature controlled top wall of the vacuum chamber withdraws heat from the showerhead electrode via a thermal path passing through the heater, the thermal path member, the gas distribution member and the showerhead electrode. 7. The vacuum chamber comprising the showerhead electrode assembly of claim 5, wherein the showerhead electrode is a radio frequency (RF) powered electrode and said gas distribution member distributes RF power from the hub of the gas distribution member to the laterally extending metal plate of the gas distribution member and then to the showerhead electrode. 8. The vacuum chamber comprising the showerhead electrode assembly of claim 7, wherein the gas distribution member contacts 15 to 20% of the cross sectional area on the backside of the showerhead electrode. 9. The showerhead electrode assembly of claim 1, further comprising an annular ground electrode surrounding the showerhead electrode, the ground electrode including an exposed surface facing the gap and an electrical insulator is located between an inner periphery of the ground electrode and an outer periphery of the showerhead electrode. 10. A showerhead electrode assembly, comprising: a showerhead electrode with a lower surface facing a substrate support and an upper surface facing away from the substrate support; a gas distribution member comprising a laterally extending metal plate with a lower surface thereof attached to the upper surface of the showerhead electrode, an upper surface of the laterally extending metal plate facing away from the showerhead electrode, and an axially extending hub protruding from the upper surface of the gas distribution member, the gas distribution member including a first gas passage which supplies process gas to a central plenum between the showerhead electrode and the metal plate and a second gas passage which supplies process gas to an outer plenum between the showerhead electrode and the metal plate; an electrical insulator plate with a lower surface attached to the upper surface of the gas distribution member and surrounding the axially extending hub of the gas distribution member and an upper surface facing away from the gas distribution member; a top wall of a vacuum chamber with a lower surface attached to the upper surface of the electrical insulator plate, wherein the top wall and the electrical insulator plate are in thermal communication with the showerhead electrode; and a gas supply connected to the axially extending hub of the gas distribution member and in gaseous communication with the showerhead electrode through gas passages extending through the gas distribution member. 11. The showerhead electrode assembly of claim 10, further comprising: a heater located between the top wall and the gas distribution member; thermal chokes located on the lower surface of the top wall; contact points located on the lower surface of the gas distribution member and above the showerhead electrode; a backing member located between the upper surface of the showerhead electrode and the lower surface of the gas distribution member, wherein a lower surface of the backing member is in contact with the upper surface of the showerhead electrode; the first and second gas passages being in fluid communication with the central and outer plenums by radially extending passages within the gas distribution member; and contact bolts mechanically fastening portions of the showerhead electrode assembly together. 12. A showerhead electrode assembly, comprising: a showerhead electrode with a lower surface facing a substrate support and an upper surface facing away from the substrate support; a gas distribution member with a lower surface attached to the upper surface of the showerhead electrode, an upper surface facing away from the showerhead electrode, and an axially extending hub protruding from the upper surface of the gas distribution member, the gas distribution member including a first gas passage which supplies process gas to a central plenum between the showerhead electrode and the metal plate and a second gas passage which supplies process gas to an outer plenum between the showerhead electrode and the metal plate; an annular electrical insulator plate with a lower surface attached to the upper surface of the gas distribution member and surrounding the axially extending hub of the gas distribution member and an upper surface facing away from the gas distribution member; a top wall of a vacuum chamber with a lower surface attached to the upper surface of the electrical insulator plate, wherein the top wall and the electrical insulator plate are in thermal communication with the showerhead electrode; a gas supply connected to the axially extending hub of the gas distribution member and in gaseous communication with the showerhead electrode through gas passages extending through the gas distribution member; and a heater plate located between the gas distribution member and the electrical insulator plate, wherein the electrical insulator plate directly contacts the heater plate, the heater plate directly contacts the gas distribution member and the gas distribution member directly contacts the showerhead electrode. 13. The showerhead electrode assembly of claim 12, further comprising: first radially extending passages connected between the first gas passage and axially extending first gas outlets in communication with the central plenum, and second radially extending passages connected between the second gas passage and second axially extending gas outlets in communication with the outer plenum, the first and second gas passages extending axially through the hub.

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