[특허]Exposure apparatus, exposure method, and exposure mask

Exposure apparatus, exposure method, and exposure mask 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G03F-001/00
출원번호	UP-0554993 (2005-06-24)
등록번호	US-7740992 (2010-07-12)
우선권정보	JP-2004-191805(2004-06-29)
국제출원번호	PCT/JP2005/012166 (2005-06-24)
§371/§102 date	20061130 (20061130)
국제공개번호	WO06/001520 (2006-01-05)
발명자 / 주소	Inao, Yasuhisa Kuroda, Ryo Mizutani, Natsuhiko
출원인 / 주소	Canon Kabushiki Kaisha
대리인 / 주소	Fitzpatrick, Cella, Harper & Scinto
인용정보	피인용 횟수 : 2 인용 특허 : 16

초록 ▼

An exposure apparatus to be used with an exposure mask having an elastically deformable holding member and a light blocking film provided on the holding member and being formed with an opening pattern. For exposure, the mask is flexed, to be brought into contact with an object to be exposed. The apparatus includes a distance detecting device for detecting a distance between the exposure mask and the object to be exposed. The distance detecting device is adapted to detect the distance between the exposure mask and the object to be exposed before the exposure mask is flexed. The apparatus also includes a distance controlling device for controlling the distance between the exposure mask before the mask is flexed and the object to be exposed, on the basis of a signal from the distance detecting device.

대표청구항 ▼

The invention claimed is: 1. An exposure method, wherein for exposure, an exposure mask having an elastically deformable holding member and a light blocking film, provided on the holding member and being formed with an opening pattern, is flexed to be brought into contact with an object to be exposed, said method comprising the steps of: detecting a first distance between the exposure mask and the object to be exposed, before the exposure; bringing the exposure mask into contact with the object and detecting a deformation value of the opening pattern of the mask; disengaging the exposure mask from the object and bringing the exposure mask close to the object up to a second distance from the object, so as to compensate for the deformation value; and exposing the object with the exposure mask using light from a light source.

이 특허에 인용된 특허 (16)

Yano,Koji; Kuroda,Ryo; Okamoto,Kohei, Exposure apparatus and method.
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Inoue Takashi,JPX ; Nagano Hiroyuki,JPX ; Ishii Yoshimichi,JPX, Exposure apparatus for transferring a mask pattern onto a substrate.
상세보기
Kuroda Ryo,JPX ; Ikeda Tsutomu,JPX ; Shimada Yasuhiro,JPX, Exposure method and exposure apparatus.
상세보기
Inao, Yasuhisa; Kuroda, Ryo; Yamaguchi, Takako, Exposure method and exposure apparatus using near-field light and exposure mask.
상세보기
Kuroda, Ryo; Shimada, Yasuhiro; Seki, Junichi; Yamaguchi, Takako; Inao, Yasuhisa, Light modulation apparatus and optical switch, movement detecting device and distance measuring device, alignment device and semiconductor aligner, and processes thereof.
상세보기
Kuroda Ryo,JPX ; Ohyama Junji,JPX, Mask for evanescent light exposure, object to be exposed and apparatus using same.
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Imahashi Issei (Yamanashi JPX), Method and apparatus for measuring a gap distance between a mask and a wafer to be used in fabrication of semiconductor.
상세보기
Mizutani,Natsuhiko; Inao,Yasuhisa, Method for making a pattern using near-field light exposure through a photomask.
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Kuroda Ryo (Machida JPX) Miyazaki Toshihiko (Hiratsuka JPX) Sakai Kunihiro (Isehara JPX) Nose Hiroyasu (Zama JPX) Takimoto Kiyoshi (Isehara JPX), Method of detecting positional displacement between mask and wafer, and exposure apparatus adopting the method.
상세보기
Inao,Yasuhisa; Kuroda,Ryo; Mizutani,Natsuhiko, Near-field exposure method.
상세보기
Inao,Yasuhisa; Kuroda,Ryo, Near-field light exposure mask with avoidance of overlap of near-field light, method for manufacturing the same, exposure apparatus and method using near-field light exposure mask, and method for man.
상세보기
Yamaguchi, Takako; Kuroda, Ryo, Pattern forming apparatus and pattern forming method.
상세보기
Yamaguchi,Takako; Kuroda,Ryo, Pattern-forming apparatus using a photomask.
상세보기
Yamaguchi, Takako; Kuroda, Ryo, Pattern-forming method using photomask, and pattern-forming apparatus.
상세보기
Mizutani,Natsuhiko; Inao,Yasuhisa, Photomask for near-field exposure and exposure apparatus including the photomask for making a pattern.
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Chapelle Walter (Southfield MI) Yaniv Zvi (Southfield MI) Baron Yair (Southfield MI), Step and repeat exposure apparatus and method.
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이 특허를 인용한 특허 (2)

Sato, Hidenori; Komine, Nobuhiro, Deflection measuring device and deflection measuring method.
상세보기
Wang, Can; Yu, Jianwei, Exposure apparatus and exposure method.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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Exposure apparatus, exposure method, and exposure mask 원문보기