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In-line electron beam test system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01R-031/302
출원번호 UP-0422164 (2009-04-10)
등록번호 US-7746088 (2010-07-19)
발명자 / 주소
  • Abboud, Fayez E.
  • Krishnaswami, Sriram
  • Johnston, Benjamin M.
  • Nguyen, Hung T.
  • Brunner, Matthias
  • Schmid, Ralf
  • White, John M.
  • Kurita, Shinichi
  • Hunter, James C.
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Patterson & Sheridan, LLP
인용정보 피인용 횟수 : 3  인용 특허 : 105

초록

A method and apparatus for testing a plurality of electronic devices formed on a large area substrate is described. In one embodiment, the apparatus performs a test on the substrate in one linear axis in at least one chamber that is slightly wider than a dimension of the substrate to be tested. Clea

대표청구항

The invention claimed is: 1. An apparatus for testing electronic devices on a large area substrate, comprising: a testing platform having a substrate support disposed thereon; an end effector movably disposed in the substrate support; and one or more testing columns coupled to the testing platform,

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이 특허를 인용한 특허 (3)

  1. Mueller, Bernhard, Apparatus and method for active voltage compensation of electrostatic discharge of a substrate.
  2. Kadyshevitch, Alexander; Kadar, Ofer; Glazer, Arie; Loewinger, Ronen; Gross, Abraham; Toet, Daniel, Electrical inspection of electronic devices using electron-beam induced plasma probes.
  3. Werder, Kurt Stephen; Muray, Lawrence P.; Spallas, James P.; Meisburger, William Daniel, Imaging apparatus having a plurality of movable beam columns, and method of inspecting a plurality of regions of a substrate intended to be substantially identical.
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