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Chucking system for nano-manufacturing 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B29C-059/00
  • G03B-027/64
출원번호 UP-0047428 (2005-01-31)
등록번호 US-7798801 (2010-10-11)
발명자 / 주소
  • Babbs, Daniel A.
  • Choi, Byung-Jin
  • Cherala, Anshuman
출원인 / 주소
  • Molecular Imprints, Inc.
대리인 / 주소
    Robinson, Laura C.
인용정보 피인용 횟수 : 8  인용 특허 : 37

초록

The present invention is directed towards a chucking system, including, inter alia, a body having a surface with a pin extending therefrom having a throughway defined therein, and a land surrounding the protrusions defining a channel between the pin and the land. In a further embodiment, the body co

대표청구항

What is claimed is: 1. A chucking system comprising: a body having a surface with a plurality of pins extending therefrom, defining a plurality of channels therebetween, a subset of said plurality of pins having a throughway defined therein, with said surface having a plurality of apertures formed

이 특허에 인용된 특허 (37)

  1. Stagaman Gregory J. (Dallas TX), Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer.
  2. Mori Tetsuya (Yokohama JPX) Suzuki Akiyoshi (Tokyo JPX), Alignment and exposure method.
  3. Meissl, Mario J.; Choi, Byung J., Assembly and method for transferring imprint lithography templates.
  4. Choi,Byung J.; Voisin,Ronald D.; Sreenivasan,Sidlgata V.; Watts,Michael P. C.; Babbs,Daniel; Meissl,Mario J.; Bailey,Hillman; Schumaker,Norman E., Chucking system for modulating shapes of substrates.
  5. Garcia Ernest J., Compound floating pivot micromechanisms.
  6. Siddall Graham J. (Woodside CA), Deformable chuck driven by piezoelectric means.
  7. Di Milia, Vincent; Maldonado, Juan R.; Speidell, James L.; Warlaumont, John M., Electrostatic or vacuum pinchuck formed with microcircuit lithography.
  8. Scire, Fredric E.; Teague, E. Clayton, Flexure hinge.
  9. Sreenivasan, Sidlgata V.; Choi, Byung J.; Colburn, Matthew; Bailey, Todd, High-resolution overlay alignment methods for imprint lithography.
  10. Aoyama Masaaki (Kanagawa JPX) Kimura Keiichi (Kanagawa JPX), Holding apparatus for holding an article such as a semiconductor wafer.
  11. Hocheng, Hong; Nien, Chin Chung, In-situ monitoring method and system for mold deformation in nanoimprint.
  12. Camarota,Rafael C., Input buffer with selectable threshold and hysteresis option.
  13. Loewenhardt Peter K. ; Hanawa Hiroji ; Gristi Raymond ; Yin Gerald Zheyao ; Ye Yan, Lift pin for dechucking substrates.
  14. Akiyama Nobuyuki (Yokohama JPX) Kembo Yukio (Yokohama JPX) Nakagawa Yasuo (Yokohama JPX) Aiuchi Susumu (Yokohama JPX) Nomoto Mineo (Yokohama JPX), Light exposure device and method.
  15. Maltabes John,DEX ; Charles Alain,DEX ; Mautz Karl,DEX, Lithography chuck having piezoelectric elements, and method.
  16. Mett Richard ; Salimian Siamak, Method and apparatus for minimizing plasma destabilization within a semiconductor wafer processing system.
  17. Dahimene Mahmoud ; Mett Richard R. ; Salimian Siamak, Method and apparatus for supplying a chucking voltage to an electrostatic chuck within a semiconductor wafer processing system.
  18. Mijnheer Andries (Eindhoven), Method and device for manufacturing information carriers.
  19. Choi, Byung J.; Voisin, Ronald D.; Sreenivasan, Sidlgata V.; Watts, Michael P. C.; Willson, C. Grant; Schumaker, Norman E.; Meissl, Mario J., Method for modulating shapes of substrates.
  20. Choi, Byung Jin; Cherala, Anshuman; Babbs, Daniel A., Method of retaining a substrate to a wafer chuck.
  21. Choi, Byung Jin; Cherala, Anshuman; Choi, Yeong jun; Meissl, Mario J.; Sreenivasan, Sidlgata V.; Schumaker, Norman E.; Lu, Xiaoming; McMackin, Ian M.; Babbs, Daniel A., Method of separating a mold from a solidified layer disposed on a substrate.
  22. Meissl, Mario J.; Choi, Byung J.; Babbs, Daniel; Bailey, Hillman L., Method, system and holder for transferring templates during imprint lithography processes.
  23. Clark, Lawrence T.; Mozdzen, Thomas J., Output buffer for high and low voltage bus.
  24. Viswanath Ram S. ; Martin Philip R., Pickup chuck with an integral heatsink.
  25. Drapkin Oleg,CAX ; Temkine Grigori,CAX, Powerup sequence artificial voltage supply circuit.
  26. Yamamoto,Masayuki; Kaneshima,Yasuji, Releasing method and releasing apparatus of work having adhesive tape.
  27. Olgado, Donald J. K.; Donoso, Bernardo; Lerner, Alexander, Rotary vacuum-chuck with venturi formed at base of rotating shaft.
  28. Traber, Thomas, Rotational stage with vertical axis adjustment.
  29. Kinoshita Yoshimi (Amagasaki JPX) Kanda Tomoyuki (Amagasaki JPX) Kitano Katsuhisa (Amagasaki JPX) Yoshida Kazuo (Amagasaki JPX) Ohnishi Hiroshi (Amagasaki JPX) Yamanishi Kenichiro (Amagasaki JPX) Sas, Semiconductor producing apparatus comprising wafer vacuum chucking device.
  30. Masuyuki Takashi,JPX ; Ishimaru Katsuaki,JPX, Substrate adjuster, substrate holder and substrate holding method.
  31. Tsukamoto, Izumi; Fujita, Itaru; Nogawa, Hideki; Takabayashi, Yukio, Substrate attracting and holding system for use in exposure apparatus.
  32. Tsukamoto, Izumi; Fujita, Itaru; Nogawa, Hideki; Takabayashi, Yukio, Substrate attracting and holding system for use in exposure apparatus.
  33. Moffatt, Stephen, Substrate holder for retaining a substrate within a processing chamber.
  34. Fujiyama Shigemi,JPX ; Nishibata Mikio,JPX ; Sagoh Hirohito,JPX, Substrate transfer apparatus and method of substrate transfer.
  35. Howald, Arthur M., System and method for dechucking a workpiece from an electrostatic chuck.
  36. Berman, Michael J.; Barber, Rennie G., System and method for optimizing the electrostatic removal of a workpiece from a chuck.
  37. Ledger Anthony (Newfairfield CT) Power Michael (Newtown CT), Transparent optical chuck incorporating optical monitoring.

이 특허를 인용한 특허 (8)

  1. Babbs, Daniel A.; Choi, Byung-Jin; Cherala, Anshuman, Chucking system for nano-manufacturing.
  2. Sreenivasan, Sidlgata V.; Yang, Shuqiang; Xu, Frank Y.; Singh, Vikramjit, Functional nanoparticles.
  3. Lu, Xiaoming; Schumaker, Philip D., High throughput imprint based on contact line motion tracking control.
  4. Liu, Ping-Yin; Yu, Chung-Yi; Hsu, Che Ying; Tu, Yeur-Luen; Chou, Da-Hsiang; Tsai, Chia-Shiung, Method and apparatus of holding a device.
  5. Singh, Vikramjit; Xu, Frank Y.; Sreenivasan, Sidlgata V., Nanoimprint lithography formation of functional nanoparticles using dual release layers.
  6. Xu, Frank Y.; Sreenivasan, Sidlgata V.; Yang, Shuqiang, Nanoimprint lithography processes for forming nanoparticles.
  7. Nguyen, Houng T.; Xu, Ren; Barnes, Michael S., Process for optimization of island to trench ratio in patterned media.
  8. Resnick, Douglas J.; Meissl, Mario Johannes; Choi, Byung-Jin; Sreenivasan, Sidlgata V., Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template.
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