초록 ▼

Disclosed herein is a processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss. The processing system has a processing apparatus including a gas injection injector for injecting a specific material

Disclosed herein is a processing system that can supply a material gas produced inside a material reservoir tank into a processing apparatus while generating almost no pressure loss. The processing system has a processing apparatus including a gas injection injector for injecting a specific material gas into a processing vessel in order to provide specific processing to an object to be processed W, the material gas being produced from a metallic compound material M with low vapor pressure; and a gas supply system for supplying the specific material gas to the gas injector, the gas injector is a shower head portion and the gas supply system provides: a gas passage extending upwardly from the showerhead portion; a material reservoir tank attached to the upper-end portion of the gas passage for containing the metallic compound material therein; and an open/close valve for opening/closing the gas passage.

대표청구항 ▼

The invention claimed is: 1. A gas supply method using a gas supply system which supplies a material gas produced from metallic compound material into a processing vessel having: a gas passage extending to said processing vessel; a material reservoir tank for containing said metallic compound mater

The invention claimed is: 1. A gas supply method using a gas supply system which supplies a material gas produced from metallic compound material into a processing vessel having: a gas passage extending to said processing vessel; a material reservoir tank for containing said metallic compound material therein; a heating means provided in said material reservoir tank for evaporating said metallic compound material; a first carrier gas supply means for feeding a carrier gas into said material reservoir tank; and a detecting means for detecting a condition inside said gas passage, said method comprising a step of controlling a temperature of said heating means or controlling a gas flow amount of said carrier gas in response to a value detected by said detecting means, wherein said first carrier gas supply means comprises a gas diffusion chamber provided in said material reservoir tank, and a gas injection plate separating said gas diffusion chamber and having a number of gas injection holes. 2. A gas supply method as described in claim 1, wherein said heating means is implanted in said gas injection plate. 3. A gas supply method as described in claim 2, wherein said gas injection plate is a ceramic with a resistance heater implanted therein. 4. A gas supply method as described in claim 1, wherein said detecting means detects the amount of gas flowing through said gas passage. 5. A gas supply method as described in claim 4, wherein said gas supply system further comprises a second carrier gas supply means for feeding a carrier gas into said gas passage, and said method further comprises controlling by said first carrier gas supply means, the carrier gas flow amount so that the flow amount of the material gas within said gas passage is maintained at a constant amount, and controlling by said second carrier gas supply means, the carrier gas flow amount so that the total gas flow amount supplied into said processing vessel is maintained at a constant amount. 6. A gas supply method as described in claim 5, comprising detecting a change of the gas flow amount of the material gas by said detecting means as a change of its detected value. 7. A gas supply method as described in claim 5, comprising changing by said first carrier gas supply means, the carrier gas flow amount in order to compensate a change of the flow amount of the material gas within said gas passage, while changing by said second carrier gas supply means, its carrier gas flow amount in order to cancel the gas flow amount increased or decreased by said first carrier gas supply means. 8. A gas supply method as described in claim 1, comprising detecting by said detecting means, the pressure inside said gas passage. 9. A gas supply method as described in claim 4, comprising detecting by said detecting means, a partial pressure of the material gas inside said gas passage with a spectrum of the material gas.