[특허]Coaxial plasma arc vapor deposition apparatus and method

[미국특허] Coaxial plasma arc vapor deposition apparatus and method 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	C23C-014/00
출원번호	US-0834592 (2004-04-28)
발명자 / 주소	McFarland, Michael D. Krishnan, Mahadevan Wright, Jason D. Gerhan, Andrew N. Tang, Benjamin
출원인 / 주소	Alameda Applied Sciences Corp.
대리인 / 주소	File-EE-Patents.com
인용정보	피인용 횟수 : 19 인용 특허 : 21

초록 ▼

An apparatus for the deposition of a variable thickness coating onto the inside of a cylindrical tube comprises a variable pressure gas, an cathode coaxially positioned within the cylinder, and a voltage source applied between the cathode and cylindrical tube, which functions as an anode. A radial plasma arc is generated between the anode and cathode at a starting point on the cylinder, and the plasma arc travels down the central axis of the cylinder, providing a helical deposition region on the inside of the cylinder. Selection of the combination of cathode material and gas enable the plasma to generate ionic material which is deposited on the anodic cylinder in the region of the plasma. By varying the pressure of variable pressure gas for each helical path, it is possible to vary the composition of this deposition film.

대표청구항 ▼

We claim: 1. An apparatus for the deposition of an evaporated material from the outer surface of a cathode onto a cylindrical inner surface of an anode using a plasma, said apparatus comprising:an enclosed chamber including a vacuum pump and a variable pressure gas source;said cathode formed from a first conductive material and placed on an axis;said cylindrical anode formed from a second conductive material, said cylindrical anode placed at a positive electrical potential with respect to said cathode, said cylindrical anode having at least one removable conductive cap attached to a plasma initiation end of said cylindrical anode or to both ends of said cylindrical anode, said cylindrical anode having a constant inner diameter over an extent of said cylindrical anode which includes said at least one removable conductive cap, said removable conductive cap fitting onto the constant inner diameter of said cylindrical anode and electrically connected to said cylindrical anode;a magnetic field generator located external to said cylindrical anode, said magnetic field generator providing a temporally constant magnetic field oriented substantially parallel to said axis, said magnetic field being unidirectional over a radial extent from said cathode to said anode;a voltage source delivering a positive voltage to said cylindrical anode and a negative voltage to said cathode, thereby creating and maintaining said plasma;whereby said plasma has a plasma current which flows between said cathode and said anode and said magnetic field generator produces a magnetic field sufficient to cause said plasma to move helically down said axis at a speed controllable by the strength of said magnetic field such that said evaporated material is deposited on and contained by said inner surface of said anode;and where at least one said removable conductive cap is located in a region of said anode where macro-particles of initiation or termination of said plasma may form.

이 특허에 인용된 특허 (21) 인용/피인용 타임라인 분석

Welty Richard P. (Boulder CO), Apparatus and method for coating a substrate using vacuum arc evaporation.
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Bardos Ladislav,SEX ; Barankova Hana,SEX, Apparatus for generation of a linear arc discharge for plasma processing.
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Maekawa, Takaaki, Apparatus for purifying water containing dissolved organic matters and trace harmful substances.
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Veltrop Hans (Grubbenvorst NLX) Wesemeyer Harald (Wiehl NLX) Buil Boudewijn J. A. M. (Belfeld NLX), Cathode arc discharge evaporating device.
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Khominich Viktor N., Cathode arc vapor deposition method and apparatus.
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Wolfram Beele DE; Thomas Jung DE; Peter-Jochen Brand DE, Coating method for producing a heat-insulating layer on a substrate.
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Zega Bogdan (Geneva CHX), Cylindrical magnetron sputtering cathode and apparatus.
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Vergason Gary E. (Spencer NY), Electric arc vapor deposition device.
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Henshaw William F. (Street MD) White John R. (Darlington MD) Niiler Andrus (Bel Air MD), Hollow cathode discharge source of metal vapor.
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Leu Ming-Sheng,TWX ; Lih Wei-Cheng,TWX ; Lee Yuh-Wen,TWX ; Chen Shau-Yi,TWX ; Chang Wei-Jieh,TWX ; Huang Shinn-Cherng,TWX ; Liou Mau-Shen,TWX, Magnetic apparatus for arc ion plating.
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Yumshtyk Gennady,CAX ; Ioumchtyk Michael,CAX, Magnetron sputtering method and apparatus.
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Morrison ; Jr. Charles F. (Boulder CO), Method and apparatus for arc evaporating large area targets.
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Treglio James R. (San Diego CA), Method and apparatus for direct ARC plasma deposition of ceramic coatings.
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Wesemeyer Harald (Wiehl DEX) Veltrop Hans (Grubbenvorst NLX), Method and device for coating cavities of objects.
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Pinkhasov Eduard (Forest Hills NY), Method of and apparatus for the coating of a substrate with material electrically transformed into a vapor phase.
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Pinkhasov Eduard (Eastchester NY), Method of coating a metal gas-pressure bottle or tank.
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Schramm, Harry F., Method of forming ultra thin film devices by vacuum arc vapor deposition.
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Kljuchko Gennady V. (prospekt Kurchatova ; 27 ; kv. 68 Kharkov SUX) Padalka Valentin G. (ulitsa Danilevskogo ; 10 ; kv. 122 Kharkov SUX) Sablev Leonid P. (ulitsa P. Morozova ; 3 ; kv. 3 Kharkov SUX) , Plasma arc apparatus for applying coatings by means of a consumable cathode.
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Mller Volker (Saalfeld DEX) Fehn Manfred (Saalfeld DEX), Process and a device for continuous surface treatment of rod-shaped, longitudinally extended materials with metal surfac.
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Tamagaki Hiroshi,JPX ; Kawaguchi Hiroshi,JPX ; Fujii Hirofumi,JPX ; Shimojima Katsuhiko,JPX ; Suzuki Takeshi,JPX ; Hanaguri Koji,JPX, Vacuum arc deposition apparatus.
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Tamagaki Hiroshi (Kobe JPX), Vacuum arc deposition device.
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이 특허를 인용한 특허 (19) 인용/피인용 타임라인 분석

Felts, John T.; Fisk, Thomas E.; Abrams, Robert S.; Ferguson, John; Freedman, Jonathan R.; Pangborn, Robert J.; Sagona, Peter J., Apparatus and method for transporting a vessel to and from a PECVD processing station.
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Fisk, Thomas E., Coating inspection method.
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Weikart, Christopher; Clark, Becky L.; Stevenson, Adam; Abrams, Robert S.; Belfance, John, Controlling the uniformity of PECVD deposition.
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Weikart, Christopher; Clark, Becky L.; Stevenson, Adam; Abrams, Robert S.; Belfance, John; Jones, Joseph A.; Fisk, Thomas E., Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like.
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Felts, John T.; Fisk, Thomas E.; Abrams, Robert S.; Ferguson, John; Freedman, Jonathan R.; Pangborn, Robert J.; Sagona, Peter J., Cyclic olefin polymer vessels and vessel coating methods.
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Boughton, Daniel Robert; Jarvis, Scott Michael, Method and apparatus for adding thermal energy to a glass melt.
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Fisk, Thomas E.; Sagona, Peter J.; Jones, Joseph A., Method and apparatus for detecting rapid barrier coating integrity characteristics.
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Boughton, Daniel Robert, Methods and apparatus for material processing using atmospheric thermal plasma reactor.
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Boughton, Daniel Robert, Methods and apparatus for material processing using atmospheric thermal plasma reactor.
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Boughton, Daniel Robert, Methods and apparatus for material processing using plasma thermal source.
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Felts, John T.; Fisk, Thomas E.; Kinney, Shawn; Weikart, Christopher; Hunt, Benjamin; Raiche, Adrian; Fitzpatrick, Brian; Sagona, Peter J.; Stevenson, Adam, PECVD coating methods for capped syringes, cartridges and other articles.
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Jones, Joseph A.; Felts, John T.; Gresham, James Troy; Lilly, Brian Russell; Fisk, Thomas E., PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases.
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Felts, John T.; Fisk, Thomas E.; Abrams, Robert S.; Ferguson, John; Freedman, Jonathan R.; Pangborn, Robert J.; Sagona, Peter J.; Weikart, Christopher, Passivation, pH protective or lubricity coating for pharmaceutical package, coating process and apparatus.
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Jones, Joseph A.; Weikart, Christopher; Martin, Steven J., Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus.
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Felts, John T.; Fisk, Thomas E.; Abrams, Robert S.; Ferguson, John; Freedman, Jonathan R.; Pangborn, Robert J.; Sagona, Peter; Weikart, Christopher; Israelachvili, Jacob, Saccharide protective coating for pharmaceutical package.
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Weikart, Christopher; Clark, Becky L.; Stevenson, Adam; Felts, John T., Trilayer coated pharmaceutical packaging.
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Weikart, Christopher; Clark, Becky L.; Stevenson, Adam; Felts, John T., Trilayer coated pharmaceutical packaging.
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Weikart, Christopher; Clark, Becky L.; Stevenson, Adam; Felts, John T., Trilayer coated pharmaceutical packaging with low oxygen transmission rate.
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Felts, John T.; Fisk, Thomas E.; Abrams, Robert; Ferguson, John; Freedman, Jonathan; Pangborn, Robert; Sagona, Peter, Vessels, contact surfaces, and coating and inspection apparatus and methods.
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[미국특허] Coaxial plasma arc vapor deposition apparatus and method 원문보기

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