[특허]Catadioptric projection objective

[미국특허] Catadioptric projection objective 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G02B-017/00
출원번호	US-0100233 (2008-04-09)
등록번호	US7869122 (2010-12-28)
발명자 / 주소	Shafer, David Ulrich, Wilhelm Dodoc, Aurelian Von Buenau, Rudolf Mann, Hans-Juergen Epple, Alexander
출원인 / 주소	Carl Zeiss SMT AG
대리인 / 주소	Fish & Richardson P.C.
인용정보	피인용 횟수 : 2 인용 특허 : 205

초록 ▼

A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprises: a first objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part for imaging the first intermediate imaging into a second intermediate image; a third objective part for imaging the second intermediate imaging directly onto the image plane;wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image;pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; andall concave mirrors are arranged optically remote from a pupil surface. The system has potential for very high numerical apertures at moderate lens material mass consumption.

대표청구항 ▼

What is claimed is: 1. A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising:an optical axis;a plurality of lenses and at least one concave mirror having a continuous mirror surface;a first refractive objective part for imaging the pattern provided in the object plane into a first intermediate image;a second catoptric or catadioptric objective part for imaging the first intermediate image into a second intermediate image; anda third objective part for imaging the second intermediate image onto the image plane,wherein the projection objective is an unobscured system having no pupil obscuration andwherein the projection objective is configured so that an object field disposed on one side of the optical axis at the object plane is imaged into an image field at the image plane disposed on the opposite side of the optical axis with no change of chirality occuring between the object field at the object plane and the image field at the image plane.

이 특허에 인용된 특허 (205) 인용/피인용 타임라인 분석

Shafer, David R., 6-mirror projection objective with few lenses.
상세보기
Dill Frederick H. (South Salem NY) Tibbetts Raymond E. (Mahopac NY) Wilczynski Janusz S. (Ossining NY), Achromatic unit magnification optical system.
상세보기
Wilczynski Janusz S. (Ossining NY), Alignment system for lithographic proximity printing.
상세보기
Sweatt William C., Apparatus and method for generating partially coherent illumination for photolithography.
상세보기
Hershel Ronald S. (Albany OR), Apparatus for projecting a series of images onto dies of a semiconductor wafer.
상세보기
Jewell Tanya E. (Bridgewater NJ) Rodgers J. Michael (Pasadena CA), Apparatus for semiconductor lithography.
상세보기
Sewell, Harry, Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system.
상세보기
Shafer, David R.; Chuang, Yung-Ho, Broad band DUV, VUV long-working distance catadioptric imaging system.
상세보기
Williamson David (Bethel CT) DeSai Satish (Bethel CT), Broad band optical reduction system using matched multiple refractive element materials.
상세보기
Shafer David R. ; Chuang Yung-Ho ; Tsai Bin-Ming B., Broad spectrum ultraviolet catadioptric imaging system.
상세보기
Okada Takashi (Osaka JPX), Camera system including catadioptric lens and catadioptric lens system used therein.
상세보기
Shafer David (Fairfield CT), Catadioptric imaging system.
상세보기
Omura, Yasuhiro, Catadioptric imaging system and a projection exposure apparatus provided with said imaging system.
상세보기
Yasuhiro Omura JP, Catadioptric imaging system and a projection exposure apparatus provided with said imaging system.
상세보기
Mercado Romeo I. (San Jose CA), Catadioptric imaging system with dioptric assembly of the petzval type.
상세보기
Tsunashima Teruyoshi,JPX, Catadioptric lens.
상세보기
Schuster Karl Heinz,DEX, Catadioptric microlithographic reduction objective.
상세보기
Hall John M. ; Barr Dallas N. ; Utano Richard, Catadioptric multi-functional optical assembly.
상세보기
Schuster, Karl Heinz, Catadioptric objective.
상세보기
Shafer, David R.; Herkommer, Alois; Schuster, Karl-Heinz; Furter, Gerd; von Bunau, Rudolf; Ulrich, Wilhelm, Catadioptric objective comprising two intermediate images.
상세보기
Willi Ulrich DE; Helmut Beierl DE, Catadioptric objective with physical beam splitter.
상세보기
Williamson David M. (West Malvern GB2), Catadioptric optical reduction system with high numerical aperture.
상세보기
Ishiyama Toshiro (Tokyo JPX) Suenaga Yutaka (Yokohama JPX), Catadioptric optical system.
상세보기
Takahashi Tomowaki,JPX ; Misawa Junichi,JPX, Catadioptric optical system.
상세보기
Suenaga,Yutaka; Miyashita,Tomohiro; Yamaguchi,Kotaro, Catadioptric optical system and exposure apparatus equipped with the same.
상세보기
David R. Shafer ; Helmut Beierl DE; Gerhard Furter DE; Karl-Heinz Schuster DE; Wilhelm Ulrich DE, Catadioptric optical system and exposure apparatus having the same.
상세보기
Takahashi Tomowaki (Yokohama JPX), Catadioptric optical system and exposure apparatus having the same.
상세보기
Sturlesi Doron,ILX ; Peled Shimon,ILX, Catadioptric optics for staring array detector system.
상세보기
Epple,Alexander; Dodoc,Aurelian, Catadioptric projection objective.
상세보기
Shafer,David; Ulrich,Wilhelm; Dodoc,Aurelian; Von Buenau,Rudolf; Mann,Hans Juergen; Epple,Alexander, Catadioptric projection objective.
상세보기
Hudyma,Russell, Catadioptric projection system for 157 nm lithography.
상세보기
Haseltine Eric C. (Manhattan Beach CA) Jones Helene H. (Culver City CA), Catadioptric projector, catadioptric projection system and process.
상세보기
Epple,Alexander; Beierl,Helmut, Catadioptric reduction lens.
상세보기
Perrin, Jean Claude; Epple, Alexander; Ulrich, Wilhelm, Catadioptric reduction lens.
상세보기
Ulrich,Wilhelm; Shafer,David R.; Epple,Alexander; Beierl,Helmut; Dodoc,Aurelian, Catadioptric reduction lens.
상세보기
Hashimoto Sumio (Tokyo JPX) Ichihara Yutaka (Yokohama JPX), Catadioptric reduction projection optical system.
상세보기
Ishiyama Toshiro (Kawasaki JPX) Suenaga Yutaka (Yokohama JPX), Catadioptric reduction projection optical system and exposure apparatus employing the same.
상세보기
Takahashi Tomowaki,JPX, Catadioptric reduction projection optical system and exposure apparatus having the same.
상세보기
Shafer,David R.; Epple,Alexander, Catadioptric reductions lens.
상세보기
Takahashi,Tomowaki, Catadioptric system and exposure device having this system.
상세보기
Omura Yasuhiro,JPX, Catadioptric system for photolithography.
상세보기
Takahashi Tetsuo,JPX ; Omura Yasuhiro,JPX, Catadioptric system for photolithography.
상세보기
Iizuka Yutaka (Fujisawa JPX), Catadioptric telephoto lens.
상세보기
Yamada ; Yu, Catadioptric wide-angle lens system for reproduction.
상세보기
Sinclair Robert Lawrence,CAX ; Hudyma Russell M., Catadioptric zoom lens assemblies.
상세보기
Takahashi Tomowaki,JPX ; Suenaga Yutaka,JPX, Catoptric reduction projection optical system and exposure apparatus and method using same.
상세보기
Takahashi Tomowaki,JPX, Catoptric reduction projection optical system and projection exposure apparatus and method using same.
상세보기
Hudyma, Russell; Ulrich, Wilhelm; Rostalski, Hans-Juergen, Compact 1½-waist system for sub 100 nm ArF lithography.
상세보기
Cook Lacy G. (El Segundo CA), Compact afocal reimaging and image derotation device.
상세보기
Mitchell,Thomas A., Compact fast catadioptric imager.
상세보기
Russell M. Hudyma, Compact multi-bounce projection system for extreme ultraviolet projection lithography.
상세보기
Sweatt William C. ; Kubiak Glenn D., Condenser for extreme-UV lithography with discharge source.
상세보기
Gibson John A. (Sunnyvale CA), Deep ultraviolet (UV) lens for use in a photolighography system.
상세보기
Elliott David J. (Wayland MA) Shafer David (Fairfield CT), Deep ultraviolet microlithography system.
상세보기
Mercado, Romeo I.; Zhang, Shiyu, Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus.
상세보기
Kleemann, Bernd; Rostalski, Hans-Jürgen; Ulrich, Willi, Diffractive optical element and also optical arrangement comprising a diffractive optical element.
상세보기
Kuba Keiichi (Hachioji JPX), Diffractive optical element for use within a projection lens system.
상세보기
Takahashi Tomowaki,JPX, Dual-imaging optical system.
상세보기
Tomowaki Takahashi JP, Dual-imaging optical system.
상세보기
Matsuzawa Hitoshi,JPX ; Ishii Mikihiko,JPX ; Tanaka Issey,JPX, Exposure apparatus.
상세보기
Yutaka Suenaga JP; Yasuhiro Omura JP, Exposure apparatus and method.
상세보기
Takahashi Tomowaki,JPX, Exposure apparatus having catadioptric projection optical system.
상세보기
Shigematsu, Koji, Exposure apparatus, a photolithography method, and a device manufactured by the same.
상세보기
Shima, Shinichi, Exposure apparatus, method of manufacturing semiconductor devices, semiconductor manufacturing plant, method of maintaining exposure apparatus, and position detector.
상세보기
Suzuki Kazuaki,JPX, Exposure method and apparatus.
상세보기
Laursen, Thomas; Yamayoshi, Mamoru, Flexible snapshot in endpoint detection.
상세보기
Tomimatsu Kei,JPX, Fluid immersion microscope objective lens.
상세보기
Piwonka-Corle Timothy R. (Portland OR) Scoffone Karen F. (Redwood City CA) Chen Xing (San Jose CA) Lacomb ; Jr. Lloyd J. (Santa Clara CA) Stehle Jean-Louis (Colombes FRX) Zahorski Dorian (Vanves FRX), Focused beam spectroscopic ellipsometry method and system.
상세보기
Suwa Kyoichi,JPX, Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus.
상세보기
Williamson David M.,GBX, Four mirror EUV projection optics.
상세보기
Cohen Simon J ; Jeong Hwan J ; Shafer David R, Four-mirror extreme ultraviolet (EUV) lithography projection system.
상세보기
Wiegand Philip J. ; Estelle Lee R. ; Lewis Alan E., Glass coated cemented plastic doublets and method for making.
상세보기
Williamson David M.,GBX, High numerical aperture ring field optical reduction system.
상세보기
Hudyma Russell, High numerical aperture ring field projection system for extreme ultraviolet lithography.
상세보기
Hudyma Russell ; Shafer David R., High numerical aperture ring field projection system for extreme ultraviolet lithography.
상세보기
Chiu George L. (Cross River NY) Singh Rama N. (Bethel CT) Wilczynski Janusz S. (Ossining NY), High resolution reduction catadioptric relay lens.
상세보기
Singh Rama N. (Bethel CT) Wilczynski Janusz S. (Ossining NY), High resolution reduction catadioptric relay lens.
상세보기
Canzek Ludvik (Unterentfelden CHX), High speed catadioptric objective lens system.
상세보기
Canzek Ludvik (Quellmattstrasse 3 5035 Unterentfelden CHX), High speed catadioptric system.
상세보기
Phillips ; Jr. Anthony R. (Fairport NY) Michaloski Paul F. (Rochester NY), Imaging system for deep ultraviolet lithography.
상세보기
Dodoc,Aurelian, Imaging system, in particular for a microlithographic projection exposure apparatus.
상세보기
Sigler Robert D. (Cupertino CA), Infrared catadioptric zoom relay telescope.
상세보기
Mercado Romeo I., Large NA projection lens for excimer laser lithographic systems.
상세보기
Mercado, Romeo I., Large-field unit-magnification projection system.
상세보기
Beach Allan David,NZX, Lens system.
상세보기
Bruning John H. (Pittsford NY) Phillips ; Jr. Anthony R. (Fairport NY) Shafer David R. (Fairfield CT) White Alan D. (Berkeley Heights NJ), Lens system for X-ray projection lithography camera.
상세보기
Ainsworth ; Jr. Thomas (Ossining NY) Chiu George (Cross River NY) Singh Rama N. (Bethel CT) Wilczynski Janusz S. (Ossining NY), Lens system for scanning laser apparatus.
상세보기
Bal, Matthieu Frederic; Bociort, Florian; Braat, Josephus Johannes Maria, Lithographic apparatus, device manufacturing method, and device manufactured thereby.
상세보기
Schuster, Karl-Heinz; Epple, Alexander, Lithographic objective having a first lens group including only lenses having a positive refractive power.
상세보기
McKinley William G. ; Perron Gerard M. ; Tatian Berge, Lithography system and method with mask image enlargement.
상세보기
Furter Gerd,DEX, Maximum aperture catadioptric reduction objective for microlithography.
상세보기
Anzai Satoru (Zama JPX) Ohno Koichi (Inagi JPX), Method and apparatus for adjusting imaging performance of projection optical apparatus.
상세보기
Kamenov,Vladimir; Kraehmer,Daniel; Totzeck,Michael; Gruner,Toralf; Dodoc,Aurelian, Method of determining lens materials for a projection exposure apparatus.
상세보기
Karl-Heinz Schuster DE; Helmut Beierl DE, Microlithographic reduction objective, projection exposure equipment and process.
상세보기
Shafer, David R., Microlithographic reduction projection catadioptric objective.
상세보기
Shafer, David R.; Hudyma, Russell; Ulrich, Wilhelm, Microlithographic reduction projection catadioptric objective.
상세보기
Shafer,David R.; Hudyma,Russell; Ulrich,Wilhelm, Microlithographic reduction projection catadioptric objective.
상세보기
Udo Dinger DE, Microlithography reduction objective and projection exposure apparatus.
상세보기
Braat Josephus J. M.,NLX, Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system.
상세보기
Braat Josephus J. M.,NLX, Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system.
상세보기
Josephus J. M. Braat NL, Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system.
상세보기
Foo Leslie D. (San Jose CA), Multiple mirror catadioptric optical system.
상세보기
Mann, Hans-J?rgen; Ulrich, Wilhelm, Objective with pupil obscuration.
상세보기
Shafer,David R.; Beder,Susanne; Schuster,Karl Heinz; Singer,Wolfgang, Objectives as a microlithography projection objective with at least one liquid lens.
상세보기
Schoenmakers Wijnand P. (Belmont CA), Off-axis catadioptric projection system.
상세보기
Takahashi Tomowaki (Yokohama JPX), Optical apparatus.
상세보기
Goodman Douglas S. (Yorktown Heights NY) Rosenbluth Alan E. (Yorktown Heights NY) Tibbetts Raymond E. (Cape Coral FL) Wilczynski Janusz S. (Ossining NY), Optical projection system.
상세보기
Shafer, David R.; Ulrich, Wilhelm, Optical projection system.
상세보기
Williamson David M. (26 Chimney Dr. Bethel CT 06801), Optical reduction system.
상세보기
Hendriks,Bernardus Hendrikus Wilhelmus; Schleipen,Johannes Joseph Hubertina Barbara, Optical scanning device.
상세보기
Epple,Alexander; Gruner,Toralf; Singer,Wolfgang, Optical system for ultraviolet light.
상세보기
Singh Rama N. (Bethel CT) Wilczynski Janusz S. (Ossining NY), Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations.
상세보기
Freeman Michael Harold (Denbigh GB7), Optical systems, telescopes and binoculars.
상세보기
Omura, Yasuhiro, PROJECTION OPTICAL SYSTEM, PROJECTION EXPOSURE APPARATUS HAVING THE PROJECTION OPTICAL SYSTEM, PROJECTION METHOD THEREOF, EXPOSURE METHOD THEREOF AND FABRICATING METHOD FOR FABRICATING A DEVICE USING.
상세보기
Tabarelli Werner (Schlossstr. 5 Vaduz LIX FL-9490) Lbach Ernst W. (Tonagass 374 Eschen LIX FL-9492), Photolithographic method for the manufacture of integrated circuits.
상세보기
Chow Andrea W. (Los Altos CA) Warren Hope B. (Cupertino CA) Ermer Susan P. (Redwood City CA), Polymer-optical liquid matrix for use as a lens element.
상세보기
Hirose Ryusho (Kawasaki JPX), Projection exposure apparatus.
상세보기
Kamenow,Vladimir; Kraehmer,Daniel; Totzeck,Michael; Gruner,Toralf; Dodoc,Aurelian; Shafer,David; Ulrich,Wilhelm; von Buenau,Rudolf; Mann,Hans Juergen; Epple,Alexander, Projection exposure apparatus.
상세보기
Nishi Kenji (Kawasaki JPX), Projection exposure apparatus.
상세보기
Ohta Masakatu (Tokyo JPX) Suzuki Akiyoshi (Tokyo JPX), Projection exposure apparatus.
상세보기
Sumiyoshi Yuhei,JPX ; Mikami Koji,JPX, Projection exposure apparatus and device manufacturing method.
상세보기
Omura Yasuhiro,JPX ; Takahashi Tetsuo,JPX ; Ikeda Masatoshi,JPX ; Li Shiwen,JPX ; Ichihara Yutaka,JPX, Projection exposure apparatus and method.
상세보기
Omura, Yasuhiro, Projection exposure apparatus and method.
상세보기
Wagner, Christian; Ulrich, Wilhelm, Projection exposure apparatus for microlithography.
상세보기
Takahashi, Tomowaki; Tsukamoto, Hiroyuki, Projection exposure apparatus, projection exposure method and catadioptric optical system.
상세보기
Shafer, David R.; Ulrich, Wilhelm; Beierl, Helmut, Projection exposure lens with aspheric elements.
상세보기
Schuster,Karl Heinz, Projection exposure machine comprising a projection lens.
상세보기
Omura, Yasuhiro, Projection exposure methods and apparatus, and projection optical systems.
상세보기
Schuster, Karl-Heinz; Ulrich, Wilhelm; Gruner, Toralf; Kraehmer, Daniel; Singer, Wolfgang; Epple, Alexander; Beierl, Helmut; Garreis, Reiner, Projection exposure system.
상세보기
Furter, Gerd; Wagner, Christian; Godecke, Uwe; Muller, Henriette, Projection exposure system having a reflective reticle.
상세보기
Tezuka Yoshiko (Saitama JPX) Kuba Keiichi (Hachioji JPX), Projection lens system.
상세보기
Togino Takayoshi (Koganei JPX) Tezuka Yoshiko (Saitama JPX), Projection lens system.
상세보기
Yamaguchi Kotaro,JPX ; Hayashi Kiyoshi,JPX ; Takahashi Tomawaki,JPX, Projection lens system and apparatus.
상세보기
Mercado Romeo I., Projection lens systems.
상세보기
Mercado Romeo I., Projection lens systems for excimer laser exposure lithography.
상세보기
Shafer David Ross (56 Drake La. Fairfield CT 06438), Projection lithography system and method using all-reflective optical elements.
상세보기
Schuster, Karl-Heinz, Projection objective.
상세보기
Schuster, Karl-Heinz, Projection objective.
상세보기
Schuster, Karl-Heinz, Projection objective for microlithography.
상세보기
Schuster, Karl-Heinz; Shafer, David R.; Ulrich, Wilhelm; Beierl, Helmut; Singer, Wolfgang, Projection objective having adjacently mounted aspheric lens surfaces.
상세보기
Epple,Alexander; Graeupner,Paul; Kaiser,Winfried; Garreis,Reiner; Ulrich,Wilhelm, Projection objective, especially for microlithography, and method for adjusting a projection objective.
상세보기
Mann,Hans Juergen; Hudyma,Russell; Epple,Alexander, Projection objectives including a plurality of mirrors with lenses ahead of mirror M3.
상세보기
Mann,Hans Jurgen; Hudyma,Russell; Epple,Alexander, Projection objectives including a plurality of mirrors with lenses ahead of mirror M3.
상세보기
Anzai Satoru (Zama JPX) Tanaka Hiroshi (Yokohama JPX), Projection optical apparatus.
상세보기
Kudo Shintaro,JPX, Projection optical system.
상세보기
Sato Takeo (Kawasaki JPX) Araki Nobuhiro (Yokohama JPX) Kawata Koichi (Tokyo JPX) Nomura Noboru (Kyoto JPX) Ueno Atsushi (Osaka JPX) Yoshida Shotaro (Sendai JPX), Projection optical system.
상세보기
Takahashi Tomowaki,JPX, Projection optical system.
상세보기
Takahashi, Tomowaki, Projection optical system.
상세보기
Matsuyama Tomoyuki,JPX, Projection optical system and exposure apparatus.
상세보기
Shigematsu Koji,JPX, Projection optical system and exposure apparatus and method.
상세보기
Matsuzawa Hitoshi,JPX ; Suenaga Yutaka,JPX, Projection optical system and exposure apparatus provided therewith.
상세보기
Matsuzawa Hitoshi,JPX ; Kobayashi Misako,JPX ; Endo Kazumasa,JPX ; Suenaga Yutaka,JPX, Projection optical system and exposure apparatus using the same.
상세보기
Matsuzawa Hitoshi,JPX ; Suenaga Yutaka,JPX ; Kobayashi Misako,JPX, Projection optical system and exposure apparatus with the same.
상세보기
Shafer,Dave; Beder,Susanne, Projection optical system and method.
상세보기
Suenaga Yutaka,JPX ; Yamaguchi Kotaro,JPX, Projection optical system and method of using such system for manufacturing devices.
상세보기
Kato, Takashi; Terasawa, Chiaki; Ishii, Hiroyuki, Projection optical system and projection exposure apparatus.
상세보기
Sasaya Toshihiro,JPX ; Ushida Kazuo,JPX ; Suenaga Yutaka,JPX ; Mercado Romeo I., Projection optical system and projection exposure apparatus.
상세보기
Sasaya Toshihiro,JPX ; Ushida Kazuo,JPX ; Suenaga Yutaka,JPX ; Mercado Romeo I., Projection optical system and projection exposure apparatus.
상세보기
Terasawa,Chiaki; Ishii,Hiroyuki; Kato,Takashi, Projection optical system and projection exposure apparatus.
상세보기
Terasawa,Chiaki; Ishii,Hiroyuki; Kato,Takashi, Projection optical system and projection exposure apparatus.
상세보기
Terasawa,Chiaki; Ishii,Hiroyuki; Kato,Takashi, Projection optical system and projection exposure apparatus.
상세보기
Terasawa,Chiaki; Ishii,Hiroyuki; Kato,Takashi, Projection optical system and projection exposure apparatus.
상세보기
Wilczynski Janusz S. (Ossining NY), Projection optical system for aligning an image on a surface.
상세보기
Sato Takeo (Sagamihara JPX) Araki Nobuhiro (Yokohama JPX) Kawata Koichi (Tama JPX) Nomura Noboru (Kyoto JPX) Ueno Atushi (Hirakata JPX) Yoshida Shotaro (Sendai JPX), Projection optical system for use in precise copy.
상세보기
Omura, Yasuhiro, Projection optical system, exposure apparatus and exposure method.
상세보기
Omura, Yasuhiro, Projection optical system, exposure apparatus incorporating this projection optical system, and manufacturing method for micro devices using the exposure apparatus.
상세보기
Takahashi,Tomowaki, Projection optical system, exposure apparatus, and device manufacturing method.
상세보기
Omura,Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
상세보기
Omura,Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
상세보기
Omura,Yasuhiro, Projection optical system, exposure apparatus, and exposure method.
상세보기
Takahashi, Tetsuo; Nishikawa, Jin; Omura, Yasuhiro, Projection optical system, manufacturing method thereof, and projection exposure apparatus.
상세보기
Shafer,David, Projection system, in particular for a microlithographic projection exposure apparatus.
상세보기
Endo Kazumasa,JPX, Projection-optical system for use in a projection-exposure apparatus.
상세보기
Dinger Udo,DEX, Reduction objective for extreme ultraviolet lithography.
상세보기
Ichihara Yutaka (Yokohama JPX) Higuchi Akira (Matsudo JPX), Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image.
상세보기
Itoh Takayuki (Saitama JPX), Reflecting telephoto zoom lens system.
상세보기
Hirose Ryusho (Kawasaki JPX), Reflection and refraction optical system.
상세보기
Hirose Ryusho (Kawasaki JPX), Reflection optical system.
상세보기
Kiyoto Mashima JP, Reflection reduction projection optical system.
상세보기
Matsumoto Kohichi (Kita JPX), Reflection type reduction projection optical system.
상세보기
Shafer David R., Reflective optical imaging system.
상세보기
Viswanathan Vriddhachalam K. (Los Alamos NM) Newnam Brian E. (Los Alamos NM), Reflective optical imaging system for extreme ultraviolet wavelengths.
상세보기
Shafer David R. (Fairfield CT), Reflective projection system comprising four spherical mirrors.
상세보기
Mashima Kiyohito,JPX, Reflective reduction imaging optical system for X-ray lithography.
상세보기
Rostalski,Hans Juergen; Schuster,Karl Heinz; Hudyma,Russell; Ulrich,Wilhelm; Freimann,Rolf, Refractive projection objective.
상세보기
Rostalski, Hans-Juergen; Ulrich, Wilhelm, Refractive projection objective for immersion lithography.
상세보기
Rostalski,Hans Juergen; Dodoc,Aurelian; Epple,Alexander; Beierl,Helmut, Refractive projection objective for immersion lithography.
상세보기
Schuster, Karl-Heinz, Refractive projection objective with a waist.
상세보기
Offner Abe (Darien CT), Restricted off-axis field optical system.
상세보기
Shafer David R. (Fairfield CT), Restrictive off-axis field optical system.
상세보기
Shafer David R. (Fairfield CT), Ring field projection system.
상세보기
Sweatt William C., Ringfield lithographic camera.
상세보기
Jewell Tanya E. (Bridgewater NJ) Thompson Kevin (La Canada CA), Ringfield lithography.
상세보기
Takahashi Kazuhiro,JPX ; Iwamoto Kazunori,JPX, Scanning exposure apparatus.
상세보기
Allen Paul C., Scanning lithography system haing double pass Wynne-Dyson optics.
상세보기
Hwan J. Jeong ; David A. Markle, Scanning microlithographic apparatus and method for projecting a large field-of-view image on a substrate.
상세보기
Kudo Shintaro,JPX, Short wavelength projection optical system.
상세보기
Friedman Irwin (Weston CT), Single mirror projection optical system.
상세보기
Shimizu You (Ibaragi JPX), Suction apparatus for printing press.
상세보기
Markle David A. (Norwalk CT) Offner Abe (Darien CT), System for illuminating an annular field.
상세보기
Shafer David Ross ; Chuang Yung-Ho ; Tsai Bin-Ming Benjamin, Ultra-broadband UV microscope imaging system with wide range zoom capability.
상세보기
Mercado, Romeo I., Variable numerical aperture large-field unit-magnification projection system.
상세보기
Bruning John H. (Pittsford NY) Phillips ; Jr. Anthony R. (Fairport NY) Shafer David R. (Fairfield CT) White Alan D. (Berkeley Heights NJ), X-ray projection lithography camera.
상세보기
Suzuki Masayuki (Atsugi JPX) Mochizuki Noritaka (Yokohama JPX) Minami Setsuo (Kawasaki JPX) Ogura Shigetaro (Tama JPX) Fukuda Yasuaki (Machida JPX) Watanabe Yutaka (Atsugi JPX) Kawai Yasuo (Shizuoka , X-ray reduction projection exposure system of reflection type.
상세보기
Terada Mamoru,JPX ; Okada Takashi,JPX ; Yamamoto Yasushi,JPX ; Ishimaru Kazuhiko,JPX, Zoom lens system.
상세보기

이 특허를 인용한 특허 (2) 인용/피인용 타임라인 분석

Mann, Hans-Juergen; Schoeppach, Armin; Zellner, Johannes, Microlithographic imaging optical system including multiple mirrors.
상세보기
Mann, Hans-Juergen; Schoeppach, Armin; Zellner, Johannes, Microlithographic imaging optical system including multiple mirrors.
상세보기

활용도 분석정보

상세보기

다운로드

내보내기

활용도 Top5 특허

해당 특허가 속한 카테고리에서 활용도가 높은 상위 5개 콘텐츠를 보여줍니다.
더보기 버튼을 클릭하시면 더 많은 관련자료를 살펴볼 수 있습니다.

IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

내보내기 구분	파일저장 인쇄 메일전송
구성항목	기본정보 상세정보 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표IPC 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 공고번호, 공고일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표출원인, 출원인국적, 출원인주소, 발명자, 발명자E, 발명자코드, 발명자주소, 발명자 우편번호, 발명자국적, 대표IPC, IPC코드, 요약, 미국특허분류, 대리인주소, 대리인코드, 대리인(한글), 대리인(영문), 국제공개일자, 국제공개번호, 국제출원일자, 국제출원번호, 우선권, 우선권주장일, 우선권국가, 우선권출원번호, 원출원일자, 원출원번호, 지정국, Citing Patents, Cited Patents
저장형식	Text(ASCII format) Excel format PIAS분석(.xls)
메일정보	받는사람 (필수) @ 보내는사람 (선택) @ 제목 내용 KISTI 검색결과 이메일 서비스
안내	총 건의 자료가 검색되었습니다. 다운받으실 자료의 인덱스를 입력하세요. (1-10,000) 검색결과의 순서대로 최대 10,000건 까지 다운로드가 가능합니다. 데이타가 많을 경우 속도가 느려질 수 있습니다.(최대 2~3분 소요) 다운로드 파일은 UTF-8 형태로 저장됩니다. 파일의 내용이 제대로 보이지 않을실 때는 웹브라우저 상단의 보기 -> 인코딩 -> 자동선택 여부를 확인하십시오. ~ Text(ASCII format) Excel format

연합인증

[미국특허] Catadioptric projection objective 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

이 특허에 인용된 특허 (205) 인용/피인용 타임라인 분석

이 특허를 인용한 특허 (2) 인용/피인용 타임라인 분석

활용도 분석정보

활용도 Top5 특허

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트

연합인증

[미국특허] Catadioptric projection objective 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

전체(0) 논문(0) 특허(0) 보고서(0)

전체(0) 논문(0) 특허(0) 보고서(0)

이 특허에 인용된 특허 (205) 인용/피인용 타임라인 분석

이 특허를 인용한 특허 (2) 인용/피인용 타임라인 분석

활용도 분석정보

활용도 Top5 특허 더보기

관련 콘텐츠

특허 원문 보기

IPC 상위 출원인

AI-Helper ※ AI-Helper는 오픈소스 모델을 사용합니다.

선택된 텍스트

활용도 Top5 특허