|국가/구분||United States(US) Patent 등록|
|미국특허분류(USC)||222/318; 222/504; 222/108; 251/065; 239/124; 118/300; 118/323|
|발명자 / 주소|
|출원인 / 주소|
|대리인 / 주소||
|인용정보||피인용 횟수 : 3 인용 특허 : 6|
A chemical liquid supply device applies chemical liquid from a nozzle to a processed object. The nozzle is provided in a moving head, which reciprocates between an applying position and a waiting position and includes an application valve operating so as to take an applying state of applying the liquid from the nozzle and a stopped state of stopping the application. Chemical liquid is pumped from a tank through a filter to a valve chamber of the application valve via a supply tube. The valve chamber is connected to a buffer tank through a circulation tub...
What is claimed is: 1. A chemical liquid supply device for supplying chemical liquid to a processed object, the device comprising:a moving head including a nozzle for applying the chemical liquid, the moving head reciprocating between an applying position and a waiting position by a reciprocating member;a supply tube connected between the nozzle and a chemical liquid supply unit including a chemical-liquid tank, a pump for discharging the chemical liquid in the chemical liquid tank, and a filter for filtering the chemical liquid discharged from the pump,...