[특허]System and method for analyzing power flow in semiconductor plasma generation systems

[미국특허] System and method for analyzing power flow in semiconductor plasma generation systems 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	G01R-033/422
출원번호	US-0921688 (2006-05-10)
등록번호	US7885774 (2011-01-26)
국제출원번호	PCT/US2006/018087 (2006-05-10)
§371/§102 date	20071206 (20071206)
국제공개번호	WO06/135515 (2006-12-21)
발명자 / 주소	Swank, John D.
출원인 / 주소	Bird Technologies Group Inc.
대리인 / 주소	Wegman, Hessler & Vanderburg
인용정보	피인용 횟수 : 2 인용 특허 : 27

초록 ▼

A system and method for measuring and analyzing power flow parameters in RF-based excitation systems for semi-conductor plasma generators. A measuring probe (8) is connected to an RF transmission line for receiving and measuring voltage (10) and current signals (12) from the transmission line (4). A high-speed sampling process converts the measured RF voltage and current signals into digital signals. The digital signals are then processed so as to reveal fundamental and harmonic amplitude and phase information corresponding to the original RF signals. Multiple measuring probes may be inserted in the power transmission path to measure two-port parameters, and the networked probes may be interrogated to determine input impedance, output impedance, insertion loss, internal dissipation, power flow efficiency, scattering, and the effect of plasma non-linearity on the RF signal.

대표청구항 ▼

What is claimed is: 1. A system for analyzing power flow in a radio frequency (RF) power transmission line, comprising:a measuring probe having a voltage sensor and a current sensor for sensing RF voltage and current signals from said transmission line, said RF voltage and current signals having waveforms;a measuring receiver connected to said voltage and current sensors for receiving said RF signals;a sampling means for directly converting said RF signals to digital signals, said digital signals comprising amplitude and phase information representing a fundamental frequency of said RF signals and a predetermined number of harmonics of said fundamental frequency; anda digital signal processing means for characterizing said amplitude and phase information so as to analyze power flow parameters and to reveal amplitude and phase angle relationships between said fundamental and harmonic frequencies;wherein said digital signal processing means reconstructs said RF voltage and current waveforms by recombining said harmonic frequencies in the proper phase relationships using said information about phase angle relationships between said fundamental and harmonic frequencies.

이 특허에 인용된 특허 (27) 인용/피인용 타임라인 분석

Thomas ; III John H. (Holland PA) Singh Bawa (Voorhees NJ), Apparatus and method for determining power in plasma processing.
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Cox Roger W. ; Elms Robert T., Apparatus for harmonic analysis of waveforms in an AC electrical system.
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Mitrovic, Andrej S., Controlled method for segmented electrode apparatus and method for plasma processing.
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Elms Robert T. (Monroeville PA), Data collection and processing for digital AC power system monitor/analyzer.
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Mecklenburg Frank H. (Russell OH), Digital RF wattmeter.
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Sander Wendell, Digital phase discriminations based on frequency sampling.
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Michael B. Hopkins IE; Jean-Marc Overard IE, Method of processing a high frequency signal containing multiple fundamental frequencies.
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Raoux Sebastien ; Mudholkar Mandar ; Taylor William N. ; Fodor Mark ; Huang Judy ; Silvetti David ; Cheung David ; Fairbairn Kevin, Mixed frequency CVD apparatus.
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Roth John R. (Knoxville TN) Tsai Peter P. (Knoxville TN) Liu Chaoyu (Knoxville TN) Laroussi Mounir (Knoxville TN) Spence Paul D. (Knoxville TN), One atmosphere, uniform glow discharge plasma.
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Chen Jian J. ; Veltrop Robert G. ; Wicker Thomas E., Parallel-antenna transformer-coupled plasma generation system.
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Erps Floyd D. (Stanwood WA) Fried Raymond L. (Loveland CO), Phase-locked loop frequency synthesizer.
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Howald Arthur M. ; Holland John P. ; Olson Christopher, Plasma processing method and apparatus with control of rf bias.
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MacGearailt, Niall, Plasma processor method and apparatus.
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Collins, Kenneth S.; Rice, Michael; Trow, John; Buchberger, Douglas; Askarinam, Eric; Tsui, Joshua Chiu-Wing; Groechel, David W.; Hung, Raymond, Plasma reactor having an inductive antenna coupling power through a parallel plate electrode.
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Mecklenburg, Frank H., RF Wattmeter.
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Benjamin, Neil, RF generating system with fast loop control.
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Collins Kenneth ; Roderick Craig ; Buchberger Douglas ; Trow John ; Shel Viktor, RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control.
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Williams Norman (Austin TX) Spain James (Austin TX), Radio frequency monitor for semiconductor process control.
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Williams Norman (Austin TX) Spain James (Austin TX), Radio frequency monitor for semiconductor process control.
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Roth, J. Reece, Remote exposure of workpieces using a plasma.
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Lee Eddie C. (Bloomington MN) Nunne William H. (New Hope MN), Step shape tailoring by phase angle variation RF bias sputtering.
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Wayne Johnson ; Richard Parsons, System and method for monitoring and controlling gas plasma processes.
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Heckman Randy L. (Fort Collins CO), System for characterizing AC properties of a processing plasma.
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Turner,Terry R., Transducer package for process control.
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Hong, Liubo, Use of variable impedance to control coil sputter distribution.
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Rice Michael ; Askarinam Eric ; Schneider Gerhard ; Collins Kenneth S., Vacuum processing chamber having multi-mode access.
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Toshima Masato, Wafer transfer system and method of using the same.
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이 특허를 인용한 특허 (2) 인용/피인용 타임라인 분석

Nejatali, Saeed; Carobolante, Francesco; Irish, Linda Stacey; Wheeland, Cody; Bachmanek, Greg, Apparatus and method for a current sensor.
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Bhutta, Imran Ahmed, Method for controlling a plasma chamber.
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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

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[미국특허] System and method for analyzing power flow in semiconductor plasma generation systems 원문보기