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[미국특허] Reactor design to reduce particle deposition during process abatement 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B01D-050/00
출원번호 US-0838435 (2007-08-14)
등록번호 US7985379 (2011-07-12)
발명자 / 주소
  • Chiu, Ho-Man Rodney
  • Clark, Daniel O.
  • Crawford, Shaun W.
  • Jung, Jay J.
  • Todd, Leonard B.
  • Vermeulen, Robbert
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Dugan & Dugan, P.C.
인용정보 피인용 횟수 : 3  인용 특허 : 188

초록 ▼

The present invention relates to systems and methods for controlled combustion and decomposition of gaseous pollutants while reducing deposition of unwanted reaction products from within the treatment systems. The systems include a novel thermal reaction chamber design having stacked reticulated cer

대표청구항 ▼

The invention claimed is: 1. An apparatus for use during the abatement of a semiconductor manufacturing process comprising:a thermal reaction unit having:an interior porous wall that defines a central chamber, the interior porous wall formed from a plurality of stacked porous sections;at least one w

이 특허에 인용된 특허 (188) 인용/피인용 타임라인 분석

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