초록 ▼

A device capable of causing a substrate to float by a gas can suppress the consumption of a gas. The device includes a carrying passage along which a substrate is carried. The gas spouted through the gas spouting pores causes the substrate to float and creates gas flows in the carrying gas flow groo

A device capable of causing a substrate to float by a gas can suppress the consumption of a gas. The device includes a carrying passage along which a substrate is carried. The gas spouted through the gas spouting pores causes the substrate to float and creates gas flows in the carrying gas flow grooves to propel the substrate in a carrying direction. The carrying passage is divided with respect to the carrying direction into passage sections, and the spouting of the gas through groups of the gas spouting pores assigned respectively to the passage sections is controlled to suporess the consumption of the gas.

대표청구항 ▼

What is claimed is: 1. A substrate carrying device comprising:a carrying passage forming member forming a carrying passage extending in a substrate carrying direction;flotation gas spouting pores formed in the carrying passage forming member and arranged along the carrying passage to spout a flotati

What is claimed is: 1. A substrate carrying device comprising:a carrying passage forming member forming a carrying passage extending in a substrate carrying direction;flotation gas spouting pores formed in the carrying passage forming member and arranged along the carrying passage to spout a flotation gas for causing a substrate to float;carrying gas spouting pores formed in the carrying passage forming member to create gas flows for carrying the floating substrate along the carrying passage;gas supply control means for controlling starting and stopping supplying the gas to groups of the gas spouting pores assigned to passage sections defined by longitudinally dividing the carrying passage such that the groups of the gas spouting pores start spouting the gas and stop spouting the gas independently;position measuring means for measuring the position of the substrate on the carrying passage; anda control unit for controlling opening and closing operations of the gas supply control means for controlling starting and stopping supplying the gas to the groups of the spouting pores on the basis of measured data provided by the position measuring means.