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Delivery of vapor precursor from solid source

국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/44
출원번호 US-0326792 (2008-12-02)
등록번호 US8012876 (2011-08-23)
발명자 / 주소
  • Oosterlaken, Theodorus G. M.
출원인 / 주소
  • ASM International N.V.
대리인 / 주소
    Knobbe, Martens, Olson & Bear LLP
인용정보 피인용 횟수 : 0  인용 특허 : 114

초록 ▼

A method is disclosed that uses solid precursors for semiconductor processing. A solid precursor is provided in a storage container. The solid precursor is transformed into a liquid state in the storage container. The liquid state precursor is transported from the storage container to a liquid holdi

대표청구항 ▼

What is claimed is: 1. A method for semiconductor processing comprising:providing a precursor in a solid state in a storage container;intermittently heating the storage container to a temperature above the melting temperature of the precursor, thereby intermittently transforming the precursor from t

이 특허에 인용된 특허 (114)

  1. Cote Donna R. ; Edelstein Daniel C. ; Fitzsimmons John A. ; Ivers Thomas H. ; Jamison Paul C. ; Levine Ernest, Adhesion of silicon carbide films.
    상세보기
  2. Lee,Wei Ti; Chiao,Steve H., Ampoule splash guard apparatus.
    상세보기
  3. Zorinsky Eldon J. (Plano TX) Spratt David B. (Plano TX), Anadization system with remote voltage sensing and active feedback control capabilities.
    상세보기
  4. Kirlin Peter S. (Bethel CT) Binder Robin L. (Bethlehem CT) Gardiner Robin A. (Bethel CT) Buskirk Peter V. (Newtown CT) Zhang Jiming (Danbury CT) Stauf Gregory (New Milford CT), Apparatus for flash vaporization delivery of reagents.
    상세보기
  5. DeBoer Scott J. ; Thakur Randhir P. S., Apparatus for forming a high dielectric film.
    상세보기
  6. Suntola Tuomo S. (Espoo FIX) Pakkala Arto J. (Espoo FIX) Lindfors Sven G. (Espoo FIX), Apparatus for performing growth of compound thin films.
    상세보기
  7. Ganguli,Seshadri; Chen,Ling; Ku,Vincent W., Apparatus for providing gas to a processing chamber.
    상세보기
  8. Grtner Georg (Aachen DEX) Janiel Peter (Wrselen DEX) Rau Hans (Aachen DEX), Arrangement for producing a gas flow which is enriched with the vapor of a low-volatile substance.
    상세보기
  9. Sirkar Kamalesh K. (Scotch Plains NJ), Asymmetrically-wettable porous membrane.
    상세보기
  10. Bartholomew Lawrence D. (Santa Cruz CA) Gralenski Nicholas M. (Aptos CA) Richie Michael A. (Santa Cruz CA) Hersh Michael L. (Boulder Creek CA), Atmospheric pressure chemical vapor deposition apparatus.
    상세보기
  11. Crabb Richard (Mesa AZ) Robinson McDonald (Paradise Valley AZ) Hawkins Mark R. (Mesa AZ) Goodwin Dennis L. (Tempe AZ) Ferro Armand P. (Scottsdale AZ) Ozias Albert E. (Aumsville OR) deBoer Wiebe B. (E, Chemical vapor deposition system.
    상세보기
  12. Bates Jan B. (Lafayette LA) Sciamanna Steven F. (Moraga CA), Clarification of produced water in the oil and gas industry.
    상세보기
  13. Aronowitz Sheldon ; Chan David ; Kimball James ; Lee David ; Haywood John ; Sukharev Valeriy, Composite semiconductor gate dielectrics.
    상세보기
  14. MacNeil, John, Delivery of liquid precursors to semiconductor processing reactors.
    상세보기
  15. Prescott Norman F. (Four Fairview Ave. Wenham MA 01984), Delivery system for organometallic compounds.
    상세보기
  16. Grtner Georg F. (Wrselen Aachen DEX) Rau Hans (Wrselen Aachen DEX) Janiel Peter A. (Wrselen W/e,uml/u/ rselen DEX), Device for enriching a carrier gas with the vapor of a sparingly volatile substance.
    상세보기
  17. Yamazaki Shunpei (Tokyo JPX), Electro-optical device constructed with thin film transistors.
    상세보기
  18. Utigard Torstein,CAX ; Castle John F.,GBX ; Gabb Philip J.,GBX ; George David B., Enhanced phase interaction at the interface of molten slag and blister copper, and an apparatus for promoting same.
    상세보기
  19. Korenberg, Jakob, Fast fluidized bed reactor and method of operating the reactor.
    상세보기
  20. Roeder Jeffrey ; Van Buskirk Peter C., Ferroelectric integrated circuit structure.
    상세보기
  21. Kitagawa Nobuhisa (Tokyo JPX) Hirose Masataka (Hiroshima JPX) Isogaya Kazuyoshi (Tokyo JPX) Ashida Yoshinori (Higashi-Hiroshima JPX), Formation process of amorphous silicon film.
    상세보기
  22. Burke, Robert; Good, Farrell; Srinivasan, Anand, Forming metal silicide resistant to subsequent thermal processing.
    상세보기
  23. Wilson Stanley C. (465 Jefferson Ave. Washington PA 15301) Hils Ralph J. (281 Thompsonville Road McMurray PA 15317), Gas enriching apparatus.
    상세보기
  24. Hawkins Mark R. (Mesa AZ) Robinson McDonald (Paradise Valley AZ), Gas injectors for reaction chambers in CVD systems.
    상세보기
  25. Shindo Mizuo (Ootake JPX) Yamamoto Takashi (Ootake JPX) Kamada Kensuke (Chiba JPX), Gas transfer process with hollow fiber membrane.
    상세보기
  26. Westmoreland,Donald L.; Sandhu,Gurtej S., High efficiency method for performing a chemical vapordeposition utilizing a nonvolatile precursor.
    상세보기
  27. Cheng, Kwok-Shun; Doh, Cha P., Hollow fiber membrane contactor.
    상세보기
  28. Beinglass Israel, In situ method for cleaning silicon surface and forming layer thereon in same chamber.
    상세보기
  29. Obeng Yaw Samuel ; Vitkavage Susan Clay, Integrated circuit fabrication process.
    상세보기
  30. Stauffer Craig M. (3066 Scott Blvd. Santa Clara CA 95054), Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing.
    상세보기
  31. Zhao Jun ; Dornfest Charles ; Ku Vincent ; Chang Frank ; Sivaramakrishnan Visweswaren, Liquid delivery system.
    상세보기
  32. Chen Fufa ; Chang Yu ; Tzu Gwo, Liquid level pressure sensor and method.
    상세보기
  33. Nishizato Hiroshi (Chiba JPX) Ono Hirofumi (Shiga JPX), Liquid vaporizer-feeder.
    상세보기
  34. Jasinski Joseph M. (Pleasantville NY) Meyerson Bernard S. (Yorktown Heights NY) Scott Bruce A. (Pleasantville NY), Low pressure chemical vapor deposition of tungsten silicide.
    상세보기
  35. Beinglass Israel (Sunnyvale CA) Carlson David K. (Santa Clara CA), Low temperature high pressure silicon deposition method.
    상세보기
  36. Beinglass Israel ; Carlson David K., Low temperature high pressure silicon deposition method.
    상세보기
  37. Foster Derrick W. (Fremont CA), Low temperature silicon nitride CVD process.
    상세보기
  38. Beinglass Israel (Sunnyvale CA) Carlson David K. (Santa Clara CA), Low temperature, high pressure silicon deposition method.
    상세보기
  39. Beinglass Israel (Sunnyvale CA) Venkatesan Mali (San Jose CA), Low temperature, high pressure silicon deposition method.
    상세보기
  40. Beinglass Israel ; Venkatesan Mali, Low temperature, high pressure silicon deposition method.
    상세보기
  41. Moslehi Mehrdad M. (Palo Alto CA) Fu Chi Y. (San Francisco County CA) Saraswat Krishna (Santa Clara County CA), Low-temperature direct nitridation of silicon in nitrogen plasma generated by microwave discharge.
    상세보기
  42. Scobey Michael A. (Santa Rosa CA) Seddon Richard I. (Santa Rosa CA) Seeser James W. (Santa Rosa CA) Austin R. Russel (Santa Rosa CA) LeFebvre Paul M. (Santa Rosa CA) Manley Barry W. (Boulder CO), Magnetron sputtering apparatus and process.
    상세보기
  43. Yamamoto Shigeo,JPX ; Maruyama Mitsuhiro,JPX, Making epitaxial semiconductor device.
    상세보기
  44. Ballingall ; III James M. (Fayetteville NY) Hersee Stephen D. (Manlius NY), Metal organic molecular beam epitaxy (MOMBE) apparatus.
    상세보기
  45. Versteeg Vera A. (Rochester NY) Avedisian C. Thomas (Ithaca NY) Raj Rishi (Ithaca NY), Method and apparatus for CVD using liquid delivery system with an ultrasonic nozzle.
    상세보기
  46. James J. Sun ; Benjamin Y. H. Liu, Method and apparatus for vapor generation and film deposition.
    상세보기
  47. Vaartstra Brian A. ; Atwell David, Method and apparatus for vaporizing liquid precursors and system for using same.
    상세보기
  48. Chen, Ling; Ku, Vincent W.; Chung, Hua; Marcadal, Christophe; Ganguli, Seshadri; Lin, Jenny; Wu, Dien-Yeh; Ouye, Alan; Chang, Mei, Method and apparatus of generating PDMAT precursor.
    상세보기
  49. Chen,Ling; Ku,Vincent W.; Chung,Hua; Marcadal,Christophe; Ganguli,Seshadri; Lin,Jenny; Wu,Dien Yeh; Ouye,Alan; Chang,Mei, Method and apparatus of generating PDMAT precursor.
    상세보기
  50. Kirlin Peter S. (Brookfield) Binder Robin L. (Bethlehem) Gardiner Robin A. (Bethel CT), Method for delivering an involatile reagent in vapor form to a CVD reactor.
    상세보기
  51. Rolfson J. Brett, Method for depositing doped amorphous or polycrystalline silicon on a substrate.
    상세보기
  52. Rolfson J. Brett, Method for depositing polysilicon with discontinuous grain boundaries.
    상세보기
  53. Brodsky Marc H. (Mt. Kisco NY) Scott Bruce A. (Pleasantville NY), Method for depositing silicon films and related materials by a glow discharge in a disiland or higher order silane gas.
    상세보기
  54. Nozaki Takao (Yokohama JPX) Ito Takashi (Kawasaki JPX) Arakawa Hideki (Yokohama JPX) Ishikawa Hajime (Yokohama JPX) Shinoda Masaichi (Sagamihara JPX), Method for forming a nitride insulating film on a silicon semiconductor substrate surface by direct nitridation.
    상세보기
  55. Hsieh, Jung-Yu; Lin, Chin-Hsiang, Method for forming nitride spacer by using atomic layer deposition.
    상세보기
  56. Suntola Tuomo,FIX ; Lindfors Sven,FIX, Method for growing thin films.
    상세보기
  57. Kitsuno Yu,JPX ; Yano Kotaro,JPX ; Tazawa Syoichi,JPX ; Matsuhira Shinya,JPX ; Nakajo Tetsuo,JPX, Method for producing a higher silane.
    상세보기
  58. Ballantine Arne W. ; Dunbar ; III George A. ; Hart ; III James V. ; Johnson Donna K. ; MacDougall Glenn C., Method for reducing dark current effects in a charge couple device.
    상세보기
  59. Sato Kazuo (Tokyo JPX), Method for supplying metal organic gas and an apparatus for realizing same.
    상세보기
  60. Turner Charles ; Thakur Randhir P. S., Method for uniformly doping hemispherical grain polycrystalline silicon.
    상세보기
  61. Vaartstra Brian A., Method of depositing films on semiconductor devices by using carboxylate complexes.
    상세보기
  62. Beinglass Israel (Sunnyvale CA) Venkatesan Mahalingam (San Jose CA), Method of enhancing step coverage of polysilicon deposits.
    상세보기
  63. Droopad Ravi ; Abrokwah Jonathan K. ; Passlack Matthias ; Yu Zhiyi Jimmy, Method of forming a silicon nitride layer.
    상세보기
  64. Shiozawa Junichi (Tokyo JPX), Method of forming boron doped silicon layer and semiconductor.
    상세보기
  65. Biro Laszlo (Sindelfingen DEX) Malin Konrad (Dettenhausen DEX) Schmid Otto (Holzgerlingen DEX), Method of forming silicon and oxygen containing layers.
    상세보기
  66. Yeong-Kwan Kim KR; Young-Wook Park KR; Seung-Hwan Lee KR, Method of forming silicon containing thin films by atomic layer deposition utilizing trisdimethylaminosilane.
    상세보기
  67. Kraft Robert ; Hattangady Sunil ; Grider Douglas T., Method of forming thin silicon nitride or silicon oxynitride gate dielectrics.
    상세보기
  68. Lindfors, Sven; Soininen, Pekka T., Method of growing a thin film onto a substrate.
    상세보기
  69. Hayama Hiroshi (Tokyo JPX) Uchida Hiroyuki (Tokyo JPX) Takechi Kazushige (Tokyo JPX), Method of growing an amorphous silicon film.
    상세보기
  70. Suzuki Hisanori (Sunnyvale CA) Matsudaira Takeo (Cupertino CA), Method of manufacturing magnetic recording medium for contact recording.
    상세보기
  71. Kobayashi Takashi (Kokubunji JPX) Iijima Shimpei (Akishima JPX) Hiraiwa Atsushi (Higashi-Murayama JPX) Kobayashi Nobuyoshi (Kawagoe JPX) Hashimoto Takashi (Hachiohji JPX) Nanba Mitsuo (Hinode JPX), Method of manufacturing semiconductor device.
    상세보기
  72. Tasaki Yuzo,JPX ; Sato Mamoru,JPX ; Yoshizawa Shuji,JPX ; Onoe Atsushi,JPX ; Chikuma Kiyofumi,JPX ; Yoshida Ayako,JPX, Method of subliming material in CVD film preparation method.
    상세보기
  73. Nakao Shuji,JPX, Method of surface processing.
    상세보기
  74. Thakur Randhir P. S. ; Breiner Lyle D., Method to form hemi-spherical grain (HSG) silicon.
    상세보기
  75. Thakur Randhir P. S. (Boise ID) Breiner Lyle D. (Boise ID), Method to form hemi-spherical grain (HSG) silicon from amorphous silicon.
    상세보기
  76. Seung-hwan Lee KR; Yeong-kwan Kim KR; Dong-chan Kim KR; Young-wook Park KR, Methods of forming thin films by atomic layer deposition.
    상세보기
  77. Ueda Tohru,JPX ; Fukushima Yasumori,JPX ; Yasuo Fumitoshi,JPX, Microstructure producing method capable of controlling growth position of minute particle or thin and semiconductor device employing the microstructure.
    상세보기
  78. Roeder Jeffrey ; Van Buskirk Peter C., Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions.
    상세보기
  79. Zeitlin, Andrew L.; Dariani, Maghsoud M., Phenidate drug formulations having diminished abuse potential.
    상세보기
  80. Vaartstra Brian A., Precursor mixtures for use in preparing layers on substrates.
    상세보기
  81. Reynolds Warren D. (3455 Spanish Way Carlsbad CA 92008), Process and apparatus for vapor transfer of very high purity liquids at high dilution.
    상세보기
  82. Tom Glenn M. (New Milford CT) McManus James V. (Danbury CT), Process and composition for purifying semiconductor process gases to remove Lewis acid and oxidant impurities therefrom.
    상세보기
  83. Wengert John F. ; Jacobs Loren R. ; Halpin Michael W. ; Foster Derrick W. ; van der Jeugd Cornelius A. ; Vyne Robert M. ; Hawkins Mark R., Process chamber with inner support.
    상세보기
  84. Hertz Dominique,FRX ; Belmonte Thierry,FRX ; Gavillet Jerome,FRX ; Michel Henri,FRX, Process for coating a passivatable metal or alloy substrate with an oxide layer, and fuel assembly cladding and guide tubes and spacer grid coated with an oxide layer.
    상세보기
  85. Beguwala Moiz M. E. (Placentia CA) Erdmann Francis M. (Anaheim CA), Process for direct thermal nitridation of silicon semiconductor devices.
    상세보기
  86. Azuma Kazufumi (Hiratsuka JPX) Nakatani Mitsuo (Yokohama JPX) Nate Kazuo (Machida JPX) Okunaka Masaaki (Fujisawa JPX) Yokono Hitoshi (Fujisawa JPX), Process for forming thin film.
    상세보기
  87. Aaltonen, Titta; Alén, Petra; Ritala, Mikko; Leskelä, Markku, Process for producing metal thin films by ALD.
    상세보기
  88. Miyagawa Hiroharu (Yokohama JPX) Itoh Masayoshi (Yokohama JPX) Abe Tomohiro (Yokosuka JPX) Iwata Kenji (Yokohama JPX) Koizumi Kyogo (Yokohama JPX), Process for producing silicon hydrides.
    상세보기
  89. Lee Eric K. (Acton MA) Kalyani Vinay J. (Tewksbury MA) Matson Stephen L. (Harvard MA), Process of treating alcoholic beverages by vapor-arbitrated pervaporation.
    상세보기
  90. Sneh Ofer, Radical-assisted sequential CVD.
    상세보기
  91. Twu Jih-Churng,TWX ; Jang Syun-Ming,TWX ; Yu Chen-Hua,TWX, Reduction of surface defects on amorphous silicon grown by a low-temperature, high pressure LPCVD process.
    상세보기
  92. Soininen,Pekka T., Safe liquid source containers.
    상세보기
  93. Ping Er-Xang ; Thakur Randhir P. S., Semiconductor processing method of providing a doped polysilicon layer.
    상세보기
  94. Sherman Arthur, Sequential chemical vapor deposition.
    상세보기
  95. Rossman, Kent, Si seasoning to reduce particles, extend clean frequency, block mobile ions and increase chamber throughput.
    상세보기
  96. Eiichi Okuno JP; Shinji Amano JP, Silicon carbide semiconductor device and method for manufacturing the same.
    상세보기
  97. Hultquist Steven J. ; Tom Glenn M. ; Kirlin Peter S. ; McManus James V., Sorbent-based gas storage and delivery system for dispensing of high-purity gas, and apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing same.
    상세보기
  98. Baum,Thomas H.; Xu,Chongying; Hendrix,Bryan C.; Roeder,Jeffrey F., Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same.
    상세보기
  99. Kirlin Peter S. ; Binder Robin L. ; Gardiner Robin A. ; Van Buskirk Peter ; Stauf Gregory ; Zhang Jiming, Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same.
    상세보기
  100. Olander, W. Karl, Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases.
    상세보기
  101. Pomarede, Christophe F.; Roberts, Jeff; Shero, Eric J., Surface preparation prior to deposition.
    상세보기
  102. Sajoto Talex ; Selyutin Leonid ; Zhao Jun ; Dornfest Charles, Temperature controlled gas feedthrough.
    상세보기
  103. Niimi, Hiroaki; Chambers, James J.; Khamankar, Rajesh; Grider, Douglas T., Temperature spike for uniform nitridization of ultra-thin silicon dioxide layers in transistor gates.
    상세보기
  104. Kubacki Ronald M. (10296 Alpine ; #C Cupertino CA 95014), Thin film deposition apparatus using an RF glow discharge.
    상세보기
  105. Rounbehler David P. (Bedford MA) Achter Eugene K. (Lexington MA) Lieb David P. (Lexington MA) Fine David H. (Sudbury MA) Hainsworth Eugenie (Arlington MA) Carroll Alf L. (Cohasset MA) Wendell Gregory, Vapor collector/desorber with non-conductive tube bundle.
    상세보기
  106. Partus Fred P. (Cobbs County GA), Vapor delivery control system and method.
    상세보기
  107. Atwell David R. (Boise ID) Westmoreland Donald L. (Boise ID), Vapor delivery system for solid precursors and method regarding same.
    상세보기
  108. McMenamin Joseph C. (Fresno CA), Vapor mass flow control system.
    상세보기
  109. McMenamin Joseph C. (Oceanside CA), Vapor mass flow control system.
    상세보기
  110. Somekh Sasson ; Zhao Jun ; Dornfest Charles ; Sajoto Talex ; Selyutin Leonid ; Ku Vincent ; Wang Chris ; Chang Frank ; Tang Po, Vaporization and deposition apparatus.
    상세보기
  111. Dornfest Charles ; Zhao Jun ; Ku Vincent ; Tang Po ; Sajoto Talex ; Chang Frank, Vaporization apparatus and process.
    상세보기
  112. Coates John R. (Abingdon GB2) East Ralph J. (Drayton Abingdon GB2) Sugg Basil R. (Oxford GB2), Vaporizers and wick assemblies therefor.
    상세보기
  113. Shields Virgil B. (Compton CA) Ryan Margaret A. (Pasadena CA) Williams Roger M. (Azusa CA), Varying potential silicon carbide gas sensor.
    상세보기
  114. Kim Seun Kyung (7226 N. Bell Ave. Chicago IL 60645), Vehicular pollution control muffler.
    상세보기

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