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[미국특허] Liquid-particle analysis of metal materials 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G01N-033/20
출원번호 US-0331489 (2006-01-13)
등록번호 US8030082 (2011-09-19)
발명자 / 주소
  • Strothers, Susan D.
  • Kardokus, Janine K.
  • Clark, Brett M.
출원인 / 주소
  • Honeywell International Inc.
인용정보 피인용 횟수 : 1  인용 특허 : 62

초록 ▼

The invention includes a method of detecting impurities in a metal-containing article. A portion of metal material is removed from a metal article and is solubilized in an acid or base-comprising liquid to produce a liquid sample. The liquid sample is subjected to an incident laser beam and light sc

대표청구항 ▼

The invention claimed is: 1. A method of detecting impurities in a metal-containing article, comprising: providing an article comprising a metal material;solubilizing a portion of metal material in a liquid to produce a liquid sample containing undissolved impurities, the liquid being one of an acid

이 특허에 인용된 특허 (62) 인용/피인용 타임라인 분석

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  25. Roder Rudolf,CHX ; Witschi Marcel,CHX, Method and apparatus for improving the quality of continuously cast metal.
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  26. Rudolf Roder CH; Marcel Witschi CH, Method and apparatus for improving the quality of continuously cast metal.
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  27. Kono Kaname,JPX, Method and apparatus for manufacturing metallic parts by fine die casting.
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  30. Kono Kaname,JPX, Method and apparatus for manufacturing metallic parts by injection molding from the semi-solid state.
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  32. Haun Robert E. ; Lampson Robin A., Method and apparatus for melting and pouring specialty metals.
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  33. Clyde D. Doney, Method and apparatus for producing investment castings in a vacuum.
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  57. Torstein Utigard CA; Alejandro Bustos CA, Use of gaseous mixture containing an inert gas and an oxygen containing gas in desulphurization of blister copper during anode refining.
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  58. Ota Atushi (Toyota JPX) Arakawa Yasuyuki (Nagoya JPX) Hasegawa Tamotsu (Nagoya JPX), Vacuum casting apparatus.
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  62. Ohnuma Hiroshi,JPX ; Kubo Kimio,JPX ; Mikami Akira,JPX ; Ikejiri Taichi,JPX ; Kurose Katuhiro,JPX ; Hagiwara Hiroyuki,JPX, Vacuum casting method and vacuum casting apparatus.
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이 특허를 인용한 특허 (1) 인용/피인용 타임라인 분석

  1. Kim, Jinho; Kim, Jiyoung; Yoon, Jeong-In; Lim, Kwangshin, Particle counter and immersion exposure system including the same.
    상세보기

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