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Semiconductor processing apparatus which is formed from yttrium oxide and zirconium oxide to produce a solid solution ceramic apparatus 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C04B-035/505
출원번호 US-0660068 (2010-02-19)
등록번호 US8034734 (2011-09-27)
발명자 / 주소
  • Sun, Jennifer Y.
  • Duan, Ren-Guan
  • Yuan, Jie
  • Xu, Li
  • Collins, Kenneth S.
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Shirley L., Church, Esq
인용정보 피인용 횟수 : 44  인용 특허 : 29

초록

A solid solution-comprising ceramic article useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas. The solid solution-comprising ceramic article is formed from a combination of yttrium oxide and zirconium oxide. In a first embodiment, the ceramic article inc

대표청구항

We claim: 1. A bulk ceramic article which is resistant to erosion by halogen-containing plasmas used in semiconductor processing, where said bulk ceramic article formed from yttrium oxide at a molar concentration ranging from about 90 mole % to about 70 mole %, and zirconium oxide at a molar concent

이 특허에 인용된 특허 (29)

  1. Oehrlein Gottlieb Stefan ; Vender David,NLX ; Zhang Ying ; Haverlag Marco,NLX, Apparatus for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve pr.
  2. O'Donnell, Robert J.; Daugherty, John E.; Chang, Christopher C., Boron nitride/yttria composite components of semiconductor processing equipment and method of manufacturing thereof.
  3. Han Nianci ; Shih Hong ; Yuan Jie ; Lu Danny ; Ma Diana, Ceramic composition for an apparatus and method for processing a substrate.
  4. Nianci Han ; Hong Shih ; Jie Yuan ; Danny Lu ; Diana Ma, Ceramic composition for an apparatus and method for processing a substrate.
  5. Murakawa, Shunichi; Itoh, Yumiko; Aida, Hiroshi; Nakamura, Katsumi; Hayasaki, Tetsuzi, Ceramic material resistant to halogen plasma and member utilizing the same.
  6. Shunichi Murakawa JP; Yumiko Itoh JP; Hiroshi Aida JP; Katsumi Nakamura JP; Tetsuzi Hayasaki JP, Ceramic materials resistant to halogen plasma and components using the same.
  7. Masahiro Nakahara JP; Yumiko Itoh JP, Ceramic member resistant to halogen-plasma corrosion.
  8. Keiji Morita JP; Mitsuhiro Fujita JP; Haruo Murayama JP, Ceramics material and producing the same.
  9. O'Donnell, Robert J.; Daugherty, John E., Cerium oxide containing ceramic components and coatings in semiconductor processing equipment and methods of manufacture thereof.
  10. Ozono, Shunichi, Container for treating with corrosive-gas and plasma and method for manufacturing the same.
  11. Waku Yoshiharu,JPX ; Nakagawa Narihito,JPX ; Ohtsubo Hideki,JPX ; Wakamoto Takumi,JPX ; Shimizu Kazutoshi,JPX ; Kohtoku Yasuhiko,JPX, Fused ceramic composite.
  12. Noorbakhsh,Hamid; Carducci,James D.; Sun,Jennifer Y.; Elizaga,Larry D., Gas distribution showerhead for semiconductor processing.
  13. Yamada, Hirotake; Katsuda, Yuji; Ohashi, Tsuneaki; Masuda, Masaaki; Harada, Masashi; Iwasaki, Hiroyuki; Ito, Shigenori, Halogen gas plasma-resistive members and method for producing the same, laminates, and corrosion-resistant members.
  14. Harada, Yoshio; Takeuchi, Junichi; Hamaguchi, Tatsuya; Nagayama, Nobuyuki; Mitsuhashi, Kouji, Internal member for plasma-treating vessel and method of producing the same.
  15. O'Donnell, Robert J., Low contamination components for semiconductor processing apparatus and methods for making components.
  16. Saigusa,Hidehito; Takase,Taira; Mitsuhashi,Kouji; Nakayama,Hiroyuki, Method and apparatus for an improved baffle plate in a plasma processing system.
  17. Saigusa,Hidehito; Takase,Taira; Mitsuhashi,Kouji; Nakayama,Hiroyuki, Method and apparatus for an improved deposition shield in a plasma processing system.
  18. Nishimoto,Shinya; Mitsuhashi,Kouji; Saigusa,Hidehito; Takase,Taira; Nakayama,Hiroyuki, Method and apparatus for an improved optical window deposition shield in a plasma processing system.
  19. Saigusa,Hidehito; Takase,Taira; Mitsuhashi,Kouji; Nakayama,Hiroyuki, Method and apparatus for an improved upper electrode plate in a plasma processing system.
  20. Nishimoto,Shinya; Mitsuhashi,Kouji; Nakayama,Hiroyuki, Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system.
  21. Sun, Jennifer Y.; Duan, Ren-Guan; Yuan, Jie; Xu, Li; Collins, Kenneth S., Method and apparatus which reduce the erosion rate of surfaces exposed to halogen-containing plasmas.
  22. Harada, Yoshio; Takeuchi, Junichi; Hamaguchi, Tatsuya; Nagayama, Nobuyuki; Mitsuhashi, Kouji, Plasma processing container internal member and production method thereof.
  23. Morita, Kenji; Ueno, Hiroko; Murayama, Haruo, Plasma-resistant articles and production method thereof.
  24. Shamouilian, Shamouil; Sun, Jennifer Y.; Kumar, Ananda H., Process chamber having a corrosion-resistant wall and method.
  25. Han, Nianci; Xu, Li; Shih, Hong, Process chamber having component with yttrium-aluminum coating.
  26. Han, Nianci; Shih, Hong; Yuan, Jie; Lu, Danny; Ma, Diana, Substrate processing using a member comprising an oxide of a group IIIB metal.
  27. Chang,Chris, Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components.
  28. Sun, Jennifer Y; Wu, Shun Jackson; Thach, Senh; Kumar, Ananda H; Wu, Robert W; Wang, Hong; Lin, Yixing; Stow, Clifford C, Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers.
  29. O'Donnell,Robert J.; Chang,Christopher C.; Daugherty,John E., Zirconia toughened ceramic components and coatings in semiconductor processing equipment and method of manufacture thereof.

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