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Semiconductor light-emitting structure and graded-composition substrate providing yellow-green light emission 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-029/06
출원번호 US-0823860 (2007-06-28)
등록번호 US8063397 (2011-11-07)
발명자 / 주소
  • Mori, Michael J.
  • Fitzgerald, Eugene A.
출원인 / 주소
  • Massachusetts Institute of Technology
대리인 / 주소
    Wolf, Greenfield & Sacks, P.C.
인용정보 피인용 횟수 : 9  인용 특허 : 33

초록

Semiconductor light-emitting structures are shown on engineered substrates having a graded composition. The composition of the substrate may be graded to achieve a lattice constant on which a yellow-green light-emitting semiconductor material may be disposed. In some embodiments, the structure may b

대표청구항

What is claimed is: 1. A device for emitting light, the device comprising:a substrate comprising a first region, the first region having a graded composition of GaAsP such that a lattice constant of the first region varies within the first region, the graded composition being graded along a thicknes

이 특허에 인용된 특허 (33)

  1. Francois J. Henley ; Michael A. Brayan ; William G. En, Cleaving process to fabricate multilayered substrates using low implantation doses.
  2. Ismail Khaled E. (Cairo NY EGX) Stern Frank (Pleasantville NY), Complementary metal-oxide semiconductor transistor logic using strained SI/SIGE heterostructure layers.
  3. Francois J. Henley ; Nathan W. Cheung, Controlled cleavage thin film separation process using a reusable substrate.
  4. Henley, Francois J.; Cheung, Nathan W., Controlled cleaving process.
  5. Fitzgerald Eugene A., Controlling threading dislocation densities in Ge on Si using graded GeSi layers and planarization.
  6. Fitzgerald Eugene A., Controlling threading dislocation densities in Ge on Si using graded GeSi layers and planarization.
  7. Matsumoto Takashi (Tokyo JPX), Epitaxial layer structure grown on graded substrate and method of growing the same.
  8. Nathan W. Cheung ; Francois J. Henley, Generic layer transfer methodology by controlled cleavage process.
  9. Henley, Francois J.; Cheung, Nathan W., Gettering technique for wafers made using a controlled cleaving process.
  10. Mawst Luke J. ; Botez Dan ; Al-Muhanna Abdulrahman ; Wade Jerome Kent, High performance aluminum free active region semiconductor lasers.
  11. Francois J. Henley ; Michael A. Bryan ; William G. En, High temperature implant apparatus.
  12. Legoues Francoise Kolmer ; Meyerson Bernard Steele, Low defect density/arbitrary lattice constant heteroepitaxial layers.
  13. Fitzgerald, Eugene A., Low threading dislocation density relaxed mismatched epilayers without high temperature growth.
  14. Fitzgerald, Eugene A., Low threading dislocation density relaxed mismatched epilayers without high temperature growth.
  15. Sukegawa Tokuzo (Hamamatsu JPX) Tadatomo Kazuyuki (Itami JPX), Material for light emitting element and method for crystal growth thereof.
  16. Brasen Daniel (Lake Hiawatha NJ) Fitzgerald ; Jr. Eugene A. (Bridgewater NJ) Green Martin L. (New Providence NJ) Xie Ya-Hong (Flemington NJ), Method for making low defect density semiconductor heterostructure and devices made thereby.
  17. Fitzgerald, Eugene A., Method of fabricating a relaxed silicon germanium platform having planarizing for high speed CMOS electronics and high speed analog circuits.
  18. Murthy, Anand; Soman, Ravindra; Boyanov, Boyan, Method of forming a germanium film on a semiconductor substrate that includes the formation of a graded silicon-germanium buffer layer prior to the formation of a germanium layer.
  19. Noguchi, Takashi; Soneda, Mitsuo, Method of forming n-and p- channel field effect transistors on the same silicon layer having a strain effect.
  20. Kim, Andrew Y.; Fitzgerald, Eugene A., Method of producing device quality (Al)InGaP alloys on lattice-mismatched substrates.
  21. Henley Francois J. ; Cheung Nathan W., Pre-semiconductor process implant and post-process film separation.
  22. Bruel Michel,FRX, Process for the manufacture of thin films of semiconductor material.
  23. Bruel Michel (Veurey FRX), Process for the production of thin semiconductor material films.
  24. Takeshi Takagi JP, Semiconductor device.
  25. Nitta Koichi (Kawasaki) Ishikawa Masayuki (Tokyo) Nishikawa Yukie (Narashino) Sugawara Hideto (Tokyo) Watanabe Minoru (Tokyo) Okajima Masaki (Kawasaki) Hatakoshi Genichi (Yokohama JPX), Semiconductor device having an active layer made of InGaAlP material.
  26. Esaki Leo (Katonah NY) Chang Leroy L. (Goldens Bridge NY) Wang Wen-I (Putnam Valley NY), Semiconductor device with hole conduction via strained lattice.
  27. Brasen Daniel (Lake Hiawatha NJ) Fitzgerald ; Jr. Eugene A. (Bridgewater NJ) Green Martin L. (New Providence NJ) Monroe Donald P. (Berkeley Heights NJ) Silverman Paul J. (Millburn NJ) Xie Ya-Hong (Fl, Semiconductor heterostructure devices with strained semiconductor layers.
  28. Ramdani Jamal (Gilbert AZ) Lebby Michael S. (Apache Junction AZ) Grodzinski Piotr (Chandler AZ), Short wavelength VCSEL.
  29. Fitzergald, Eugene A., Silicon wafer with embedded optoelectronic material for monolithic OEIC.
  30. Srikrishnan Kris V., Smart-cut process for the production of thin semiconductor material films.
  31. Fitzgerald Eugene A. ; Samavedam Srikanth B., Utilization of miscut substrates to improve relaxed graded silicon-germanium and germanium layers on silicon.
  32. Yap, Daniel, Waveguide-bonded optoelectronic devices.
  33. McGill,Lisa; Fitzgerald,Eugene A., Yellow-green epitaxial transparent substrate-LEDs and lasers based on a strained-InGaP quantum well grown on an indirect bandgap substrate.

이 특허를 인용한 특허 (9)

  1. Fitzgerald, Eugene A.; Sharma, Prithu; Milakovich, Timothy, Controlling GaAsP/SiGe interfaces.
  2. Alberi, Kirstin; Mascarenhas, Angelo; Wanlass, Mark, High bandgap III-V alloys for high efficiency optoelectronics.
  3. Lee, Sang-hun; Park, Chang-young; Kwon, Jong-oh; Park, Yong-hwa, Infrared transmission large-area shutter.
  4. Mascarenhas, Angelo; Steiner, Myles A.; Bhusal, Lekhnath; Zhang, Yong, Lattice-mismatched GaInP LED devices and methods of fabricating same.
  5. Chen, Li-Yi; Lee, Hsin-Wei, Light-emitting diode and method for manufacturing the same.
  6. Beck, Markus Eberhard; Nagle, Timothy J.; Basu, Sourav Roger, Methods of forming thin-film photovoltaic devices with discontinuous passivation layers.
  7. Beck, Markus Eberhard; Nagle, Timothy J.; Basu, Sourav Roger, Methods of forming thin-film photovoltaic devices with discontinuous passivation layers.
  8. Beck, Markus Eberhard; Nagle, Timothy J.; Basu, Sourav Roger, Methods of forming thin-film photovoltaic devices with discontinuous passivation layers.
  9. Ye, Zhiyuan; Sanchez, Errol Antonio C.; Ban, Keun-Yong; Bao, Xinyu, Structure for relaxed SiGe buffers including method and apparatus for forming.
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