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Plasma uniformity control by gas diffuser curvature 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/455
출원번호 US-0173210 (2005-07-01)
등록번호 US8074599 (2011-11-29)
발명자 / 주소
  • Choi, Soo Young
  • Park, Beom Soo
  • White, John M.
  • Tiner, Robin L.
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Patterson & Sheridan, L.L.P.
인용정보 피인용 횟수 : 148  인용 특허 : 113

초록 ▼

Embodiments of a gas distribution plate for distributing gas in a processing chamber are provided. In one embodiment, a gas distribution assembly for a plasma processing chamber comprises a diffuser plate with gas passages passing between its upstream and downstream sides and hollow cathode cavities

대표청구항 ▼

The invention claimed is: 1. A gas distribution plate assembly for a plasma processing chamber, comprising:a diffuser plate having an upstream side, a downstream side, a plurality of cathode cavities in a center region, and a plurality of cathode cavities in an edge region, wherein the downstream si

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