IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0620205
(2007-01-05)
|
등록번호 |
US8075715
(2011-11-29)
|
발명자
/ 주소 |
- Ashcroft, Benjamin N.
- Nielson, Daniel B.
- Doll, Daniel W.
|
출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
6 인용 특허 :
111 |
초록
▼
A precursor composition of a reactive material that comprises a metal material and an energetic material, such as at least one oxidizer or at least one class 1.1 explosive. The metal material defines a continuous phase at a processing temperature of the precursor composition and the energetic materi
A precursor composition of a reactive material that comprises a metal material and an energetic material, such as at least one oxidizer or at least one class 1.1 explosive. The metal material defines a continuous phase at a processing temperature of the precursor composition and the energetic material is dispersed therein. The metal material may be a fusible metal alloy having a melting point ranging from approximately 46° C. to approximately 250° C. The fusible metal alloy may include at least one metal selected from the group consisting of bismuth, lead, tin, cadmium, indium, mercury, antimony, copper, gold, silver, and zinc. The reactive composition may have a density of greater than approximately 2 g/cm3. The reactive composition may also include a polymer/plasticizer system.
대표청구항
▼
What is claimed is: 1. A precursor composition of a reactive material, comprising:a metal material comprising at least one oxidizer dispersed therein, the metal material defining a continuous phase at a processing temperature of a precursor composition of a reactive material and comprising bismuth,
What is claimed is: 1. A precursor composition of a reactive material, comprising:a metal material comprising at least one oxidizer dispersed therein, the metal material defining a continuous phase at a processing temperature of a precursor composition of a reactive material and comprising bismuth, indium, and tin, and the at least one oxidizer selected from the group consisting of ammonium perchlorate, potassium perchlorate, sodium nitrate, potassium nitrate, ammonium nitrate, lithium nitrate, rubidium nitrate, cesium nitrate, lithium perchlorate, sodium perchlorate, rubidium perchlorate, cesium perchlorate, magnesium perchlorate, calcium perchlorate, strontium perchlorate, barium perchlorate, barium peroxide, strontium peroxide, copper oxide, sulfur, and mixtures thereof.
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