초록

In one aspect of the invention, systems, methods, and devices are provided for handling liquid. In some embodiments, such systems, methods, and devices are used to combine fluids while removing gaseous bubbles.

대표청구항 ▼

What is claimed is: 1. An apparatus for removing gas bubbles from a mixture of a first fluid and a second fluid, the apparatus comprising:a first substrate, wherein the first substrate forms a top surface of a bubble removal chamber;a second substrate, wherein the second substrate forms a bottom sur

What is claimed is: 1. An apparatus for removing gas bubbles from a mixture of a first fluid and a second fluid, the apparatus comprising:a first substrate, wherein the first substrate forms a top surface of a bubble removal chamber;a second substrate, wherein the second substrate forms a bottom surface of the bubble removal chamber, wherein the bottom surface comprises a chamber entrance and a substrate coating, wherein a lower portion of the bottom surface comprises a first radius, wherein an upper portion of the bottom surface comprises a second radius, wherein the second radius is different than the first radius, and wherein the substrate coating and the first and second radii are adapted to retain the mixture of the first and second fluids within the lower portion while the gas bubbles dissipate into the chamber;a third substrate, wherein the second and third substrates form one or more inlet channels, wherein the one or more inlet channels comprise at least one inlet opening, and wherein the one or more inlet channels are designed to provide fluidic communication between the at least one inlet opening and the bubble removal chamber such that fluids enter the bubble removal chamber through the chamber entrance; anda venting channel, wherein the venting channel is connected with the bubble removal chamber and is designed to facilitate the exit of gas from the chamber.