Mass flow rate-controlling apparatus
원문보기
IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
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출원번호 |
US-0572046
(2005-02-03)
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등록번호 |
US-8112182
(2012-02-07)
|
우선권정보 |
JP-2004-027306 (2004-02-03) |
국제출원번호 |
PCT/JP2005/001622
(2005-02-03)
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§371/§102 date |
20070109
(20070109)
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국제공개번호 |
WO2005/076095
(2005-08-18)
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발명자
/ 주소 |
- Tokuhisa, Yasukazu
- Gotoh, Takao
- Matsuoka, Tohru
- Suzuki, Shigehiro
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출원인 / 주소 |
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대리인 / 주소 |
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인용정보 |
피인용 횟수 :
6 인용 특허 :
3 |
초록
▼
A mass flow rate-controlling apparatus including a mass flow rate-detecting mechanism 8 a flow rate-controlling valve mechanism 10 and a mechanism 44 for controlling the flow rate-controlling valve mechanism based on a flow rate-setting signal S0 input from outside and a flow rate signal S1, the flo
A mass flow rate-controlling apparatus including a mass flow rate-detecting mechanism 8 a flow rate-controlling valve mechanism 10 and a mechanism 44 for controlling the flow rate-controlling valve mechanism based on a flow rate-setting signal S0 input from outside and a flow rate signal S1, the flow path being provided with a pressure-detecting mechanism 42 for detecting the pressure of the fluid to output the detected pressure signal, so that the controlling mechanism selectively switches a first control mode for controlling the mass flow rate based on the flow rate signal and the flow rate-setting signal without using the detected pressure signal, and a second control mode for controlling the mass flow rate based on the detected pressure signal, the flow rate signal and the flow rate-setting signal, based on a pressure variation obtained from the detected pressure signal.
대표청구항
▼
1. A mass flow rate controlling apparatus comprising a mass flow rate-detecting means attached to a fluid flow path, through which a fluid is supplied, for detecting a mass flow rate at predetermined time intervals, a flow rate-controlling valve mechanism attached to said fluid flow path for changin
1. A mass flow rate controlling apparatus comprising a mass flow rate-detecting means attached to a fluid flow path, through which a fluid is supplied, for detecting a mass flow rate at predetermined time intervals, a flow rate-controlling valve mechanism attached to said fluid flow path for changing a valve-opening degree in response to a valve operating signal to control said mass flow rate, a controlling means for supplying said valve-operating voltage to said flow rate controlling valve mechanism, and a pressure-detecting means attached to said fluid flow path for detecting the pressure of said fluid at predetermined time intervals; wherein a pressure variation is obtained from the detected pressure;wherein said controlling means uses a first control mode for controlling said mass flow rate when said pressure variation is less than a predetermined threshold value;wherein in said first control mode, said controlling means stores a newest detected mass flow rate, a newest detected pressure and a newest valve-operating voltage for a current time interval;wherein in said first control mode, said controlling means compares a present mass flow rate signal obtained from said mass flow rate-detecting means with an externally input flow rate-setting signal to determine said valve-operating voltage;wherein said controlling means switches said first control mode to a second control mode when said pressure variation becomes equal to or more than said predetermined threshold value; andwherein in said second control mode, said controlling means determines said valve-operating voltage from the newest mass flow rate, the newest detected pressure and the newest valve operating voltage stored in said first control mode, a currently detected pressure, and valve characteristics stored in advance. 2. The mass flow rate-controlling apparatus according to claim 1, wherein said valve-operating voltage Vn in said second control mode is determined by the following formula (1); Vn=Vb+(1−Pb/Pn)/k (1),wherein Vb is the newest valve-operating voltage, Pb is the newest detected pressure, Pn is the currently detected pressure, and k is a flow rate variation ratio per a unit volt at the valve-operating voltage before the pressure variation becomes equal to or more than the predetermined threshold value. 3. The mass flow rate-controlling apparatus according to claim 1, wherein said controlling means outputs a mass flow rate before said pressure variation reaches said predetermined threshold value as a flow rate output signal in said second control mode. 4. The mass flow rate-controlling apparatus according to claim 1, wherein said fluid path is provided with said pressure-detecting means, said mass flow rate-detecting means and said flow rate-controlling valve mechanism in this order from the upstream side. 5. The mass flow rate-controlling apparatus according to claim 1, wherein said fluid path is provided with said mass flow rate-detecting means, said pressure-detecting means and said flow rate-controlling valve mechanism in this order from the upstream side. 6. The mass flow rate-controlling apparatus according to claim 1, wherein said flow rate-controlling valve mechanism comprises an actuator comprising a piezoelectric element. 7. The mass flow rate-controlling apparatus according to claim 1, wherein said flow rate-controlling valve mechanism comprises an electromagnetic actuator. 8. The mass flow rate-controlling apparatus according to claim 1, wherein said fluid path comprises an orifice in the most upstream portion. 9. The mass flow rate-controlling apparatus according to claim 1, wherein said fluid path comprises an orifice in the most downstream portion. 10. The mass flow rate-controlling apparatus according to claim 1, wherein said controlling means comprises RAM and ROM in combination.
이 특허에 인용된 특허 (3)
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Teer, Jr., Robert J.; Arias, James L.; Kowals, John S., Liquid filling control method for multiple tanks.
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Ellie Yieh ; Li-Qun Xia ; Srinivas Nemani, Methods and apparatus for shallow trench isolation.
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Hanazaki Minoru,JPX ; Ikushima Takayuki,JPX ; Shirakawa Kenji,JPX ; Yamaguchi Shinji,JPX ; Taki Masakazu,JPX, Plasma processing method and plasma processing apparatus.
이 특허를 인용한 특허 (6)
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Ohtsuki, Haruaki; Sonoda, Masashi, Flow control apparatus and program.
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Mudd, Daniel T.; Mudd, Patti J., Flow control system, method, and apparatus.
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Minervini, Leo; Mrozinski, Daniel W., Knowledge based valve control method.
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Nichols, Jon; Keller, Michael; Schrock, Audrey; Sims, Carl; Servin, Carl, Liquid sampling valve.
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Nichols, Jon; Keller, Michael; Schrock, Audrey; Sims, Carl; Servin, Carl, Liquid sampling valve.
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Sims, Carl, Volumetric flow regulation in multi-dimensional liquid analysis systems.
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