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An apparatus including a controller, a workpiece transport in communication with the controller having a movable portion and a transport path, and a multi-dimensional position measurement device including at least one field generating platen attached to the movable portion and at least one sensor gr

An apparatus including a controller, a workpiece transport in communication with the controller having a movable portion and a transport path, and a multi-dimensional position measurement device including at least one field generating platen attached to the movable portion and at least one sensor group positioned along the transport path and in communication with the controller, the field generating platen is configured for position measurement and propelling the movable portion, each sensor in the at least one sensor group is configured to provide but one output signal along a single axis corresponding to a sensed field generated by the at least one field generating platen and the controller is configured calculate a multi-dimensional position of the movable portion based on the but one output signal of at least one of the sensors in the at least one sensor group, the multi-dimensional position including a planar position and a gap measurement.

대표청구항 ▼

1. An apparatus comprising: a controller;a workpiece transport in communication with the controller having a movable portion and a transport path; anda multi-dimensional position measurement device including at least one field generating platen attached to the movable portion and at least one sensor

1. An apparatus comprising: a controller;a workpiece transport in communication with the controller having a movable portion and a transport path; anda multi-dimensional position measurement device including at least one field generating platen attached to the movable portion and at least one sensor group positioned along the transport path and in communication with the controller, where the field generating platen is configured for both position measurement and propelling the movable portion;wherein each sensor in the at least one sensor group is configured to provide but one output signal corresponding to variances along a single axis in a sensed field generated by the at least one field generating platen and the controller is configured to calculate a multi-dimensional position of the movable portion adjacent a respective one of the at least one sensor group based on the but one output signal of at least one of the sensors in the at least one sensor group, where the multi-dimensional position includes at least a planar position and a gap between the workpiece transport and the at least one sensor group. 2. The apparatus of claim 1, wherein the at least one field generating platen comprises shaped magnets configured to provide a substantially undistorted sinusoidal magnetic field. 3. The apparatus of claim 1, wherein at least one of the at least one sensor group is configured to sense a normal component of a field generated by the field generating platen, where the normal component is normal to a surface of the field generating platen. 4. The apparatus of claim 1, wherein at least one of the at least one sensor group is configured to sense parallel components of a field generated by the field generating platen, where the parallel components are parallel to a surface of the field generating platen. 5. The apparatus of claim 1, wherein at least one of the at least one sensor group comprises singular sensors and at least another of at the least one sensor group comprises sensor doublets, wherein output signals provided by sensors in the sensor doublets have a sine/cosine relationship. 6. The apparatus of claim 1, wherein at least one of the at least one sensor group comprises sensor doublets, where output signals provided by sensors in the sensor doublet have a sine/cosine relationship. 7. The apparatus of claim 1, wherein at least one of the at least one sensor group comprises a first sensor pair and a second sensor pair, where the first sensor pair is located above the second sensor pair in a staggered relationship. 8. The apparatus of claim 1, wherein at least one of the at least one sensor group comprises a first sensor pair and a second sensor pair, where the first sensor pair is located between the second sensor pair in an orthogonal relationship. 9. The apparatus of claim 1, wherein the at least one sensor group is located proximate the at least one field generating platen such that sensors in the at least one sensor group reach saturation limits. 10. The position measurement system of claim 1, wherein the controller is configured to adjust a sinusoidal period of the output received from the at least one sensor group such that a position measurement obtained from the adjusted signal is more accurate than a position measurement obtained from an output having an unadjusted sinusoidal period.