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Precursor delivery system 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • C23C-016/00
  • C23C-016/455
  • C23C-016/448
출원번호 US-0870374 (2007-10-10)
등록번호 US-8137462 (2012-03-20)
발명자 / 주소
  • Fondurulia, Kyle
  • Shero, Eric
  • Verghese, Mohith E
  • White, Carl L
출원인 / 주소
  • ASM America, Inc.
대리인 / 주소
    Knobbe Martens Olson & Bear LLP
인용정보 피인용 횟수 : 92  인용 특허 : 22

초록

A precursor source vessel comprises a vessel body, a passage within the vessel body, and a valve attached to a surface of the body. An internal chamber is adapted to contain a chemical reactant, and the passage extends from outside the body to the chamber. The valve regulates flow through the passag

대표청구항

1. A chemical reactant source vessel in combination with a gas delivery system for a vapor phase reactor for vapor processing of substrates, comprising: a vessel body defining an internal chamber adapted to contain a solid or liquid chemical reactant, wherein the vessel body includes an inlet and an

이 특허에 인용된 특허 (22)

  1. Lei, Lawrence C., Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition.
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