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A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orific

A device is disclosed herein which may include a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing the spacing between at least some adjacent droplets to decrease as the droplets travel to the irradiation region.

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1. A device comprising: a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region to form a plasma, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and

1. A device comprising: a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region to form a plasma, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and a sub-system producing a disturbance in the fluid which generates droplets having differing initial velocities causing the spacing between at least some adjacent droplets to decrease as the droplets travel to the irradiation region. 2. A device as recited in claim 1 wherein at least some adjacent droplets coalesce prior to reaching the irradiation region. 3. A device as recited in claim 1 wherein said sub-system produces a droplet pattern wherein droplet doublets reach the irradiation site with each droplet in the droplet doublet being irradiated to produce plasma. 4. A device as recited in claim 3 wherein at least one droplet in the droplet doublet has a diameter, d, approaching the irradiation region, and center-to-center droplet spacing within each doublet, D, with d≦D≧4d. 5. A device as recited in claim 1 wherein the disturbance comprises a frequency modulated disturbance waveform. 6. A device as recited in claim 1 wherein the disturbance comprises an amplitude modulated disturbance waveform. 7. A device as recited in claim 1 wherein the sub-system produces a series of pulsed disturbances, with each pulsed disturbance having at least one of a sufficiently short rise-time and sufficiently short fall-time to generate a fundamental frequency and at least one harmonic of the fundamental frequency. 8. A device comprising: a plasma generating system comprising a source of target material droplets and a laser producing a beam irradiating the droplets at an irradiation region to form a plasma, the plasma producing EUV radiation, wherein the droplet source comprises a fluid exiting an orifice and a sub-system having an electro-actuatable element producing a disturbance in the fluid, the electro-actuatable element driven by a waveform having at least one of a sufficiently short rise-time and a sufficiently short fall-time to generate a fundamental frequency within an operable response range of the electro-actuatable element and at least one harmonic of the fundamental frequency. 9. A device as recited in claim 8 wherein the waveform is selected from the group of waveforms consisting of a square wave, rectangular wave and peaked-non-sinusoidal wave. 10. A device as recited in claim 8 wherein a peaked-non-sinusoidal wave is selected from the group of waveforms consisting of a fast pulse waveform, a fast ramp waveform and a sinc function waveform. 11. A device as recited in claim 8 wherein the at least one harmonic is an odd harmonic of the fundamental frequency. 12. A device as recited in claim 8 wherein the at least one harmonic comprises at least one even harmonic of the fundamental frequency and at least one odd harmonic of the fundamental frequency. 13. A device as recited in claim 8 wherein the waveform generates droplets having differing initial velocities causing the spacing between at least some adjacent droplets to decrease as the droplets travel to the irradiation region. 14. A device as recited in claim 13 wherein at least some adjacent droplets coalesce prior to reaching the irradiation region. 15. A device as recited in claim 8 wherein each pulse of said waveform is generated by changing an on-off switch state. 16. A method comprising the steps of: flowing a fluid toward an orifice;disturbing the fluid to generate a first droplet and a second droplet, the first droplet having a different initial velocity than that of the second droplet causing the spacing between the first and second droplets to decrease as the droplets travel to an irradiation region; andirradiating droplet material at the irradiation region to form a plasma. 17. A method as recited in claim 16 wherein the first and second droplets coalesce prior to reaching the irradiation region. 18. A method as recited in claim 16 wherein the disturbance comprises a waveform selected from the group of modulated waveforms consisting of a frequency modulated disturbance waveform and an amplitude modulated disturbance waveform. 19. A method as recited in claim 16 wherein the step of disturbing the fluid comprises producing a series of pulsed disturbances, with each pulsed disturbance having at least one of a sufficiently short rise-time and a sufficiently short fall-time to generate a fundamental frequency and at least one sub-harmonic of the fundamental frequency. 20. A method as recited in claim 19 wherein the pulsed disturbance is selected from the group of disturbance waveforms consisting of a square wave, rectangular wave, and peaked non-sinusoidal wave.