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A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibra

A lithographic apparatus includes a projection system to project a patterned radiation beam onto a substrate, and a damping system to dampen a vibration of at least part of the projection system, the damping system including an interface damping mass and an active damping subsystem to dampen a vibration of at least part of the interface damping mass, the interface damping mass connected to the projection system, and the active damping subsystem connected to the interface damping mass, the active damping subsystem including a sensor to measure a position quantity of the interface damping mass and an actuator to exert a force on the interface damping mass based on a signal provided by the sensor. The damping system further includes an interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass.

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1. A lithographic apparatus comprising: an illumination system configured to condition a radiation beam;a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;a su

1. A lithographic apparatus comprising: an illumination system configured to condition a radiation beam;a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;a substrate table configured to hold a substrate;a projection system configured to project the patterned radiation beam onto a target portion of the substrate; anda damping system configured to dampen a vibration of at least part of the projection system, the damping system comprising an interface damping mass connected to the projection system;an active damping subsystem configured to dampen a vibration of at least part of the interface damping mass, the active damping subsystem connected to the interface damping mass, the active damping subsystem comprising a sensor configured to measure a position quantity of the interface damping mass; andan actuator configured to exert a force on the interface damping mass based on a signal provided by the sensor; andan interface damping device connected to the interface damping mass and configured to damp a movement of the interface damping mass at an eigenfrequency of the interface damping mass. 2. The lithographic apparatus according to claim 1, wherein the interface damping device is a tuned mass damper, tuned on the eigenfrequency of the interface damping mass. 3. The lithographic apparatus according to claim 2, wherein a mass of the tuned mass damper is between 0.05 and 0.15 times the interface damping mass. 4. The lithographic apparatus according to claim 2, wherein the tuned mass damper is coupled to the interface damping mass via a resilient connection and a damping connection. 5. The lithographic apparatus according to claim 2, wherein the tuned mass damper is coupled to the interface damping mass in a frequency range of about 10-20 kHz. 6. The lithographic apparatus according to claim 1, wherein the interface damping mass is coupled to the projection system in a frequency range of about 1-2 kHz. 7. The lithographic apparatus according to claim 1, wherein the interface damping mass is coupled to the projection system via a resilient connection. 8. The lithographic apparatus according to claim 1, wherein the active damping subsystem comprises a reaction mass for the actuator to exert counterforces upon based on signals provided by the sensor, which reaction mass is coupled to the interface damping mass in a frequency range of about 10-20 Hz. 9. A lithographic apparatus comprising: an illumination system configured to condition a radiation beam;a support configured to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;a substrate table configured to hold a substrate;a projection system configured to project the patterned radiation beam onto a target portion of the substrate; anddamping system configured to dampen a vibration of at least part of the projection system, the damping system comprising an interface damping mass connected to the projection system; andan active damping subsystem to dampen a vibration of at least part of the interface damping mass, the active damping subsystem being connected to the interface damping mass, the active damping subsystem comprising a sensor configured to measure a position quantity of the interface damping mass;an actuator configured to exert a force on the interface damping mass based on a signal provided by the sensor; anda reaction mass for the actuator to exert a counterforce upon based on a signal provided by the sensor,wherein the reaction mass is guided with a substantially frictionless bearing in a translational direction with respect to the interface damping mass. 10. The lithographic apparatus according to claim 9, wherein the substantially frictionless bearing is a magnetic bearing. 11. The lithographic apparatus according to claim 9, wherein the substantially frictionless bearing is a hydrostatic bearing. 12. The lithographic apparatus according to claim 9, wherein the interface damping mass comprises a guiding structure delimiting the reaction mass downwards and sideways of the translational direction, between which guiding structure and reaction mass the substantially friction free bearing is provided. 13. The lithographic apparatus according to claim 9, wherein the damping system further comprises an interface damping device connected to the interface damping mass and configured to damp movements of the interface damping mass at an eigenfrequency of the interface damping mass, the interface damping device being a tuned mass damper, tuned on an eigenfrequency of the interface damping mass. 14. A projection system comprising: a damping system configured to dampen a vibration of at least part of the projection system, the damping system comprising an interface damping mass connected to the projection system; andan active damping subsystem to dampen a vibration of at least part of the interface damping mass, the active damping subsystem connected to the interface damping mass, the active damping subsystem comprising a sensor configured to measure a position quantity of the interface damping mass; andan actuator configured to exert a force on the interface damping mass based on a signal provided by the sensor, andan interface damping device connected to the interface damping mass and configured to damp movements of the interface damping mass at an eigenfrequency of the interface damping mass. 15. The projection system of claim 14, wherein the interface damping device is a tuned mass damper, tuned on the eigenfrequency of the interface damping mass. 16. A projection system comprising: a damping system configured to dampen a vibration of at least part of the projection system, the damping system comprising an interface damping mass connected to the projection system; andan active damping subsystem configured to dampen a vibration of at least part of the interface damping mass, the active damping subsystem connected to the interface damping mass, the active damping subsystem comprising a sensor configured to measure a position quantity of the interface damping mass;an actuator configured to exert a force on the interface damping mass based on a signal provided by the sensor; anda reaction mass for the actuator to exert a counterforce upon based on a signal provided by the sensor,wherein the reaction mass is guided with a substantially friction less bearing in a translational direction with respect to the interface damping mass. 17. The projection system of claim 16, wherein the damping system further comprises an interface damping device connected to the interface damping mass and configured to damp movements of the interface damping mass at an eigenfrequency of the interface damping mass, the interface damping device being a tuned mass damper, tuned on an eigenfrequency of the interface damping mass.