IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0256991
(2008-10-23)
|
등록번호 |
US-8174748
(2012-05-08)
|
우선권정보 |
JP-2007-304811 (2007-11-26) |
발명자
/ 주소 |
- Andoh, Fumikata
- Takemoto, Hiroshi
- Yoshida, Jun
- Arima, Masatoshi
- Sato, Norio
- Usui, Seiji
|
출원인 / 주소 |
|
대리인 / 주소 |
Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
|
인용정보 |
피인용 횟수 :
2 인용 특허 :
14 |
초록
▼
A mirror includes a substrate, a reflection layer, and a protection layer. The substrate includes a surface having an attachment area and a reflection area. The reflection layer is formed on the reflection area. The protection layer is formed on the reflection area on which the reflection layer is f
A mirror includes a substrate, a reflection layer, and a protection layer. The substrate includes a surface having an attachment area and a reflection area. The reflection layer is formed on the reflection area. The protection layer is formed on the reflection area on which the reflection layer is formed and the attachment area. Material of the protection layer is homogeneous across the reflection area and the attachment area.
대표청구항
▼
1. A mirror comprising: a substrate including a surface having a first area and a second area;a reflection layer formed on the first area; anda protection layer formed on an entirety of the first area with the reflection layer and the second area,wherein the protection layer is light-permeable, is h
1. A mirror comprising: a substrate including a surface having a first area and a second area;a reflection layer formed on the first area; anda protection layer formed on an entirety of the first area with the reflection layer and the second area,wherein the protection layer is light-permeable, is hydrophilic, and is electrically insulating, andwherein the protection layer has a three-layer structure, the three layer structure including an undermost layer formed from silicon dioxide, an uppermost layer formed from silicon dioxide, and an intermediate layer formed from titanium oxide. 2. The mirror according to claim 1, wherein a thickness of the protection layer is from 1 nanometer to 1000 nanometers. 3. The mirror according to claim 1, wherein a portion of the substrate corresponding to the second area is optically transparent. 4. The mirror according to claim 1, wherein the reflection layer is formed directly on the substrate in the first area, and the protection layer is formed directly on the reflection layer in the first area and is formed directly on the substrate in the second area. 5. The mirror according to claim 4, wherein the reflection layer is formed on the substrate only in the first area. 6. The mirror according to claim 1, wherein the undermost layer is directly deposited on the reflection layer in the first area and is directly deposited on the substrate in the second area, the intermediate layer is directly deposited on the undermost layer in the first and second areas, and the uppermost layer is directly deposited on the intermediate layer in the first and second areas. 7. An optical scanning device that scans a scanning surface with a light beam in a main scanning direction, the optical scanning device comprising: a light source that emits a light beam;a first mirror that deflects the light beam in the main scanning direction; anda second mirror that reflects the light beam deflected by the first mirror,wherein the second mirror includes a substrate including a surface having a first area and a second area,a reflection layer formed on the first area, anda protection layer formed on an entirety of the first area with the reflection layer formed and the second area, andthe protection layer is light-permeable, is hydrophilic, and is electrically insulating,wherein the protection layer has a three-layer structure, the three layer structure including an undermost layer formed from silicon dioxide, an uppermost layer formed from silicon dioxide, and an intermediate layer formed from titanium oxide. 8. The optical scanning device according to claim 7, further comprising a housing that accommodates the light source, the first mirror, and the second mirror, wherein the second area is attached to the housing. 9. An image forming apparatus comprising: an optical scanning device according to claim 7;a photosensitive element on which a latent image is formed by the optical scanning device;a developing unit that develops the latent image with toner to form a toner image; anda transfer unit that transfers the toner image onto a recording medium. 10. The image forming apparatus according to claim 9, wherein the optical scanning device further includes a housing that accommodates the light source, the first mirror, and the second mirror, andthe second area is attached to the housing. 11. An image forming apparatus comprising: an optical scanning device according to claim 7;a plurality of photosensitive elements on which latent images in different colors are formed, respectively, by the optical scanning device,a developing unit that develops the latent images with toners of different colors to form toner images of different colors, respectively, anda transfer unit that transfers the toner images of different colors onto a recording medium in a superimposed manner to form a full color image. 12. The image forming apparatus according to claim 11, wherein the optical scanning device further includes a housing that accommodates the light source, the first mirror, and the second mirror, andthe second area is attached to the housing. 13. The optical scanning device according to claim 7, wherein the reflection layer is formed directly on the substrate in the first area, and the protection layer is formed directly on the reflection layer in the first area and is formed directly on the substrate in the second area. 14. The optical scanning device according to claim 13, wherein the reflection layer is formed on the substrate only in the first area. 15. The optical scanning device according to claim 7, wherein the undermost layer is directly deposited on the reflection layer in the first area and is directly deposited on the substrate in the second area, the intermediate layer is directly deposited on the undermost layer in the first and second areas, and the uppermost layer is directly deposited on the intermediate layer in the first and second areas.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.