초록 ▼

The present invention provides for treating a surface of a semiconductor material. The method comprises exposing the surface of the semiconductor material to a halogen etchant in a hydrogen environment at an elevated temperature. The method controls the surface roughness of the semiconductor materia

The present invention provides for treating a surface of a semiconductor material. The method comprises exposing the surface of the semiconductor material to a halogen etchant in a hydrogen environment at an elevated temperature. The method controls the surface roughness of the semiconductor material. The method also has the unexpected benefit of reducing dislocations in the semiconductor material.

대표청구항 ▼

1. A method of fabricating a semiconductor comprising: heating a strained semiconductor material; andupon the heated strained semiconductor material reaching about 700° C.; annealing the heated strained semiconductor material in an etching ambient sufficient to relax the strained semiconductor mater

1. A method of fabricating a semiconductor comprising: heating a strained semiconductor material; andupon the heated strained semiconductor material reaching about 700° C.; annealing the heated strained semiconductor material in an etching ambient sufficient to relax the strained semiconductor material and to minimize increases in surface roughness and defect density. 2. The method of claim 1 further comprising: growing a second semiconductor material over said relaxed semiconductor material. 3. The method of claim 2, wherein said second semiconductor material comprises a first lattice constant and said relaxed semiconductor material comprises a second lattice constant which is different than said first lattice constant. 4. The method of claim 1, wherein said surface roughness is reduced by at least approximately fifty percent as compared to surface roughness without said etching ambient being present during said annealing. 5. The method of claim 1, wherein dislocation density in said semiconductor material is reduced by approximately two orders of magnitude as compared to dislocation density without said etching ambient being present. 6. The method of claim 1, wherein etch annealing said surface of said semiconductor material comprises exposing said semiconductor material to an etch ambient comprising a halogen bearing etchant. 7. The method of claim 6, wherein said halogen bearing etchant is hydrogen chloride. 8. The method of claim 6, wherein said halogen bearing etchant is hydrogen fluoride. 9. The method of claim 6, wherein etch annealing said surface of said semiconductor material further comprises exposing said semiconductor material to hydrogen. 10. The method of claim 6, wherein etch annealing said surface of said semiconductor material further comprises increasing a temperature of said semiconductor material to between 700 and 1200 degrees Celsius. 11. A method of minimizing dislocations in a semiconductor material comprising: heating a strained semiconductor material; andupon the heated strained semiconductor material reaching about 700° C.; etch annealing the heated strained semiconductor material, wherein a relaxed semiconductor material is produced. 12. The method of claim 11 further comprising: growing a second semiconductor material over said relaxed semiconductor material. 13. The method of claim 12, wherein said second semiconductor material comprises a first lattice constant and said relaxed semiconductor material comprises a second lattice constant which is different than said first lattice constant. 14. The method of claim 11, wherein said roughness of said surface of said semiconductor material is reduced by at least fifty percent as compared to roughness using an inert ambient thermal anneal. 15. The method of claim 11, wherein dislocations in said semiconductor material are reduced by at least two orders of magnitude as compared to using an inert ambient thermal anneal. 16. The method of claim 15, wherein etch annealing said surface of said semiconductor material comprises exposing said semiconductor material to an etch ambient comprising a halogen bearing etchant. 17. The method of claim 16, wherein said halogen bearing etchant is hydrogen chloride. 18. The method of claim 16, wherein said halogen bearing etchant is hydrogen fluoride. 19. The method of claim 17, wherein etch annealing said surface of said semiconductor material further comprises exposing said semiconductor material to hydrogen. 20. The method of claim 16, wherein etch annealing said surface of said semiconductor material further comprises increasing a temperature of said semiconductor material to between 700 and 1200 degrees Celsius.