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Semiconductor wafer handling and transport 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/306
출원번호 US-0025541 (2008-02-04)
등록번호 US-8197177 (2012-06-12)
발명자 / 주소
  • van der Meulen, Peter
  • Kiley, Christopher C
  • Pannese, Patrick D.
  • Ritter, Raymond S.
  • Schaefer, Thomas A.
출원인 / 주소
  • Brooks Automation, Inc.
대리인 / 주소
    Colin Durham Perman & Green, LLP
인용정보 피인용 횟수 : 7  인용 특허 : 50

초록

Modular wafer transport and handling facilities are combined in a variety of ways deliver greater levels of flexibility, utility, efficiency, and functionality in a vacuum semiconductor processing system. Various processing and other modules may be interconnected with tunnel-and-cart transportation

대표청구항

1. A method for moving a wafer in a semiconductor manufacturing process, the method comprising: retrieving a wafer with a first robotic arm substantially along a processing plane of the semiconductor manufacturing process, where the semiconductor manufacturing process includes a tunnel capable of be

이 특허에 인용된 특허 (50)

  1. Tien Yu-Chung,TWX, Adjustment pumping plate design for the chamber of semiconductor equipment.
  2. Hiroki Tutomu (Yamanashi-ken JPX) Abe Shoichi (Kofu JPX) Akiyama Kiyotaka (Kofu JPX) Satoyoshi Tsutomu (Niraski JPX), Apparatus for detecting and aligning a substrate.
  3. Choi, Jae-Wook; Kim, Young-Rok, Apparatus for manufacturing substrate.
  4. Mizokawa, Takumi; Omori, Makoto; Takakado, Yuzo; Kawano, Hitoshi, Conveyance system.
  5. Southworth Peter R. (Mission Viejo CA) Baxter Gregory R. (Orange CA), Conveyor system.
  6. Kirkpatrick Thomas I. ; Otwell Robert L., Cost effective modular-linear wafer processing.
  7. Kirkpatrick Thomas I. ; Otwell Robert L., Cost effective modular-linear wafer processing.
  8. Avi Tepman ; Donald J. K. Olgado ; Allen L. D'Ambra, Dual buffer chamber cluster tool for semiconductor wafer processing.
  9. Yokoyama Natsuki,JPX ; Kawamoto Yoshifumi,JPX ; Murakami Eiichi,JPX ; Uchida Fumihiko,JPX ; Mizuishi Kenichi,JPX ; Kawamura Yoshio,JPX, Fabrication system and method having inter-apparatus transporter.
  10. Lappen,Alan Rick; Schauer,Ronald V., Facilities connection box for pre-facilitation of wafer fabrication equipment.
  11. Scott Richard G. (Austin TX) Shackleton Craig R. (Austin TX) Ellis Raymond W. (Austin TX), Integrated building and conveying structure for manufacturing under ultraclean conditions.
  12. Davis Cecil J. (Greenville TX) Matthews Robert (Plano TX) Bowling Robert A. (Garland TX), Integrated circuit processing system.
  13. Danna,Mark; Hine,Roger G.; Bonom,Anthony C., Integrated system for tool front-end workpiece handling.
  14. Mord Wiesler ; Mitchell Weiss ; Gerald M. Friedman, Material handling and transport system and process.
  15. Uchimaki, Yoichi; Egawa, Yuko; Kaji, Tetsunori, Method and apparatus for transferring substrate.
  16. Milgate ; III Robert W. (Gloucester MA), Method and apparatus for venting vacuum processing equipment.
  17. Sanford, John C.; Wolf, Edward D.; Allen, Nelson K., Method for transporting substances into living cells and tissues and apparatus therefor.
  18. Christopher A. Hofmeister, Method of transferring substrates with two different substrate holding end effectors.
  19. Bright Nick ; Mooring Ben, Modular architecture for semiconductor wafer fabrication equipment.
  20. Koch George R. (Los Altos CA) Petersen ; III Carl T. (Fremont CA), Modular loadlock.
  21. Rubin Richard H. (Fairfield NJ) Petrone Benjamin J. (Netcong NJ) Heim Richard C. (Mountain View CA) Pawenski Scott M. (Wappingers Falls NY), Modular processing apparatus for processing semiconductor wafers.
  22. White John M. ; Conner Robert B. ; Law Kam S. ; Turner Norman L. ; Lee William T. ; Kurita Shinichi, Modular substrate processing system.
  23. Vowles E. John (Deering NH) Maher Joseph A. (Wenham MA) Napoli Joseph D. (Windham NH), Modular vapor processor system.
  24. Hiroki Tutomu (Yamanashi-ken JPX) Abe Shoichi (Kofu JPX) Akiyama Kiyotaka (Kofu JPX), Multi-chamber system.
  25. Ozawa Masahito (Yamanashi JPX) Mizukami Masami (Yamanashi JPX) Kanazashi Masanobu (Kofu JPX) Takasoe Toshihiko (Yamanashi JPX) Narushima Masaki (Yamanashi JPX) Kubodera Masao (Yamanashi JPX), Multi-chamber system provided with carrier units.
  26. Maydan Dan ; Somekh Sasson ; Wang David Nin-Kou ; Cheng David ; Toshima Masato ; Harari Isaac ; Hoppe Peter D., Multiple chamber integrated process system.
  27. Miyashita Masahiro,JPX, Positioning apparatus for substrates to be processed.
  28. Ishizawa, Shigeru; Saeki, Hiroaki, Processed body carrying device, and processing system with carrying device.
  29. Saeki, Hiroaki; Matsushima, Keiichi; Asakawa, Teruo; Narushima, Masaki, Processing apparatus.
  30. Larson, Robert E.; Simondet, Sean D.; Zimmerman, David C.; Maciej, Todd K.; Matthys, Quirin W., Reduced footprint tool for automated processing of microelectronic substrates.
  31. Kumagai Hiromi (Tokyo JPX), Semiconductor manufacturing apparatus with a spare vacuum chamber.
  32. Hiroki Tsutomu,JPX, Semiconductor processing apparatus.
  33. Maydan Dan (Los Altos Hills CA) Somekh Sasson R. (Redwood City CA) Ryan-Harris Charles (La Honda CA) Seilheimer Richard A. (Pleasanton CA) Cheng David (San Jose CA) Abolnikov Edward M. (San Francisco, Semiconductor processing system with robotic autoloader and load lock.
  34. Kakehi Yutaka (Hikari JPX), Semiconductor substrate transport system.
  35. Yamagishi,Takayuki; Watanabe,Takeshi, Semiconductor-manufacturing apparatus equipped with cooling stage and semiconductor-manufacturing method using same.
  36. Wu Hong-Jen,TWX ; Chen Taylor,TWX ; Lai Jack,TWX ; Chen I. I.,TWX, Single semiconductor wafer transfer method and manufacturing system.
  37. Blake Julian G. (Cambridge MA) Muka Richard S. (Topsfield MA) Younger Peter R. (Newton MA), Sputtering system.
  38. Cameron, James A.; Reyling, Steven G., Substrate handling robot with a batch loader and individual vacuum control at batch loader paddles.
  39. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  40. Tezuka,Kazuyuki; Koizumi,Hiroshi; Moriya,Tsuyoshi; Nakayama,Hiroyuki, Substrate processing apparatus and substrate transferring method.
  41. Beaulieu David ; Pippins Michael W., Substrate processing apparatus having a substrate transport with a front end extension and an internal substrate buffer.
  42. Adams Douglas R., Substrate processing apparatus with small batch load lock.
  43. Muka Richard S. ; Davis ; Jr. James C. ; Hofmeister Christopher A., Substrate transport apparatus with double substrate holders.
  44. Iwasawa Yoshiyuki (Tokyo JPX) Ishida Tsutomu (Tokyo JPX) Harada Hiroshi (Tokyo JPX) Kobayashi Shintaro (Tokyo JPX), Transfer system in a clean room.
  45. Ikeda Kazuhito,JPX ; Watahiki Shinichiro,JPX ; Yoshida Hisashi,JPX ; Aburatani Yukinori,JPX, Treatment object conveyor apparatus, semiconductor manufacturing apparatus, and treatment object treatment method.
  46. Bonora, Anthony C.; Gould, Richard H.; Hine, Roger G.; Krolak, Michael; Speasl, Jerry A., Universal modular wafer transport system.
  47. Ozawa,Jun; Hirose,Jun; Narushima,Masaki, Vacuum process system.
  48. Matsuura, Hiroyuki, Vertical batch processing apparatus.
  49. Miller Kenneth C. (280 Easy St. ; #117 Mountain View CA 94043), Wafer transport device.
  50. Kawamura Yoshio (Kokubunji JPX) Kawamoto Yoshifumi (Kanagawa-ken JPX) Uchida Fumihiko (Hachioji JPX) Mizuishi Kenichi (Hachioji JPX) Yokoyama Natsuki (Mitaka JPX) Murakami Eiichi (Tokorozawa JPX) Nak, Wafer transport method.

이 특허를 인용한 특허 (7)

  1. Wood, Keith Freeman; Rodnick, Matthew Jonathon, Buffer station for thermal control of semiconductor substrates transferred therethrough and method of transferring semiconductor substrates.
  2. Rodnick, Matthew J., Dual sensing end effector with single sensor.
  3. Lill, Thorsten; Vahedi, Vahid; Kristoffersen, Candi; Bailey, III, Andrew D.; Shen, Meihua; Raghavan, Rangesh; Bultman, Gary, Equipment front end module for transferring wafers and method of transferring wafers.
  4. Hiroki, Tsutomu, Substrate processing apparatus.
  5. Mai, Joachim; Kehr, Mirko, Substrate processing device.
  6. Wakabayashi, Shinji, Substrate relay apparatus, substrate relay method, and substrate processing apparatus.
  7. Ohashi, Tomohiro; Makino, Akitaka; Kitada, Hiroho; Kihara, Hideki, Wafer processing based on sensor detection and system learning.
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