IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0612073
(2009-11-04)
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등록번호 |
US-8235364
(2012-08-07)
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발명자
/ 주소 |
- Sarigiannis, Demetrius
- Ahmed, M. Mushtaq
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출원인 / 주소 |
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대리인 / 주소 |
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인용정보 |
피인용 횟수 :
1 인용 특허 :
19 |
초록
▼
This invention relates to a vapor or liquid phase reagent dispensing apparatus that may be used for dispensing vapor or liquid phase reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices. The vapor phase reagent dispensing apparatus has a s
This invention relates to a vapor or liquid phase reagent dispensing apparatus that may be used for dispensing vapor or liquid phase reagents such as precursors for deposition of materials in the manufacture of semiconductor materials and devices. The vapor phase reagent dispensing apparatus has a single port capable of receiving a carrier gas and dispensing a vapor phase reagent. The liquid phase reagent dispensing apparatus has a single port capable of receiving an inert gas and dispensing a liquid phase reagent.
대표청구항
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1. A vapor phase reagent dispensing apparatus comprising: a vessel which comprises a vessel top wall member, a vessel side wall member and a vessel bottom wall member configured to form an internal vessel compartment to hold a source chemical up to a fill level and to additionally define an inner ga
1. A vapor phase reagent dispensing apparatus comprising: a vessel which comprises a vessel top wall member, a vessel side wall member and a vessel bottom wall member configured to form an internal vessel compartment to hold a source chemical up to a fill level and to additionally define an inner gas volume above the fill level;said vessel top wall member having a single port capable of receiving a carrier gas and dispensing a vapor phase reagent;said single port having a branched configuration comprising a first port portion extending generally vertically and exteriorly from said top wall member, a second port portion extending generally horizontally and exteriorly from said first port portion, and a third port portion extending generally vertically and exteriorly from said second port portion;said first port portion having a port top wall member and a port side wall member, said port top wall member having an opening through which a bubbler extends;said bubbler comprising a tube that extends through a centrally located portion of said first port portion and through said inner gas volume into the source chemical and through which a carrier gas can be bubbled into the source chemical to cause at least a portion of source chemical vapor to become entrained in said carrier gas to produce a flow of vapor phase reagent to said inner gas volume above the fill level, said tube having an inlet end located generally vertically and exteriorly from said first port portion and an outlet end located generally adjacent to the vessel bottom wall member; andsaid first port portion having interstitial space between said tube and said port side wall member through which said vapor phase reagent can be dispensed from the inner gas volume of said vessel. 2. The vapor phase reagent dispensing apparatus of claim 1 further comprising: said bubbler having a carrier gas feed inlet fitting connected thereto;a carrier gas feed line extending from the carrier gas feed inlet fitting upwardly and exteriorly from the bubbler for delivery of carrier gas into the interior volume of the vessel, the carrier gas feed line containing a carrier gas flow control valve therein for control of flow of the carrier gas therethrough;said third port portion having a vapor phase reagent outlet fitting connected thereto; anda vapor phase reagent discharge line extending from the vapor phase reagent outlet fitting upwardly and exteriorly from the third port portion for removal of vapor phase reagent from the interior volume of the vessel, the vapor phase reagent discharge line containing a vapor phase reagent flow control valve therein for control of flow of the vapor phase reagent therethrough. 3. The vapor phase reagent dispensing apparatus of claim 1 in which said vessel bottom wall member has a sump cavity therein extending downwardly from the surface of said vessel bottom wall member. 4. The vapor phase reagent dispensing apparatus of claim 1 further comprising a carrier gas source coupled to the carrier gas feed line. 5. The vapor phase reagent dispensing apparatus of claim 1 further comprising: a deposition chamber selected from a chemical vapor deposition chamber or an atomic layer deposition chamber;the vapor phase reagent discharge line connecting the vapor phase reagent dispensing apparatus to the deposition chamber;optionally a heatable susceptor contained within the deposition chamber and located in a receiving relationship to the vapor phase reagent discharge line; andan effluent discharge line connected to the deposition chamber;such that vapor phase reagent passes through the vapor phase reagent discharge line and into the deposition chamber, for contact with a substrate, optionally on the heatable susceptor, and any remaining effluent is discharged through the effluent discharge line. 6. A method for delivery of a vapor phase reagent to a deposition chamber comprising: (a) providing a vapor phase reagent dispensing apparatus comprising:a vessel which comprises a vessel top wall member, a vessel side wall member and a vessel bottom wall member configured to form an internal vessel compartment to hold a source chemical up to a fill level and to additionally define an inner gas volume above the fill level;said vessel top wall member having a single port capable of receiving a carrier gas and dispensing a vapor phase reagent;said single port having a branched configuration comprising a first port portion extending generally vertically and exteriorly from said top wall member, a second port portion extending generally horizontally and exteriorly from said first port portion, and a third port portion extending generally vertically and exteriorly from said second port portion;said first port portion having a port top wall member and a port side wall member, said port top wall member having an opening through which a bubbler extends;said bubbler comprising a tube that extends through a centrally located portion of said first port portion and through said inner gas volume into the source chemical and through which a carrier gas can be bubbled into the source chemical to cause at least a portion of source chemical vapor to become entrained in said carrier gas to produce a flow of vapor phase reagent to said inner gas volume above the fill level, said tube having an inlet end located generally vertically and exteriorly from said first port portion and an outlet end located generally adjacent to the vessel bottom wall member;said first port portion having interstitial space between said tube and said port side wall member through which said vapor phase reagent can be dispensed from the inner gas volume of said vessel;said bubbler having a carrier gas feed inlet fitting connected thereto;a carrier gas feed line extending from the carrier gas feed inlet fitting upwardly and exteriorly from the bubbler for delivery of carrier gas into the interior volume of the vessel, the carrier gas feed line containing a carrier gas flow control valve therein for control of flow of the carrier gas therethrough;said third port portion having a vapor phase reagent outlet fitting connected thereto; anda vapor phase reagent discharge line extending from the vapor phase reagent outlet fitting upwardly and exteriorly from the third port portion for removal of vapor phase reagent from the interior volume of the vessel, the vapor phase reagent discharge line containing a vapor phase reagent flow control valve therein for control of flow of the vapor phase reagent therethrough;(b) adding source chemical to said vapor phase reagent dispensing apparatus;(c) heating the source chemical in said vapor phase reagent dispensing apparatus to a temperature sufficient to vaporize the source chemical to provide vapor phase reagent;(d) feeding a carrier gas into said vapor phase reagent dispensing apparatus through said carrier gas feed line and said tube;(e) withdrawing the vapor phase reagent and carrier gas from said vapor phase reagent dispensing apparatus through said vapor phase reagent discharge line; and(f) feeding the vapor phase reagent and carrier gas into said deposition chamber. 7. The method of claim 6 further comprising: (g) contacting the vapor phase reagent with a substrate, optionally on a heatable susceptor, within the deposition chamber; and(h) discharging any remaining effluent through an effluent discharge line connected to the deposition chamber. 8. The method of claim 6 wherein, in the vapor phase reagent dispensing apparatus, said vessel bottom wall member has a sump cavity therein extending downwardly from the surface of said vessel bottom wall member. 9. The method of claim 6 wherein, in the vapor phase reagent dispensing apparatus, the source chemical comprises a liquid or solid material. 10. The method of claim 6 wherein, in the vapor phase reagent dispensing apparatus, the source chemical comprises a precursor for a metal selected from Group 2, Group 3, Group 4, Group 5, Group 6, Group 7, Group 8, Group 9, Group 10, Group 11, Group 12, Group 13, Group 14, Group 15, Group 16, and the Lanthanide series of the Periodic Table. 11. The method of claim 6 wherein, in the vapor phase reagent dispensing apparatus, the source chemical comprises a precursor for a metal selected from ruthenium, hafnium, tantalum, molybdenum, platinum, gold, titanium, lead, palladium, zirconium, bismuth, strontium, barium, calcium, antimony and thallium, or a precursor for a metalloid selected from silicon, germanium and tellurium. 12. The method of claim 6 wherein, in the vapor phase reagent dispensing apparatus, the vapor phase reagent comprises a precursor for a metal selected from Group 2, Group 3, Group 4, Group 5, Group 6, Group 7, Group 8, Group 9, Group 10, Group 11, Group 12, Group 13, Group 14, Group 15, Group 16, and the Lanthanide series of the Periodic Table. 13. The method of claim 6 wherein, in the vapor phase reagent dispensing apparatus, the vapor phase reagent comprises a precursor for a metal selected from ruthenium, hafnium, tantalum, molybdenum, platinum, gold, titanium, lead, palladium, zirconium, bismuth, strontium, barium, calcium, antimony and thallium, or a precursor for a metalloid selected from silicon, germanium and tellurium. 14. The method of claim 6 wherein the vapor phase reagent dispensing apparatus further comprises a carrier gas source coupled to the carrier gas feed line. 15. A liquid phase reagent dispensing apparatus comprising: a vessel which comprises a vessel top wall member, a vessel side wall member and a vessel bottom wall member configured to form an internal vessel compartment to hold a source chemical up to a fill level and to additionally define an inner gas volume above the fill level;said vessel top wall member having a single port capable of receiving an inert gas and dispensing a liquid phase reagent;said single port having a branched configuration comprising a first port portion extending generally vertically and exteriorly from said top wall member, a second port portion extending generally horizontally and exteriorly from said first port portion, and a third port portion extending generally vertically and exteriorly from said second port portion;said first port portion having a port top wall member and a port side wall member, said port top wall member having an opening through which a diptube extends;said diptube comprising a tube that extends through a centrally located portion of said first port portion and through said inner gas volume into the source chemical and through which liquid phase reagent can be dispensed from said apparatus, said diptube having an outlet end located generally vertically and exteriorly from said first port portion and an inlet end located generally adjacent to the vessel bottom wall member; andsaid first port portion having interstitial space between said tube and said port side wall member through which said inert gas can be fed to the inner gas volume above the fill level to pressurize the inner gas volume above the fill level. 16. The vapor phase reagent dispensing apparatus of claim 15 further comprising: said third port portion having an inert gas feed inlet fitting connected thereto;an inert gas feed line extending from the inert gas feed inlet fitting upwardly and exteriorly from the third port portion for delivery of inert gas into the interior volume of the vessel, the inert gas feed line containing an inert gas flow control valve therein for control of flow of the inert gas therethrough;said diptube having a liquid phase reagent outlet fitting connected thereto; anda liquid phase reagent discharge line extending from the liquid phase reagent outlet fitting upwardly and exteriorly from said first port portion for removal of liquid phase reagent from the interior volume of the vessel, the liquid phase reagent discharge line optionally containing a liquid phase reagent flow control valve therein for control of flow of the liquid phase reagent therethrough. 17. The liquid phase reagent dispensing apparatus of claim 11 in which said vessel bottom wall member has a sump cavity therein extending downwardly from the surface of said vessel bottom wall member. 18. The liquid phase reagent dispensing apparatus of claim 15 further comprising an inert gas source coupled to the inert gas feed line. 19. A method for delivery of a vapor phase reagent to a deposition chamber comprising: (a) providing a liquid phase reagent dispensing apparatus comprising:a vessel which comprises a vessel top wall member, a vessel side wall member and a vessel bottom wall member configured to form an internal vessel compartment to hold a source chemical up to a fill level and to additionally define an inner gas volume above the fill level;said vessel top wall member having a single port capable of receiving an inert gas and dispensing a liquid phase reagent;said single port having a branched configuration comprising a first port portion extending generally vertically and exteriorly from said top wall member, a second port portion extending generally horizontally and exteriorly from said first port portion, and a third port portion extending generally vertically and exteriorly from said second port portion;said first port portion having a port top wall member and a port side wall member, said port top wall member having an opening through which a diptube extends;said diptube comprising a tube that extends through a centrally located portion of said first port portion and through said inner gas volume into the source chemical and through which liquid phase reagent can be dispensed from said apparatus, said diptube having an outlet end located generally vertically and exteriorly from said first port portion and an inlet end located generally adjacent to the vessel bottom wall member;said first port portion having interstitial space between said tube and said port side wall member through which said inert gas can be fed to the inner gas volume above the fill level to pressurize the inner gas volume above the fill level;said third port portion having an inert gas feed inlet fitting connected thereto;an inert gas feed line extending from the inert gas feed inlet fitting upwardly and exteriorly from the third port portion for delivery of inert gas into the interior volume of the vessel, the inert gas feed line containing an inert gas flow control valve therein for control of flow of the inert gas therethrough;said diptube having a liquid phase reagent outlet fitting connected thereto; anda liquid phase reagent discharge line extending from the liquid phase reagent outlet fitting upwardly and exteriorly from the first port portion for removal of liquid phase reagent from the interior volume of the vessel, the liquid phase reagent discharge line optionally containing a liquid phase reagent flow control valve therein for control of flow of the liquid phase reagent therethrough;(b) adding liquid phase reagent to said liquid phase reagent dispensing apparatus;(c) optionally heating a solid source chemical in said liquid phase reagent dispensing apparatus to a temperature sufficient to melt the solid source chemical to provide liquid phase reagent;(d) feeding an inert gas into said liquid phase reagent dispensing apparatus through said inert gas feed line;(e) withdrawing the liquid phase reagent from said liquid phase reagent dispensing apparatus through said tube and said liquid phase reagent discharge line;(f) providing a vaporization apparatus comprising:a vessel configured to form an internal vessel compartment to vaporize the liquid phase reagent;said liquid phase reagent discharge line connecting the liquid phase reagent dispensing apparatus to said vaporization apparatus;a portion of the vaporization apparatus having a carrier gas feed inlet opening through which carrier gas can be fed into said vaporization apparatus to cause vapor of said liquid phase reagent to become entrained in said carrier gas to produce vapor phase reagent;a portion of the vaporization apparatus having a vapor phase reagent outlet opening through which said vapor phase reagent can be dispensed from said vaporization apparatus;a carrier gas feed line extending from the carrier gas feed inlet opening exteriorly from the vaporization apparatus for delivery of carrier gas into said vaporization apparatus, the carrier gas feed line containing one or more carrier gas flow control valves therein for control of flow of the carrier gas therethrough; anda vapor phase reagent discharge line extending from the vapor phase reagent outlet opening exteriorly from the vaporization apparatus for removal of vapor phase reagent from said vaporization apparatus to said deposition chamber, the vapor phase reagent discharge line optionally containing one or more vapor phase reagent flow control valves therein for control of flow of the vapor phase reagent therethrough;(g) feeding the liquid phase reagent into said vaporization apparatus;(h) heating the liquid phase reagent in said vaporization apparatus to a temperature sufficient to vaporize the liquid phase reagent to provide said vapor phase reagent;(i) feeding a carrier gas into said vaporization apparatus through said carrier gas feed line;(j) withdrawing the vapor phase reagent and carrier gas from said vaporization apparatus through said vapor phase reagent discharge line; and(k) feeding the vapor phase reagent and carrier gas into said deposition chamber. 20. The method of claim 19 wherein, in the liquid phase reagent dispensing apparatus, said vessel bottom wall member has a sump cavity therein extending downwardly from the surface of said vessel bottom wall member. 21. The method of claim 19 wherein, in the liquid phase reagent dispensing apparatus, the source chemical comprises a precursor for a metal selected from ruthenium, hafnium, tantalum, molybdenum, platinum, gold, titanium, lead, palladium, zirconium, bismuth, strontium, barium, calcium, antimony and thallium, or a precursor for a metalloid selected from silicon, germanium and tellurium.
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