Method of making a photovoltaic device or front substrate for use in same with scratch-resistant coating and resulting product
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01L-031/00
B05D-005/12
출원번호
US-0797214
(2007-05-01)
등록번호
US-8237047
(2012-08-07)
발명자
/ 주소
Sharma, Pramod K.
출원인 / 주소
Guardian Industries Corp.
대리인 / 주소
Nixon & Vanderhye P.C.
인용정보
피인용 횟수 :
0인용 특허 :
55
초록▼
A method of making an anti-reflection coating using a sol-gel process, for use in a photovoltaic device or the like. The method may include the following steps in certain example embodiments: forming a polymeric component of silica by mixing silane(s) with one or more of a first solvent, a catalyst,
A method of making an anti-reflection coating using a sol-gel process, for use in a photovoltaic device or the like. The method may include the following steps in certain example embodiments: forming a polymeric component of silica by mixing silane(s) with one or more of a first solvent, a catalyst, and water; forming a silica sol gel by mixing the polymeric component with a colloidal silica, and optionally a second solvent; forming a combined sol by mixing siloxane(s) with the silica sol; casting the mixture by spin coating or the like to form a silica and siloxane containing layer on a substrate; and curing and/or heat treating the layer. This layer may make up all or only part of an anti-reflection coating which may be used in a photovoltaic device or the like.
대표청구항▼
1. A method of making a photovoltaic device including an antireflective coating, the method comprising: forming a polymeric component comprising silica by mixing at least one silane with one or more of a first solvent, a first catalyst, and/or water;forming a silica sol by mixing the polymeric compo
1. A method of making a photovoltaic device including an antireflective coating, the method comprising: forming a polymeric component comprising silica by mixing at least one silane with one or more of a first solvent, a first catalyst, and/or water;forming a silica sol by mixing the polymeric component with colloidal silica and/or a second solvent;forming a combined sol gel by mixing the silica sol with at least one siloxane, wherein the siloxane comprises from about 0.1 to 10% by weight of the combined sol gel;casting the combined sol gel to form a first layer on a glass substrate;curing and heat treating the first layer, wherein said heat treating takes place at a temperature of from about 600° C. to about 700° C., and forming a second layer comprising silicon oxide over the first layer, in making the photovoltaic device, and wherein a critical scratch load of the antireflective coating is from about 20 to 50 mN, in making the photovoltaic device. 2. The method of claim 1, wherein the siloxane comprises from about 2 to 5% by weight of the combined sol gel, and wherein a critical scratch load of the antireflective coating is from about 25 to 50 mN. 3. The method of claim 2, wherein the critical scratch load of the antireflective coating is from about 30 to 50 mN. 4. A method of making a photovoltaic device including an antireflective coating, the method comprising: forming a polymeric component comprising silica by mixing at least at least one silane with at least a first solvent, a first catalyst, and water;forming a silica sol by mixing the polymeric component with at least colloidal silica and optionally with a second solvent;forming a combined sol gel by mixing the silica sol with at least one siloxane, wherein the siloxane comprises from about 2-5% by weight of the combined sol gel;casting the combined sol gel to form a layer on a glass substrate;curing and heat treating the layer, wherein said heat treating takes place at a temperature of from about 600° C. to about 750° C., and wherein a critical scratch load of the antireflective coating is from about 20 to 50 mN, in making the photovoltaic device. 5. The method of claim 4, wherein the curing is performed and occurs at a temperature between 100 and 150° C. and has a duration of no more than about 2 minutes. 6. The method of claim 4, wherein the heat treating occurs and is at a temperature between 600 and 750° C. and has a duration of no greater than about 5 minutes. 7. The method of claim 4, wherein the at least one silane comprises glycydoxylpropyltrimethoxysilane (glymo). 8. The method of claim 4, wherein (a) one or more of the first solvent and the second solvent comprise n-propanol, and/or (b) the casting comprises spin coating. 9. The method of claim 4, wherein the first catalyst and/or second catalyst comprise an acid. 10. The method of claim 8, wherein the acid comprises hydrochloric acid. 11. The method of claim 4, wherein the colloidal silica comprises methyl ethyl ketone. 12. The method of claim 4, wherein the at least one siloxane is chosen from the group consisting of: 3,5 bis(3-carboxy propyl)tetramethyl disiloxane; 4,3,5-bis(chloromethyl)octamethyl tetrasiloxane; 1,3 bis(3-methylacryloxy)tetramethyl disiloxane; hexamethyl disiloxane; octamethyl trisiloxane; decamethyl trisiloxane; hydrogen silsesquioxane; hexaethylcyclotrisiloxane; hexaethyl disiloxane; 1,1,3,3,5,5-hexamethyltrisiloxane; hexamethylcyclotrisiloxane; hexavinyldisiloxane; hexaphenyldisiloxane; octaphenylcyclotetrasiloxane; hexachlorodisiloxane; dichlorooctamethyltetrasiloxane; 2-methoxy(polyethyleneoxy)propyl) heptamethyl trisiloxane; 3 acryloxypropyl tris trimethyl siloxysilane; methylacryloxypropyl heptacyclopentyl-T8silsesquioxane; octakis(dimethylsiloxy)octaprismosilsesquioxane; and octavinyl-T8-silsesquioxane. 13. The method of claim 4, wherein the at least one siloxane is chosen from the group consisting of: 3,5 bis(3-carboxy propyl)tetramethyl disiloxane; 4,3,5-bis(chloromethyl)octamethyl tetrasiloxane; 1,3 bis(3-methylacryloxy)tetramethyl disiloxane; hexamethyl disiloxane; octamethyl trisiloxane; decamethyl trisiloxane; and hydrogen silsesquioxane. 14. The method of claim 4, wherein the at least one siloxane comprises about 5% wt of the combined sol gel. 15. The method of claim 4, wherein the at least one siloxane comprises about 2% wt of the combined sol gel. 16. The method of claim 4, wherein the step of forming a combined sol gel further comprises mixing an organic additive or a metal oxide with the silica sol and siloxane. 17. The method of claim 4, wherein the critical scratch load of the antireflective coating is from about 25 to 50 mN. 18. The method of claim 4, wherein the critical scratch load of the antireflective coating is from about 30 to 50 mN.
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