IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0447118
(2008-12-24)
|
등록번호 |
US-8237185
(2012-08-07)
|
우선권정보 |
KR-10-2008-0000841 (2008-01-03) |
국제출원번호 |
PCT/KR2008/007666
(2008-12-24)
|
§371/§102 date |
20090424
(20090424)
|
국제공개번호 |
WO2009/084860
(2009-07-09)
|
발명자
/ 주소 |
|
출원인 / 주소 |
|
대리인 / 주소 |
Birch, Stewart, Kolasch & Birch, LLP
|
인용정보 |
피인용 횟수 :
1 인용 특허 :
3 |
초록
▼
Embodiments provide a semiconductor light emitting device which comprises a light emitting structure comprising a plurality of compound semiconductor layers, an insulation layer on an outer surface of the light emitting structure, an ohmic layer under the light emitting structure and on an outer sur
Embodiments provide a semiconductor light emitting device which comprises a light emitting structure comprising a plurality of compound semiconductor layers, an insulation layer on an outer surface of the light emitting structure, an ohmic layer under the light emitting structure and on an outer surface of the insulation layer, a first electrode layer on the light emitting structure, and a tunnel barrier layer between the first electrode layer and the ohmic layer.
대표청구항
▼
1. A semiconductor light emitting device with integrated electrostatic discharge (ESD) protection, comprising: a light emitting structure comprising a plurality of compound semiconductor layers;an insulation layer disposed on a side surface of the light emitting structure;a conductive layer disposed
1. A semiconductor light emitting device with integrated electrostatic discharge (ESD) protection, comprising: a light emitting structure comprising a plurality of compound semiconductor layers;an insulation layer disposed on a side surface of the light emitting structure;a conductive layer disposed under the light emitting structure;a first electrode layer comprising a line electrode disposed on the light emitting structure, anda first electrode disposed outwardly from an outer area of the light emitting structure; anda tunnel barrier layer between the first electrode of the first electrode layer and a first portion of the conductive layer,wherein the light emitting structure is disposed between the conductive layer and the line electrode of the first electrode layer,wherein the tunnel barrier layer is disposed outwardly from the outer area of the light emitting structure, andwherein the plurality of compound semiconductor layers comprise a first conductive semiconductor layer,a second conductive semiconductor layer between the first conductive semiconductor layer and the conductive layer, andan active layer between the first conductive semiconductor layer and the second conductive semiconductor layer. 2. The semiconductor light emitting device according to claim 1, further comprising: a conductive support member disposed under the conductive layer and disposed on the side surface of the light emitting structure,wherein the conductive layer comprises an ohmic layer. 3. The semiconductor light emitting device according to claim 2, wherein a first portion of the insulation layer is disposed between the tunnel barrier layer and the first portion of the conductive layer. 4. The semiconductor light emitting device according to claim 1, wherein the tunnel barrier layer is formed according to a top surface of the first portion of the conductive layer or on a part of the top surface of the first portion of the conductive layer. 5. The semiconductor light emitting device according to claim 1, wherein the first electrode layer comprises at least one first pad, andwherein the first electrode is connected to the first pad and is disposed on the tunnel barrier layer. 6. The semiconductor light emitting device according to claim 5, wherein the first electrode layer comprises at least one line electrode diverged from the first pad and connected to the first electrode. 7. The semiconductor light emitting device according to claim 1, wherein the tunnel barrier layer comprises at least one of Al2O3, SiO2, Si3N4, SiCN, TiO2 and Ta2O3. 8. The semiconductor light emitting device according to claim 1, wherein the tunnel barrier layer is disposed on a different area of the first portion of the conductive layer. 9. The semiconductor light emitting device according to claim 1, wherein a thickness of the tunnel barrier layer is about 10 to 200 Å. 10. The semiconductor light emitting device according to claim 1, wherein the tunnel barrier layer is formed in a plurality and the plurality of the tunnel barrier layers are spaced apart from each other. 11. A semiconductor light emitting device with integrated electrostatic discharge (ESD) protection, comprising: a light emitting structure comprising a plurality of compound semiconductor layers,wherein the plurality of compound semiconductor layers comprise a first conductive semiconductor layer,a second conductive semiconductor layer under the first conductive semiconductor layer, andan active layer between the first conductive semiconductor layer and a second conductive semiconductor layer;an insulation layer on a side surface of the light emitting structure;a conductive layer comprising an ohmic layer disposed under the second conductive semiconductor layer of the light emitting structure, a first portion of the conductive layer disposed outwardly from an outer area of the light emitting structure;a tunnel barrier layer on the first portion of the conductive layer and disposed outwardly from the outer area of the light emitting structure;a first electrode layer comprising a line electrode disposed on the first conductive semiconductor layer of the light emitting structure, anda first electrode disposed outwardly from the outer area of the light emitting structure,wherein the first electrode of the first electrode layer is connected to the tunnel barrier layer; anda conductive support member disposed under the conductive layer and including a first portion disposed outwardly from the outer area of the light emitting structure,wherein the light emitting structure is disposed between the conductive layer and the first electrode layer. 12. The semiconductor light emitting device according to claim 11, wherein the light emitting structure comprises at least one of a P-N junction structure, an N-P junction structure, a P-N-P structure and an N-P-N junction structure. 13. The semiconductor light emitting device according to claim 11, wherein the tunnel barrier layer is formed in a pattern of the same shape as that of the first electrode layer. 14. The semiconductor light emitting device according to claim 11, wherein the tunnel barrier layer has a conductor characteristic when an abnormal voltage is applied through the first electrode layer or the conductive support member. 15. The semiconductor light emitting device according to claim 11, wherein the tunnel barrier layer comprises an insulation material, and is connected to the light emitting structure in parallel. 16. The semiconductor light emitting device according to claim 11, wherein the first electrode layer comprises: at least one first pad disposed on the light emitting structure; andthe line electrode is diverged from the first pad, andwherein the first electrode is connected to the line electrode and the tunnel barrier layer. 17. A semiconductor light emitting device with integrated electrostatic discharge (ESD) protection, comprising: a light emitting structure comprising a first conductive semiconductor layer, a second conductive semiconductor layer, and an active layer between the first conductive semiconductor layer and the second conductive semiconductor layer;an insulation layer disposed on a side surface of the light emitting structure;a conductive layer comprising an ohmic layer disposed under the second conductive semiconductor layer and including a first portion disposed outwardly from an outer area of the light emitting structure;a first electrode layer comprising a line electrode disposed on the first conductive semiconductor layer, anda first electrode disposed outwardly from the outer area of the light emitting structure;a conductive support member disposed under the conductive layer, wherein a first portion of the conductive support member is disposed on the side surface of the light emitting structure; anda tunnel barrier layer disposed on the first portion of the conductive support member,wherein the light emitting structure is disposed between the conductive layer and the first electrode layer,wherein the first electrode of the first electrode layer is disposed on the tunnel barrier layer, andwherein the tunnel barrier layer is disposed outwardly from the outer area of the light emitting structure. 18. The semiconductor light emitting device according to claim 17, wherein the conductive layer includes a first portion disposed between the tunnel barrier layer and the first portion of the conductive support member, anda second portion disposed between the insulation layer and the first portion of the conductive support member. 19. The semiconductor light emitting device according to claim 18, wherein the first portion of conductive support member contacts with the first portion of the conductive layer. 20. The semiconductor light emitting device according to claim 17, wherein the tunnel barrier layer comprises an insulation material and is spaced apart from a surface of the light emitting structure.
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