Systems and methods for biological and chemical gas treatment are disclosed. The systems may generally include a biological treatment zone and a chemical oxidation zone. An oxidizing agent subsystem may deliver an oxidizing agent, such as chlorine dioxide, to the chemical oxidation zone. The oxidizi
Systems and methods for biological and chemical gas treatment are disclosed. The systems may generally include a biological treatment zone and a chemical oxidation zone. An oxidizing agent subsystem may deliver an oxidizing agent, such as chlorine dioxide, to the chemical oxidation zone. The oxidizing agent subsystem may generate the oxidizing agent in situ from a product of the biological treatment zone. The oxidizing agent subsystem may include a reaction chamber and a source of a reactant, such as an alkaline metal chlorite reservoir. A controller may be in communication with various sensors and other components to generally manage operation of the disclosed systems.
대표청구항▼
1. A biochemical gas treatment system, comprising: a scrubber comprising: a process gas inlet,a treated gas outlet,a biological scrubber stage,a chemical oxidation scrubber stage,an irrigation source configured to provide irrigation fluid to the biological scrubber stage, anda scrubber sump construc
1. A biochemical gas treatment system, comprising: a scrubber comprising: a process gas inlet,a treated gas outlet,a biological scrubber stage,a chemical oxidation scrubber stage,an irrigation source configured to provide irrigation fluid to the biological scrubber stage, anda scrubber sump constructed and arranged to collect irrigation fluid from the biological scrubber stage;a reaction chamber having a first inlet fluidly connected to an outlet of the scrubber sump, and an outlet fluidly connected to the chemical oxidation scrubber stage; anda source of a metal chlorite fluidly connected to a second inlet of the reaction chamber. 2. The system of claim 1, wherein the chemical oxidation scrubber stage is positioned downstream of the biological scrubber stage. 3. The system of claim 1, wherein the metal chlorite comprises sodium chlorite. 4. The system of claim 1, further comprising means for regulating addition of a reactant from the reactant source to the reaction chamber. 5. The system of claim 1, wherein the reaction chamber further comprises means for controlling a holding volume of the reaction chamber. 6. The system of claim 5, wherein the reaction chamber further comprises a baffle. 7. The system of claim 1, further comprising a sparger in fluid communication with the reaction chamber. 8. The system of claim 7, wherein the sparger is configured to deliver treated gas to the reaction chamber. 9. The system of claim 1, further comprising a valve configured to regulate flow of an oxidizing agent from the reaction chamber to the chemical oxidation stage. 10. The system of claim 9, wherein the oxidizing agent comprises chlorine dioxide. 11. The system of claim 9, further comprising a controller in communication with the valve to control an amount of oxidizing agent delivered to the chemical oxidation stage from the reaction chamber. 12. The system of claim 1, wherein the chemical oxidation stage comprises an absorptive layer proximate to the biological scrubber stage. 13. The system of claim 1, further comprising an irrigation source fluidly connected to the biological scrubber stage. 14. The system of claim 13, further comprising a nutrient reservoir fluidly connected to one or more of the scrubber sump and the irrigation source. 15. The system of claim 1, further comprising a recirculation system fluidly connecting the scrubber sump to the biological scrubber stage. 16. The system of claim 1, further comprising a polishing system fluidly connected to the treated gas outlet of the scrubber. 17. The system of claim 1, further comprising a controller configured to regulate dosing of a reactant from the reactant source to the reaction chamber. 18. The system of claim 17, further comprising a pH sensor in communication with the controller disposed to monitor a pH level of a liquid in the scrubber sump. 19. The system of claim 17, further comprising a pH sensor in communication with the controller disposed to monitor a pH level of a liquid in the reaction chamber. 20. The system of claim 17, further comprising a flow meter in communication with the controller disposed to monitor a process gas flow rate at the process gas inlet. 21. A method of modifying an existing biological gas treatment system having a treated gas outlet and a sump, comprising: connecting a chemical oxidation stage to the treated gas outlet of the biological gas treatment system;connecting a first inlet of a reaction chamber to the sump of the biological gas treatment system;connecting a second inlet of the reaction chamber to a source of a metal chlorite; andconnecting an outlet of the reaction chamber to an inlet of the chemical oxidation stage. 22. The method of claim 21, further comprising providing a sparger in fluid communication with the reaction chamber. 23. The method of claim 21, further comprising providing a controller configured to regulate a flow of reactant to the reaction chamber. 24. The method of claim 23, further comprising providing a pH sensor in communication with the controller configured to monitor a pH level of a liquid in the reaction chamber.
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이 특허에 인용된 특허 (14)
Koers Bonno (Amersfoort NLX), Apparatus for cleaning gases with the aid of organic filtration material.
Jenkins, John; Varani, Frederick T.; Jones, Thomas A.; Trost, Paul Bertram; Primmer, Aaron F.; Emsick, Nathan A., Dry chemical scrubber with pH adjustment.
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