초록 ▼

A method includes providing a substrate having a layer of photosensitive material thereon and a mask having contiguous first, second, and third portions; and sequentially: i) scanning the first portion with a light beam at a first rate and subsequently impinges on the photosensitive material at an e

A method includes providing a substrate having a layer of photosensitive material thereon and a mask having contiguous first, second, and third portions; and sequentially: i) scanning the first portion with a light beam at a first rate and subsequently impinges on the photosensitive material at an exposure zone; ii) fixing the scanning within the second portion; and iii) resuming scanning through the third portion. Throughout the process the substrate moves through the exposure zone. An apparatus for carrying out the process includes a light beam source, a mask mount, a mask stage, a conveyor assembly, and at least one optical element for manipulating the light beam into a rectangular light beam.

대표청구항 ▼

1. An apparatus comprising components: a) a source for producing a light beam;b) a mask mount adapted to receive a mask and capable of advancing along a linear first direction at a first rate, a second rate, and a third rate, wherein the mask comprises an image, and wherein the first image comprises

1. An apparatus comprising components: a) a source for producing a light beam;b) a mask mount adapted to receive a mask and capable of advancing along a linear first direction at a first rate, a second rate, and a third rate, wherein the mask comprises an image, and wherein the first image comprises contiguous first, second, and third image portions;c) a mask stage in communication with the mask mount and capable of translating at each of the first rate, the second rate, and the third rate;d) a conveyor assembly for advancing a substrate at a fourth rate through an exposure zone along a second direction, the substrate comprising a carrier and a layer of photosensitive material; ande) at least one optical element for directing the light beam to impinge on the mask such that the light beam is subsequently directed onto the photosensitive material in the exposure zone thereby forming a pattern in the photosensitive material,wherein the horizontal pattern formed in the photosensitive material is longer than the mask. 2. The apparatus of claim 1, further comprising a frame having components a) to e) affixed thereto. 3. The apparatus of claim 1, further comprising: f) a conveyor assembly controller in communication with the conveyor assembly and capable of varying the fourth rate. 4. The apparatus of claim 3, further comprising a frame having components a) to f) affixed thereto. 5. The apparatus of any one of claim 1 or claim 4, further comprising a computer in electrical communication with conveyor assembly and the mask stage. 6. The apparatus of any one of claim 1 to claim 5, wherein the light beam is reflected off the mask. 7. The apparatus of any one of claim 1 to claim 6, wherein the at least one optical element directs the light beam in a raster pattern.