IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0908506
(2010-10-20)
|
등록번호 |
US-8343790
(2013-01-01)
|
발명자
/ 주소 |
- Lutz, Markus
- Partridge, Aaron
- Stark, Brian H.
|
출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
2 인용 특허 :
23 |
초록
▼
Many inventions are disclosed. Some aspects are directed to MEMS, and/or methods for use with and/or for fabricating MEMS, that supply, store, and/or trap charge on a mechanical structure disposed in a chamber. Various structures may be disposed in the chamber and employed in supplying, storing and/
Many inventions are disclosed. Some aspects are directed to MEMS, and/or methods for use with and/or for fabricating MEMS, that supply, store, and/or trap charge on a mechanical structure disposed in a chamber. Various structures may be disposed in the chamber and employed in supplying, storing and/or trapping charge on the mechanical structure. In some aspects, a breakable link, a thermionic electron source and/or a movable mechanical structure are employed. The breakable link may comprise a fuse. In one embodiment, the movable mechanical structure is driven to resonate. In some aspects, the electrical charge enables a transducer to convert vibrational energy to electrical energy, which may be used to power circuit(s), device(s) and/or other purpose(s). In some aspects, the electrical charge is employed in changing the resonant frequency of a mechanical structure and/or generating an electrostatic force, which may be repulsive.
대표청구항
▼
1. A method for use in association with an electromechanical device having a mechanical structure, the method comprising: depositing a sacrificial layer over the mechanical structure;depositing a first encapsulation layer over the sacrificial layer;forming at least one vent through the first encapsu
1. A method for use in association with an electromechanical device having a mechanical structure, the method comprising: depositing a sacrificial layer over the mechanical structure;depositing a first encapsulation layer over the sacrificial layer;forming at least one vent through the first encapsulation layer to allow removal of at least a portion of the sacrificial layer;removing at least a portion of the sacrificial layer to form a chamber;depositing a second encapsulation layer over or in the vent to seal the chamber;supplying an electrical charge to at least one portion of the mechanical structure through an electrical connection disposed in the chamber; andelectrically isolating the at least one portion of the mechanical structure;wherein, as a result of the isolation, the electrical charge is stored within the at least one portion of the mechanical structure. 2. The method of claim 1 wherein the mechanical structure comprises a semiconductor material. 3. The method of claim 2 wherein the semiconductor material of the mechanical structure is comprised of polycrystalline silicon, amorphous silicon, silicon carbide, silicon/germanium, germanium, or gallium arsenide. 4. The method of claim 1 wherein the first encapsulation layer comprises a semiconductor material. 5. The method of claim 1 wherein the second encapsulation layer comprises a semiconductor material. 6. The method of claim 1 wherein electrically isolating the mechanical structure includes electrically isolating the mechanical structure such that at least a portion of the electrical charge is stored on the mechanical structure for a period of at least one day. 7. The method of claim 1 wherein electrically isolating the mechanical structure includes electrically isolating the mechanical structure such that at least a portion of the electrical charge will be stored on the mechanical structure for a period of at least one month. 8. The method of claim 1 wherein electrically isolating the mechanical structure includes electrically isolating the mechanical structure such that at least a portion of the electrical charge will be stored on the mechanical structure for a period of at least one year. 9. The method of claim 1 wherein electrically isolating the mechanical structure includes electrically isolating the mechanical structure such that at least a portion of the electrical charge will be stored on the mechanical structure for a period of at least ten years. 10. The method of claim 1 wherein supplying the electrical charge to the mechanical structure through an electrical connection disposed in the chamber includes the supplying electrical charge to the mechanical structure through an electrical connection between the mechanical structure and another mechanical structure disposed in the chamber. 11. The method of claim 1 wherein electrically isolating the mechanical structure includes irreversibly breaking the electrical connection. 12. The method of claim 11 wherein supplying the electrical charge to the mechanical structure through an electrical connection disposed in the chamber includes supplying the electrical charge to the mechanical structure through a fuse disposed in the chamber. 13. The method of claim 12 wherein breaking the electrical connection includes blowing at least one portion of the fuse. 14. The method of claim 13 wherein blowing at least one portion of the fuse includes melting at least one portion of the fuse. 15. The method of claim 13 wherein blowing at least one portion of the fuse includes supplying at least one portion of the fuse with electrical current to heat the at least one portion of the fuse. 16. The method of claim 13 wherein blowing at least one portion of the fuse includes supplying at least one portion of the fuse with electrical current to cause the at least one portion of the fuse to dissipate energy and reach or exceed a temperature at which the at least one portion of the fuse blows. 17. The method of claim 13 wherein the mechanical structure further includes a first electrode and a second electrode each disposed in the chamber, the fuse includes a first portion and a second portion, the first portion having a first end coupled to the first electrode and a second end coupled to the second electrode, the second portion having a first end coupled to the first portion of the fuse and a second end coupled to the mechanical structure, and wherein blowing at least one portion of the fuse includes blowing at least one portion of the first portion of the fuse and blowing at least one portion of the second portion of the fuse. 18. The method of claim 1 wherein the electrical isolation of the at least one portion of the mechanical structure is from the electrical connection. 19. A method for use in association with an electromechanical device having a substrate and an encapsulation structure, the encapsulation structure being disposed over at least a portion of the substrate and defining at least a portion of a chamber, the electromechanical device further having a micromechanical structure that includes a mechanical structure disposed in the chamber, the method comprising: supplying an electrical charge to the mechanical structure of the micromechanical structure through a breakable link disposed in the chamber; andirreversibly breaking at least a portion of the breakable links;wherein, as a result of the isolation, the electrical charge is stored within the at least one portion of the mechanical structure. 20. The method of claim 19 wherein the mechanical structure comprises a semiconductor material. 21. The method of claim 19 wherein supplying electrical charge to the mechanical structure through a breakable link includes supplying electrical charge to the mechanical structure through a fuse disposed in the chamber. 22. The method of claim 21 wherein irreversibly breaking at least one portion of the breakable link includes blowing at least one portion of the fuse. 23. A method for use in association with an electromechanical device having a substrate and an encapsulation structure, the encapsulation structure being disposed over at least a portion of the substrate and defining at least a portion of a chamber, the electromechanical device further having a micromechanical structure that includes a mechanical structure disposed in the chamber, the method comprising: controlling at least one portion of at least one movable mechanical structure disposed in the chamber to provide an electrical connection;supplying an electrical charge to the mechanical structure of the micromechanical structure through the electrical connection; andbreaking the electrical connection;wherein, as a result of the isolation, the electrical charge is stored within the at least one portion of the mechanical structure. 24. The method of claim 23 wherein the mechanical structure comprises a semiconductor material. 25. The method of claim 23 wherein controlling at least one portion of at least one movable mechanical structure disposed in the chamber to provide an electrical connection includes controlling at least one portion of the at least one movable structure to provide electrical contact between a first contact surface and a second contact surface. 26. The method of claim 23 wherein controlling at least one portion of at least one movable mechanical structure disposed in the chamber to provide an electrical connection includes driving at least one portion of the at least one movable structure into mechanical resonance.
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