A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydro
A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.
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1. A compound represented by the following formula 1: wherein each R1 is an acid-dissociating group selected from the group consisting of substituted methyl groups, 1-substituted ethyl groups, 1-substituted n-propyl groups, 1-branched alkyl groups, silyl groups, acyl groups, 1-substituted alkoxymet
1. A compound represented by the following formula 1: wherein each R1 is an acid-dissociating group selected from the group consisting of substituted methyl groups, 1-substituted ethyl groups, 1-substituted n-propyl groups, 1-branched alkyl groups, silyl groups, acyl groups, 1-substituted alkoxymethyl groups, cyclic ether groups and alkoxycarbonyl groups, and two or more R1 may be the same or different;each R2A is a group selected from the group consisting of halogen atom, alkyl group, cycloalkyl group, aryl group, aralkyl group, alkoxy group, aryloxy group, alkenyl group, acyl group, alkoxycarbonyl group, alkyloyloxy group, aryloyloxy group, cyano group, and nitro group, and two or more R2A may be the same or different;each of R3 and R7 is a hydrogen atom or alkyl group having 1 to 6 carbon atoms;R4A is a divalent group having 10 to 28 carbon atoms which includes a biphenyl structure, terphenyl structure, naphthalene structure, phenanthrene structure, or pyrene structure, or R4A together with R3 and R7 optionally represents a tetravalent group having 10 to 28 carbon atoms which includes a fluorine structure or benzophenone structure; andeach of k0, j0, m0, and n0 is an integer of 0 to 3; each of k1, j1, m1, and n1 is an integer of 0 to 3; and each of k2, j2, m2, and n2 is an integer of 0 to 4, satisfying 1≦k0+k1+k2≦5, 1≦j0+j1+j2≦5, 1≦m0+m1+m2≦5, 1≦n0+n1+n2≦5, 1≦k1+j1+m1+n1≦12, 1≦k0+k1≦3, 1≦j0+j1≦3, 1≦m0+m1≦3, and 1≦n0+n1≦3. 2. The compound according to claim 1, which is represented by the following formula 7-1: wherein R1, R3, R7, k0, j0, m0, n0, k1, j1, m1, n1, k2, j2, m2, and n2 are the same as defined above; each R2B is a group selected from the group consisting of halogen atom, alkyl group, aryl group, aralkyl group, alkoxy group, alkenyl group, acyl group, alkoxycarbonyl group, alkyloyloxy group, aryloyloxy group, cyano group and nitro group, and two or more R2B may be the same or different; and R4B is a divalent group having 10 to 20 carbon atoms which includes a naphthalene structure. 3. The compound according to claim 1, which is represented by the following formula 7-2: wherein R1, R3, R7, k0, j0, m0, n0, k1, j1, m1, n1, k2, j2, m2, and n2 are the same as defined above; each R2B is a group selected from the group consisting of halogen atom, alkyl group, aryl group, aralkyl group, alkoxy group, alkenyl group, acyl group, alkoxycarbonyl group, alkyloyloxy group, aryloyloxy group, cyano group, and nitro group, and two or more R2B may be the same or different; and R4C is a divalent group having 18 to 28 carbon atoms which includes a terphenyl structure. 4. A compound represented by the following formula 28: wherein each R1 is an acid-dissociating group selected from the group consisting of substituted methyl groups, 1-substituted ethyl groups, 1-substituted n-propyl groups, 1-branched alkyl groups, silyl groups, acyl groups, 1-substituted alkoxymethyl groups, cyclic ether groups, and alkoxycarbonyl groups, and two or more R1 may be the same or different; each R2A is a group selected from the group consisting of halogen atom, alkyl group, cycloalkyl group, aryl group, aralkyl group, alkoxy group, aryloxy group, alkenyl group, acyl group, alkoxycarbonyl group, alkyloyloxy group, aryloyloxy group, cyano group, and nitro group, and two or more R2A may be the same or different;R4D is a trivalent group having 6 to 20 carbon atoms which includes a benzene structure, naphthalene structure, terphenyl structure or phenanthrene structure;each of k3, j3, m3, n3, x3, and y3 is an integer of 0 to 3; each of k4, j4, m4, n4, x4, and y4 is an integer of 0 to 3; and each of k5, j5, m5, n5, x5, and y5 is an integer of 0 to 4, satisfying 1≦k3+k4+k5≦5, 1≦j3+j4+j5≦5, 1≦m3+m4+m5≦5, 1≦n3+n4+n5≦5, 1≦x3+x4+x5≦5, 1≦y3+y4=y5≦5, 1≦k4+j4+m4+n4+x4+y4≦18, 1≦k3+k4≦3, 1≦j3+j4≦3, 1≦m3+m4≦3, 1≦n3+n4≦3, 1≦x3+x4≦3, and 1≦y3+y4≦3. 5. The compound according to claim 4, which is represented by the following formula 29: wherein R1, R2A, k3, j3, m3, n3, x3, y3, k4, j4, m4, n4, x4, y4, k5, j5, m5, n5, x5, and y5 are the same as defined above. 6. The compound according to claim 2, which is represented by the following formula 9-1: wherein R1, R2B, R3, R7, k0, j0, m0, n0, k1, j1, m1, n1, k2, j2, m2, and n2 are the same as defined above; each R5A is independently a group selected from an alkyl group having 1 to 10 carbon atoms, cycloalkyl group having 3 to 10 carbon atoms, and aryl group having 6 to 10 carbon atoms, and two or more R5A may be the same or different; and p1 is an integer of 0 to 6. 7. The compound according to claim 6, which is represented by the following formula 9-2: wherein R1, R2B, R3, R7, p1, k0, j0, m0, n0, k1, j1, m1, n1, k2, j2, m2, and n2 are the same as defined above; and each R5B is an aryl group having 1 to 6 carbon atoms, and two or more R5B may be the same or different. 8. The compound according to claim 3, which is represented by the following formula 18-1: wherein R1, R2B, R3, R7, k0, j0, m0, n0, k1, j1, m1, n1, k2, j2, m2, and n2 are the same as defined above; each R5A is a group selected from an alkyl group having 1 to 10 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms and an aryl group having 6 to 10 carbon atoms, and two or more R5A may be the same or different; and p2 is an integer of 0 to 2. 9. The compound according to claim 8, which is represented by the following formula 18-2: wherein R1, R2B, R3, R5B, R7, p2, k0, j0, m0, n0, k1, j1, m1, n1, k2, j2, m2, and n2 are the same as defined above; and each R5B is an aryl group having 1 to 6 carbon atoms, and two or more R5B may be the same or different. 10. The compound according to claim 1, which is represented by the following formulae 25-1 to 25-10: wherein each R8 is a hydrogen atom or methyl group, and two or more R8 in respective formulae may be the same or different. 11. The compound according to claim 5, which is represented by the following formulae 30-2 to 30-4: 12. The compound according to claim 1, which has an absorptivity coefficient of 40 L/(cm·g) or more at a wavelength of 248 nm. 13. The compound according to claim 4, which has an absorptivity coefficient of 15 L/(cm·g) or more at a wavelength of 248 nm. 14. A compound represented by the following formula 32-1: wherein each R2A is a group selected from the group consisting of halogen atom, alkyl group, cycloalkyl group, aryl group, aralkyl group, alkoxy group, aryloxy group, alkenyl group, acyl group, alkoxycarbonyl group, alkyloyloxy group, aryloyloxy group, cyano group, and nitro group, and two or more R2A may be the same or different;each of R3 and R7 is a hydrogen atom or alkyl group having 1 to 6 carbon atoms;R4A is a divalent group having 10 to 28 carbon atoms which includes a biphenyl structure, terphenyl structure, naphthalene structure, phenanthrene structure, or pyrene structure, or R4A together with R3 and R7 optionally represents a tetravalent group having 10 to 28 carbon atoms which includes a fluorine structure or benzophenone structure;each of k0′, j0′, m0′, and n0′ is an integer of 1 to 3, and each of k2′, j2′, m2′, and n2′ is an integer of 0 to 4, satisfying 1≦k0′+k2′≦5, 1≦j0′+j2′≦5, 1≦m0′+m2′≦5, and 1≦n0′+n2′≦5. 15. A compound represented by the following formula 33-1: wherein each R2A is a group selected from the group consisting of halogen atom, alkyl group, cycloalkyl group, aryl group, aralkyl group, alkoxy group, aryloxy group, alkenyl group, acyl group, alkoxycarbonyl group, alkyloyloxy group, aryloyloxy group, cyano group, and nitro group, and two or more R2A may be the same or different;R4D is a trivalent group having 6 to 20 carbon atoms which includes a benzene structure, naphthalene structure, terphenyl structure, or phenanthrene structure;each of k3′, j3′, m3′, n3′, x3′, and y3′ is an integer of 1 to 3, and each of k5′, j5′, m5′, n5′, x5′, and y5′ is an integer of 0 to 4, satisfying 1≦k3′+k5′≦5, 1≦j3′+j5′≦5, 1≦m3′+m5′≦5, 1≦n3′+n5′≦5, 1≦x3′+x5′≦5, and 1≦y3′+y5′≦5. 16. The compound according to claim 14, which is represented by the following formula 32-2: wherein R2A, R3, R7, k0′, j0′, m0′, n0′, k2′, j2′, m2′, and n2′ are the same as defined above; and R4B is a divalent group having 10 to 20 carbon atoms which includes a naphthalene structure. 17. The compound according to claim 14, which is represented by the following formula 32-3: wherein R2A, R3, R7, k0′, j0′, m0′, n0′, k2′, j2′, m2′, and n2′ are the same as defined above; and R4 is a divalent group having 18 to 28 carbon atoms which includes a terphenyl structure. 18. The compound according to claim 16, which is represented by the following formula 32-4: wherein R3, R4B, R7, k0′, j0′, m0′, n0′, k2′, j2′, m2′, and n2′ are the same as defined above, and each R2B is a group selected from the group consisting of halogen atom, alkyl group, aryl group, aralkyl group, alkoxy group, alkenyl group, acyl group, alkoxycarbonyl group, alkyloyloxy group, aryloyloxy group, cyano group, and nitro group, and two or more R2B may be the same or different. 19. The compound according to claim 17, which is represented by the following formula 32-5: wherein R3, R4C, R7, k0′, j0′, m0′, n0′, k2′, j2′, m2′, and n2′ are the same as defined above, each R2B is a group selected from the group consisting of halogen atom, alkyl group, aryl group, aralkyl group, alkoxy group, alkenyl group, acyl group, alkoxycarbonyl group, alkyloyloxy group, aryloyloxy group, cyano group, and nitro group, and two or more R2B may be the same or different. 20. The compound according to claim 15, which is represented by the following formula 33-2: wherein R2A, k3′, j3′, m3′, n3′, x3′, y3′, k5′, j5′, m5′, n5′, x5′, and y5′ are the same as defined above. 21. The compound according to claim 14, which is represented by the following formulae 32-6 to 32-10: wherein each R8 is a hydrogen atom or methyl group, and two or more R8 in respective formulae may be the same or different. 22. The compound according to claim 15, which is represented by the following formula 33-3: wherein each R8 is a hydrogen atom or methyl group, and two or more R8 may be the same or different. 23. The compound according to claim 14, which has an absorptivity coefficient of 40 L/(cm·g) or more at a wavelength of 248 nm. 24. The compound according to claim 15, which has an absorptivity coefficient of 15 L/(cm·g) or more at a wavelength of 248 nm. 25. A compound which is a compound B having a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A and having a molecular weight of 400 to 2000, wherein said polyphenol compound A is a compound synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms.
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이 특허에 인용된 특허 (6)
Aoai, Toshiaki; Adegawa, Yutaka; Yagihara, Morio, Electron beam or X-ray negative-working resist composition.
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