Adjustable solubility in sacrificial layers for microfabrication
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01L-021/302
H01L-021/461
출원번호
US-0918269
(2006-04-14)
등록번호
US-8357616
(2013-01-22)
국제출원번호
PCT/US2006/014184
(2006-04-14)
§371/§102 date
20090220
(20090220)
국제공개번호
WO2006/113492
(2006-10-26)
발명자
/ 주소
Linder, Vincent
Ryan, Declan
Gates, Byron
Amir-parviz, Babak
Whitesides, George M.
출원인 / 주소
President and Fellows of Harvard College
인용정보
피인용 횟수 :
3인용 특허 :
81
초록▼
The present invention provides fabrication methods using sacrificial materials comprising polymers. In some embodiments, the polymer may be treated to alter its solubility with respect to at least one solvent (e.g., aqueous solution) used in the fabrication process. The preparation of the sacrificia
The present invention provides fabrication methods using sacrificial materials comprising polymers. In some embodiments, the polymer may be treated to alter its solubility with respect to at least one solvent (e.g., aqueous solution) used in the fabrication process. The preparation of the sacrificial materials is rapid and simple, and dissolution of the sacrificial material can be carried out in mild environments. Sacrificial materials of the present invention may be useful for surface micromachining, bulk micromachining, and other microfabrication processes in which a sacrificial layer is employed for producing a selected and corresponding physical structure.
대표청구항▼
1. A method for microfabrication or other small-scale fabrication process, comprising: forming a sacrificial material comprising a polymer on a substrate, wherein the polymer is soluble in aqueous solution;treating the sacrificial material with a bivalent ion such that the polymer becomes substantia
1. A method for microfabrication or other small-scale fabrication process, comprising: forming a sacrificial material comprising a polymer on a substrate, wherein the polymer is soluble in aqueous solution;treating the sacrificial material with a bivalent ion such that the polymer becomes substantially insoluble in aqueous solution;removing the bivalent ion from the sacrificial material such the polymer becomes soluble in aqueous solution; andremoving the sacrificial material. 2. A method as in claim 1, further comprising carrying out a fabrication process in aqueous solution while the polymer is substantially insoluble in aqueous solution. 3. A method as in claim 1, wherein the polymer is poly(acrylic acid), dextran, poly(methacrylic acid), poly(acrylamide), poly(ethylene imine), poly(vinyl alcohol), poly(ethylene oxide), chitosan, or sucrose. 4. A method as in claim 3, wherein the polymer is poly(acrylic acid), dextran, or poly(methacrylic acid). 5. A method as in claim 4, wherein the polymer is poly(acrylic acid). 6. A method as in claim 5, further comprising forming an adhesion layer on the substrate. 7. A method as in claim 6, wherein the adhesion layer comprises poly(acrylic acid). 8. A method as in claim 1, wherein the bivalent ion is Ca2+ or Cu2+. 9. A method as in claim 1, wherein the bivalent ion is Ca2+. 10. A method for microfabrication or other small-scale fabrication process, comprising: forming a sacrificial material comprising poly(acrylic acid) on a substrate, wherein the poly(acrylic acid) is associated with a univalent ion and the sacrificial material is soluble in aqueous solution;treating the sacrificial material with a bivalent ion, such that the poly(acrylic acid) becomes associated with the bivalent ion and the sacrificial material becomes substantially insoluble in aqueous solution;carrying out a fabrication process, using the poly(acrylic acid) as sacrificial material; andremoving the bivalent ion from the poly(acrylic acid) such the sacrificial material becomes soluble in aqueous solution; andremoving the sacrificial material. 11. A method as in claim 10, wherein the univalent ion is Na+. 12. A method as in claim 10, wherein the bivalent ion is Ca2+ or Cu2+. 13. A method as in claim 12, wherein the bivalent ion is Ca2+. 14. A method as in claim 1, wherein the solvent is an aqueous solvent, comprising: treating the polymer to lower the solubility of the polymer with respect to the solvent by subjecting the polymer to a first ion exchange reaction;carrying out the fabrication process, using the polymer as sacrificial material;after fabrication, treating the polymer to increase the solubility of the polymer with respect to the solvent by subjecting the polymer to a second ion exchange reaction; andremoving the polymer at least in part by dissolving the polymer in the solvent. 15. A method as in claim 14, wherein the first ion exchange reaction comprises replacing at least some univalent ion in the polymer with bivalent ion, and the second ion exchange reaction comprises replacing at least some bivalent ion in the polymer with univalent ion. 16. A method as in claim 1, wherein the sacrificial material comprises a first portion and a second portion, the method comprising treating the first portion of the sacrificial material with the bivalent ion such that the first portion becomes substantially insoluble in aqueous solution and the second portion is not treated with the bivalent ion. 17. A method as in claim 16, further comprising removing the first portion of the sacrificial material. 18. A method as in claim 16, further comprising removing the second portion of the sacrificial material. 19. A method for microfabrication or other small-scale fabrication process, comprising: forming a sacrificial material comprising a polymer on a substrate, wherein the sacrificial material comprises a first portion and a second portion and wherein the polymer is soluble in aqueous solution;treating the first portion of the sacrificial material with a bivalent ion such that the polymer becomes substantially insoluble in aqueous solution, without similarly treating the second portion;removing the second portion of the sacrificial material:,removing the bivalent ion from the first portion of the sacrificial material; andremoving the first portion of the sacrificial material. 20. A method as in claim 19, wherein the polymer is poly(acrylic acid), dextran, poly(methacrylic acid), poly(acrylamide), poly(ethylene imine), poly(vinyl alcohol), poly(ethylene oxide), chitosan, or sucrose. 21. A method as in claim 20, wherein the polymer is poly(acrylic acid), dextran, or poly(methacrylic acid). 22. A method as in claim 20, wherein the polymer is poly(acrylic acid). 23. A method as in claim 19, wherein the substrate further comprises an adhesion layer. 24. A method as in claim 23, wherein the adhesion layer comprises poly(acrylic acid). 25. A method as in claim 19, wherein the bivalent ion is Ca2+ or Cu2+. 26. A method as in claim 19, wherein the bivalent ion is Ca2+.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (81)
Matyjaszewski Krzysztof ; Wang Jin-Shan, (Co)polymers and a novel polymerization process based on atom (or group) transfer radical polymerization.
Johnson Robert W. (Endicott NY) Lawrence William H. (Greene NY) Lemon Gary K. (Endicott NY) Magnuson Roy H. (Endicott NY) Markovich Voya R. (Endwell NY) Parsons Ralph E. (Endicott NY) Sambucetti Carl, Conditioning a non-conductive substrate for subsequent selective deposition of a metal thereon.
Jimarez Lisa J. (Newark Valley NY) Lawrence William H. (Greene NY) Markovich Voya R. (Endwell NY) Owen Robert J. (Binghamton NY) Sambucetti Carlos J. (Croton-on-Hudson NY), Depositing a conductive metal onto a substrate.
Miller,Robert Dennis; Kim,Ho Cheol; Connor,Eric; Lee,Victor Yee Way; Wallraff,Gregory Michael; Volksen,Willi, Direct photo-patterning of nanoporous organosilicates, and method of use.
Naae Douglas G. (Houston TX) DaGue Michael G. (Houston TX) Dunn Nancy G. (Houston TX), Hydrocarbon recovery comprising injecting a slug comprising oil soluble alkoxylated surfactants from lignin.
Titterington Donald R. (Tualatin OR) Bui Loc V. (Portland OR) Hirschy Linda M. (Portland OR) Frame Harold (Hal) R. (Gaston OR), Indirect printing process for applying selective phase change ink compositions to substrates.
Chester Arthur W. (Cherry Hill NJ) Chu Pochen (West Deptford NJ) Huss ; Jr. Albin (Chadds Ford PA) Kirker Garry W. (Sewell NJ), Metal passivating agents.
Ferranti, David C.; Szelag, Sharon M.; Casey, Jr., J. David, Method and apparatus for repairing lithography masks using a charged particle beam system.
Asakawa,Koji; Ohashi,Kenichi; Fujimoto,Akira; Sasaki,Takashi, Method of manufacturing semiconductor device, acid etching resistance material and copolymer.
Edman, Carl F.; Heller, Michael J.; Formosa, Rachel; Gurtner, Christian, Methods apparatus for the electronic, homogeneous assembly and fabrication of devices.
DeYoung, James P.; McClain, James B.; Gross, Stephen M.; DeSimone, Joseph M., Methods for cleaning microelectronic structures with aqueous carbon dioxide systems.
Koontz Steven L. (League City TX), Microporous structure with layered interstitial surface treatment, and method and apparatus for preparation thereof.
Engel Robert F. (Kingwood TX) Long Thomas E. (Houston TX) Warrington Ralph M. (Humble TX), Offshore platform free of marine growth and method of reducing platform loading and overturn.
Lipson Melvin A. (Newport Beach CA) Carter Thomas P. (Laguna Beach CA) Shelnut James G. (Lake Forest CA) Roos Leo (Laguna Beach CA), Photoimageable composition with reduced cold flow due to salt-bridging by metal ions and dry film formed therefrom.
Heller Adam (Bridgewater NJ) Tai King L. (Berkeley Heights NJ) Vadimsky Richard G. (Somerville NJ), Photoinduced migration of silver into chalcogenide layer.
Klaerner, Gerrit; Nielsen, Ralph B.; Mansky, Paul; Benoit, Didier; Charmot, Dominique; Jandeleit, Bernd; Mazzola, Laura T., Polymer brushes for immobilizing molecules to a surface and having water-soluble or water-dispersible segments therein and probes bonded thereto.
Pastor Antonio C. (Santa Monica CA) Pastor Ricardo C. (Manhattan Beach CA) Tangonan Gregory L. (Oxnard CA) Wong Shi-Yin (Santa Monica CA), Process for depositing a film of controlled composition using a metallo-organic photoresist.
Sachs Emanuel M. (Somerville MA) Cima Michael J. (Lexington MA) Bredt James F. (Watertown MA) Khanuja Satbir (Cambridge MA), Process for removing loose powder particles from interior passages of a body.
Agostino Peter A. (Canaan NY) Babu Suryadevara V. (Potsdam NY) Hoffarth Joseph G. (Binghamton NY), Removal of residual catalyst from a dielectric substrate.
DellaGuardia Ronald A. (Poughkeepsie NY) Mauer ; IV John L. (South Kent CT) Seeger David E. (Congers NY), Resist development endpoint detection for X-ray lithography.
Magnuson Roy H. (Endicott NY) Malek Richard W. (Johnson City NY) Markovich Voya R. (Endwell NY) Wilson William E. (Waverly NY), Semi-subtractive circuitization.
Jin Sungho (Millington NJ) Kochanski Gregory P. (Dunellen NJ) Thomson ; Jr. John (Spring Lake NJ), Spaced-gate emission device and method for making same.
Kalfoglou George (Houston TX), Surfactant oil recovery method for use in high temperature formations containing water having high salinity and hardness.
Edman, Carl Frederick; Heller, Michael James; Gurtner, Christian; Formosa, Rachel, Systems and devices for photoelectrophoretic transport and hybridization of oligonucleotides.
Narang Ram S. ; Kneezel Gary A. ; Zhang Bidan ; Fisher Almon P. ; Fuller Timothy J., Thermal ink jet printhead and process for the preparation thereof.
Lentsch,Steven E.; Bartelme,Michael J.; Man,Victor F.; Baum,Burton M.; Everson,Terence P., Warewashing composition for use in automatic dishwashing machines, comprising a mixture of aluminum and zinc ions.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.