초록

An exposure apparatus comprises a stage main body having a mounting surface, and a correcting mechanism that corrects a shape of the mounting surface.

대표청구항 ▼

1. A stage apparatus, comprising: a stage member, which has a mounting surface on which an object is mounted and moves above a planar surface;a drive apparatus, which generates a force to move the stage member along the planar surface; anda deforming apparatus, which deforms a shape of the mounting

1. A stage apparatus, comprising: a stage member, which has a mounting surface on which an object is mounted and moves above a planar surface;a drive apparatus, which generates a force to move the stage member along the planar surface; anda deforming apparatus, which deforms a shape of the mounting surface by using the force. 2. The stage apparatus according to claim 1, further comprising: a guiding member, which supports the stage member so that the stage member moves above the planar surface in a non-contact manner; andvacuum preloaded air pads, which are provided at the stage member,wherein the deforming apparatus deforms the shape of the mounting surface by using the force and a preloading vacuum force of the air pads. 3. A stage apparatus comprising: a stage member, which moves above a planar surface;a holding member, which is provided on the stage member and has a mounting surface that supports a lower surface of a plate-like object;a deforming apparatus, which deforms a shape of the mounting surface by using a first force and a second force, the first force being applied to a direction that intersects with the planar surface, the second force being different from the first force, the deforming apparatus deforming the shape of the mounting surface by deforming a shape of the holding member in a state in which the deforming apparatus is not in contact with an upper surface of the object supported by the mounting surface, anda drive apparatus, which generates a driving force to move the stage member, the drive apparatus generating either one of the first force and the second force. 4. The stage apparatus according to claim 3, wherein the deforming apparatus uses a vacuum suction force for either one of the first force and the second force. 5. The stage apparatus according to claim 4, further comprising: a guiding member, which supports the stage member so that the stage member moves above the planar surface in a non-contact manner; andvacuum preloaded air pads, which are provided at the stage member,wherein the deforming apparatus uses a force for moving the stage member and a preloading vacuum force of the air pads as the first and second forces. 6. The stage apparatus according to claim 3, wherein the stage member moves along the planar surface by the driving force. 7. The stage apparatus according to claim 3, wherein the drive apparatus has an actuator that generates a first driving force for moving the stage member along the planar surface and a second driving force for moving the stage member in a direction that intersects with the planar surface, andeither one of the first force and the second force is the second driving force. 8. The stage apparatus according to claim 3, wherein when the stage member moves in a prescribed region of the planar surface, the deforming apparatus deforms a shape of at least an area positioned at a predetermined region on the mounting surface. 9. The stage apparatus according to claim 3, wherein when the stage member is driven, the deforming apparatus deforms the shape of the mounting surface. 10. The stage apparatus according to claim 3, wherein the deforming apparatus adjusts an amount of deformation based on prescribed information related to the shape of the mounting surface. 11. The stage apparatus according to claim 10, wherein the prescribed information is information related to changes in the shape of the mounting surface. 12. An exposure apparatus, comprising: a stage apparatus according to claim 3. 13. The exposure apparatus according to claim 12, further comprising: a projection optical system that projects an exposure light;whereinthe deforming apparatus deforms the shape of the mounting surface based on information related to a projected image of the projection optical system. 14. The exposure apparatus according to claim 12, wherein the deforming apparatus corrects the shape of the mounting surface based on information related to changes in the shape of the mounting surface. 15. The exposure apparatus according to claim 12, wherein the stage apparatus is a mask stage that is capable of moving while holding a mask on which a predetermined pattern is formed. 16. The exposure apparatus according to claim 15, wherein the mask stage comprises a mover that has a opening through which exposure light can pass, andthe deforming apparatus applies forces to both sides of the mover, which sandwich the opening. 17. The exposure apparatus according to claim 12, wherein the stage apparatus is a substrate stage that is capable of moving while holding a substrate on which a predetermined pattern is fowled. 18. The exposure apparatus according to claim 12, wherein the deforming apparatus corrects the shape of the mask so that the pattern is focused on an exposed surface of a substrate, which is to be exposed. 19. A device fabricating method comprising: a lithographic process that uses an exposure apparatus according to claim 12 to expose a substrate to an exposure beam.