초록 ▼

The present invention relates to methods and systems for purifying gases, such as for example semiconductor process gases. The invention more particularly relates to fluid purification methods and systems having improved heat transfer capabilities and controls such that the purified fluid produced f

The present invention relates to methods and systems for purifying gases, such as for example semiconductor process gases. The invention more particularly relates to fluid purification methods and systems having improved heat transfer capabilities and controls such that the purified fluid produced from the process contains reduced impurity levels and/or exhibits more uniform concentrations within the final product. In another aspect of the invention, the activation time for adsorbent beds used in such processes and systems can be reduced.

대표청구항 ▼

1. A process for activating at least one adsorption bed in an adsorption vessel, the activation process comprising: feeding an activation fluid into an adsorption vessel, the adsorbent vessel having an inner surface and an outer surface, the vessel comprising at least one adsorbent bed formed of at

1. A process for activating at least one adsorption bed in an adsorption vessel, the activation process comprising: feeding an activation fluid into an adsorption vessel, the adsorbent vessel having an inner surface and an outer surface, the vessel comprising at least one adsorbent bed formed of at least one adsorbent; at least one plate in thermal contact with the inner surface of the vessel and formed of material having higher thermal conductivity than the thermal conductivity of the at least one adsorbent; and wherein the at least one plate is configured to transfer heat and/or cooling to and from the at least one adsorbent bed;passing the activation fluid over the at least one adsorption bed in the adsorption vessel for a time sufficient for the at least one adsorption bed to heat up to an activation temperature;maintaining the flow of the activation fluid through the at least one adsorption bed during an activation step, the activation step being for a time sufficient to activate the at least one adsorbent or for a time sufficient to regenerate the at least one adsorbent; andcooling the at least one adsorption bed during a cooling step, the cooling step being for a time sufficient for the at least one adsorption bed to reach a predetermined cooled temperature;wherein the activation fluid is removed from the adsorption vessel and replaced with a second activation fluid prior to the cooling step. 2. The activation process of claim 1, wherein the activation fluid is replaced with the second activation fluid during the activation step. 3. The activation process of claim 2, wherein the activation fluid and the second activation fluid are inert gases. 4. The activation process of claim 3, wherein the inert gases are selected from the group consisting of: nitrogen, hydrogen, helium, and argon.