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A one-piece susceptor ring for housing at least one temperature measuring device is provided. The susceptor ring includes a plate having an aperture formed therethrough and a pair of side ribs integrally connected to a lower surface of the plate. The side ribs are located on opposing sides of the ap

A one-piece susceptor ring for housing at least one temperature measuring device is provided. The susceptor ring includes a plate having an aperture formed therethrough and a pair of side ribs integrally connected to a lower surface of the plate. The side ribs are located on opposing sides of the aperture. The susceptor ring further includes a bore formed in each of the pair of side ribs. Each bore is configured to receive a temperature measuring device therein.

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1. A one-piece susceptor ring for use in a semiconductor processing tool comprising: a plate having an aperture formed therethrough;a first side rib, a second side rib, and a center rib extending from a lower surface of said plate, wherein said center rib is located between said first side rib and s

1. A one-piece susceptor ring for use in a semiconductor processing tool comprising: a plate having an aperture formed therethrough;a first side rib, a second side rib, and a center rib extending from a lower surface of said plate, wherein said center rib is located between said first side rib and said second side rib, and wherein said center rib is substantially parallel to each of said first side rib and said second side rib;a bore formed in each of said first side rib, said second side rib, and said center rib, wherein the bores of the first side rib and second side rib are substantially linear, wherein each of said bores are configured to receive a temperature measuring device therein, and wherein each of said bores forms a blind hole open to a trailing edge of said plate; anda ring rib integrally connected to said lower surface of said plate, said ring rib disposed about said aperature, wherein said center rib extends from the trailing edge to said ring rib. 2. The one-piece susceptor ring of claim 1, wherein said bores have a circular cross-sectional shape. 3. The one-piece susceptor ring of claim 1, further comprising a leading edge opposite the trailing edge, configured such that fluid cannot enter the bore when flowing in a direction from the leading edge toward the trailing edge. 4. A one-piece susceptor ring for use in a semiconductor processing tool, comprising: a plate having an aperture formed therethrough;a ring rib disposed about said aperture and integrally connected to and extending downwardly from a lower surface of said plate;a pair of separate linear side ribs integrally connected to said lower surface of said plate, said side ribs located on opposing sides of said aperture and aligned substantially parallel to each other;a center rib located between said side ribs and integrally connected to said lower surface of said plate, wherein said center rib is aligned substantially parallel to each of said side ribs, wherein said center rib extends from a trailing edge of said plate to the ring rib; anda bore formed in each of said pair of side ribs and the center rib, each of said bores configured to receive a temperature measuring device therein. 5. The susceptor ring of claim 4, wherein said ring rib extends from said lower surface of said plate between about 0.1-1 inches. 6. The susceptor ring of claim 4, wherein said pair of side ribs extend from said lower surface of said plate substantially the same distance as said ring rib extends from said lower surface of said plate. 7. The susceptor ring of claim 4, wherein at least one of said pair of side ribs extends a distance from said lower surface of said plate different than a distance from which the other of said pair of side ribs or said ring rib extends from said lower surface of said plate. 8. The susceptor ring of claim 4, wherein said plate and said side ribs include a material selected from the group consisting of graphite, Silicon Carbide (SiC) and Silicon (Si). 9. The susceptor ring of claim 8, wherein said plate and side ribs are coated with Silicon Carbide (SiC). 10. The susceptor ring of claim 4, wherein said plate has a thickness from an upper surface to said lower surface of about 0.1-1 inch. 11. The susceptor ring of claim 4, wherein said pair of side ribs has a length and said bores extend into said side ribs at least half of said length of said side ribs. 12. The susceptor ring of claim 4, wherein said susceptor ring comprises only one piece of material. 13. A one-piece susceptor ring for use in a semiconductor processing tool comprising: a plate having an aperture formed therethrough, said plate having an upper surface and a lower surface;a first linear side rib integrally connected to said lower surface of said plate;a first bore formed in said first side rib;a second linear side rib integrally connected to said lower surface of said plate;a second bore formed in said second side rib;a linear center rib integrally connected to said lower surface of said plate, said center rib being located between said first and second side ribs;a third bore formed in said center rib; anda ring rib integrally connected to said lower surface of said plate, said ring rib located about said aperture,wherein said first side rib, said second side rib, and said center rib are aligned substantially parallel to each other, andwherein said center rib extends from a trailing edge of said plate to said ring rib. 14. The one-piece susceptor ring of claim 13, wherein said first side rib, and said second side rib, and said center rib are integrally connected to said ring rib. 15. The one-piece susceptor ring of claim 13, wherein each of said first bore, second bore and third bore includes an opening, said openings being located adjacent to a trailing edge of said plate. 16. The one-piece susceptor ring of claim 15, wherein an end opposite said opening of each of said first bore, second bore, and third bore is sealed. 17. A reactor for a semiconductor processing tool comprising: a reaction chamber defining a reaction space therein, the reaction chamber including a gas inlet and a gas outlet;a susceptor disposed within said reaction space; anda one-piece susceptor ring disposed about said susceptor, said susceptor ring having a leading edge directed toward the inlet, a trailing edge directed toward the outlet, a pair of opposing lateral edges, said susceptor ring including first, second, and third bores extending from the trailing edge toward the leading edge, the first bore positioned adjacent one of the lateral edges, the second bore positioned adjacent the other of the lateral edges, the third bore having an end adjacent a downstream edge of the susceptor, each of the bores being configured to receive at least one temperature measuring device,wherein each of said first bore and said second bore are substantially linear,wherein said first bore, said second bore, and said third bore are substantially parallel to each other, andwherein each of the at least one temperature measuring devices afeis wholly positioned downstream of the leading edge. 18. The reactor of claim 17, wherein said susceptor ring is formed of graphite. 19. The reactor of claim 17, wherein each of said bores comprises a blind hole.