초록 ▼

A laser beam having homogeneous intensity distribution is delivered without causing interference stripes of a laser to appear on an irradiation surface. A laser beam emitted from a laser oscillator passes through a diffractive optical element so that the intensity distribution thereof is homogenized

A laser beam having homogeneous intensity distribution is delivered without causing interference stripes of a laser to appear on an irradiation surface. A laser beam emitted from a laser oscillator passes through a diffractive optical element so that the intensity distribution thereof is homogenized. The beam emitted from the diffractive optical element then passes through a slit so that low-intensity end portions in a major-axis direction of the beam are blocked. Subsequently, the beam passes through a projecting lens and a condensing lens, so that an image of the slit is projected onto the irradiation surface. The projecting lens is provided so that the slit and the irradiation surface are conjugated. Thus, the irradiation surface can be irradiated with the laser having homogeneous intensity while preventing the diffraction by the slit.

대표청구항 ▼

1. A laser irradiation apparatus comprising: a laser oscillator;a beam homogenizer for homogenizing intensity distribution of a laser beam emitted from the laser oscillator;a slit for blocking an end portion of the laser beam in a major-axis direction;a projecting lens for projecting an image at the

1. A laser irradiation apparatus comprising: a laser oscillator;a beam homogenizer for homogenizing intensity distribution of a laser beam emitted from the laser oscillator;a slit for blocking an end portion of the laser beam in a major-axis direction;a projecting lens for projecting an image at the slit onto an irradiation surface; anda condensing lens for condensing the image at the slit on the irradiation surface,wherein the projecting lens acts in the major-axis direction of the laser beam,wherein the condensing lens comprises a spherical lens and a concave cylindrical lens,wherein the condensing lens acts in a minor-axis direction of the laser beam,wherein the concave cylindrical lens acts in the major-axis direction of the laser beam, andwherein the slit is provided between the beam homogenizer and the projecting lens. 2. The laser irradiation apparatus according to claim 1, wherein the beam homogenizer is a diffractive optical element. 3. The laser irradiation apparatus according to claim 1, wherein the projecting lens is a convex cylindrical lens or a convex spherical lens. 4. The laser irradiation apparatus according to claim 1, wherein the spherical lens is a convex spherical lens. 5. The laser irradiation apparatus according to claim 1, wherein 1/f=(1/d1)+(1/d2) and d1: d2=a:b are satisfied(a is a width of an opening portion of the slit, b is a length of a major axis of the laser beam on the irradiation surface, f is a focal length of the projecting lens, d1 is a distance from a surface of the slit on an emission side to a first principal point of the projecting lens, and d2 is a distance from a second principal point of the projecting lens to the irradiation surface). 6. The laser irradiation apparatus according to claim 1, wherein the laser beam emitted from the laser oscillator is selected from the group consisting of a Ti:sapphire laser, an Ar ion laser, and a laser using an optical fiber where said optical fiber is doped with one or more selected from Nd, Yb, Cr, Ti, Ho, Er, Tm, and Ta as a medium. 7. The laser irradiation apparatus according to claim 1, wherein the laser beam emitted from the laser oscillator is a laser using a material selected from the group consisting of a single-crystal YAG, a single-crystal YVO4, a single-crystal forsterite, a single-crystal YAlO3, a single-crystal GdVO4, a polycrystalline YAG, a polycrystalline Y2O3, a polycrystalline YVO4, a polycrystalline YAlO3, and a polycrystalline GdVO4. 8. The laser irradiation apparatus according to claim 1, wherein the laser beam is a higher harmonic converted by a non-linear optical element. 9. The laser irradiation apparatus according to claim 1, wherein an opening portion of the slit is adjusted by moving a blocking plate. 10. The laser irradiation apparatus according to claim 1, wherein the image at the slit and an image on the irradiation surface are in a conjugated relation by the projecting lens. 11. A laser irradiation apparatus comprising: a laser oscillator;a beam homogenizer for homogenizing intensity distribution of a laser beam emitted from the laser oscillator;a slit for blocking an end portion of the laser beam in a major-axis direction;a projecting lens for projecting an image at the slit onto an irradiation surface; anda condensing lens for condensing the image at the slit on the irradiation surface,wherein the projecting lens comprises a cylindrical lens,wherein the major-axis direction of the laser beam is perpendicular to a generatrix direction of the cylindrical lens,wherein the condensing lens comprises a spherical lens and a concave cylindrical lens,wherein the condensing lens acts in a minor-axis direction of the laser beam,wherein the concave cylindrical lens acts in the major-axis direction of the laser beam, andwherein the slit is provided between the beam homogenizer and the projecting lens. 12. The laser irradiation apparatus according to claim 11, wherein the beam homogenizer is a diffractive optical element. 13. The laser irradiation apparatus according to claim 11, wherein the projecting lens is a convex cylindrical lens. 14. The laser irradiation apparatus according to claim 11, wherein the spherical lens is a convex spherical lens. 15. The laser irradiation apparatus according to claim 11, wherein 1/f=(1/d1)+(1/d2) and d1: d2=a:b are satisfied(a is a width of an opening portion of the slit, b is a length of a major axis of the laser beam on the irradiation surface, f is a focal length of the projecting lens, d1 is a distance from a surface of the slit on an emission side to a first principal point of the projecting lens, and d2 is a distance from a second principal point of the projecting lens to the irradiation surface). 16. The laser irradiation apparatus according to claim 11, wherein the laser beam emitted from the laser oscillator is selected from the group consisting of a Ti:sapphire laser, an Ar ion laser, and a laser using an optical fiber where said optical fiber is doped with one or more selected from Nd, Yb, Cr, Ti, Ho, Er, Tm, and Ta as a medium. 17. The laser irradiation apparatus according to claim 11, wherein the laser beam emitted from the laser oscillator is a laser using a material selected from the group consisting of a single-crystal YAG, a single-crystal YVO4, a single-crystal forsterite, a single-crystal YAlO3, a single-crystal GdVO4, a polycrystalline YAG, a polycrystalline Y2O3, a polycrystalline YVO4, a polycrystalline YAlO3, and a polycrystalline GdVO4. 18. The laser irradiation apparatus according to claim 11, wherein the laser beam is a higher harmonic converted by a non-linear optical element. 19. The laser irradiation apparatus according to claim 11, wherein an opening portion of the slit is adjusted by moving a blocking plate. 20. The laser irradiation apparatus according to claim 11, wherein the image at the slit and an image on the irradiation surface are in a conjugated relation by the projecting lens. 21. The laser irradiation apparatus according to claim 1, further comprising a mirror between the projecting lens and the condensing lens. 22. The laser irradiation apparatus according to claim 11, further comprising a mirror between the projecting lens and the condensing lens.