초록 ▼

Methods and systems are provided for handling materials, including materials used in semiconductor manufacturing systems. The methods and systems include linear semiconductor processing facilities for vacuum-based semiconductor processing and handling, as well as linkable or extensible semiconductor

Methods and systems are provided for handling materials, including materials used in semiconductor manufacturing systems. The methods and systems include linear semiconductor processing facilities for vacuum-based semiconductor processing and handling, as well as linkable or extensible semiconductor processing facilities that can be flexibly configured to meet a variety of constraints.

대표청구항 ▼

1. A system comprising: a substantially linearly elongated transfer chamber having a first end and a second end;a plurality of processing modules connected to the substantially linearly elongated transfer chamber, each processing module performing one or more fabrication processes on a workpiece, th

1. A system comprising: a substantially linearly elongated transfer chamber having a first end and a second end;a plurality of processing modules connected to the substantially linearly elongated transfer chamber, each processing module performing one or more fabrication processes on a workpiece, the processing modules arranged for sequential processing of the workpiece in a sequence defining a substantially continuous linear sequence path extending between the first and second end of the substantially linearly elongated transfer chamber from a first processing module to a last processing module, the substantially linearly elongated transfer chamber being configured such that workpieces travel along the substantially continuous linear sequence path through the substantially linearly elongated transfer chamber for transfer between the processing modules; andat least one mid-entry point in the substantially linearly elongated transfer chamber disposed within the substantially continuous linear sequence path substantially in-line with and between the first processing module and the last processing module and between the first end and second end of the substantially linearly elongated transfer chamber so that the continuous linear sequence path extends through the at least one mid-entry point, the at least one mid-entry point configured to at least one of add, the workpiece to the substantially linear sequence path, and remove, the workpiece from the substantially linear sequence path, at the mid-entry point between the first end and second end of the substantially linearly elongated transfer chamber, wherein the mid-entry point is a module configured to cycle an atmosphere within the module between a processing atmosphere of at least one of the processing modules and an atmosphere external to the substantially linear sequence path and where the at least one of adding and removing the workpiece is substantially independent of the substantially continuous linear sequence path. 2. The system of claim 1, further comprising a controller for controlling the sequential processing. 3. The system of claim 2, wherein the controller is integrated with a visualization software program. 4. The system of claim 1, further comprising one or more mid-entry points, each mid-entry point positioned between two of the plurality of processing modules. 5. The system of claim 4, further comprising an air-based delivery system for delivering items to and from at least one of the one or more of mid-entry points. 6. The system of claim 4, wherein the workpiece is processed in a selected, sequential subset of the plurality of processing modules. 7. The system of claim 6, wherein the sequential subset includes a single processing module. 8. The system of claim 4, wherein at least one of one or more mid-entry points includes a load-lock facility having a heating element for heating the load-lock to mitigate condensation on the workpiece. 9. The system of claim 1, wherein the at least one mid-entry point includes a heating element operable to heat the workpiece to a temperature closer to an operating temperature of a vacuum environment of the plurality of processing modules. 10. The system of claim 1, wherein the plurality of processing modules are configured to maintain a vacuum environment, the at least on mid-entry point including a heating element operable to cool the workpiece to a temperature below an operating temperature of the vacuum environment and above the ambient temperature. 11. The system of claim 1, wherein the system is adapted to process the workpiece non-sequentially within the plurality of processing modules. 12. The system of claim 1, wherein the system is adapted to process the workpiece in a single one of the plurality of processing modules. 13. The system of claim 1, wherein the system is adapted to process a plurality of workpieces in parallel in the plurality of processing modules. 14. A system comprising: a substantially linearly elongated transfer chamber having a first end and a second end;a plurality of processing modules connected to the substantially linearly elongated transfer chamber, each processing module performing one or more fabrication processes on a workpiece, the processing modules arranged for sequential processing of the workpiece in a sequence defining a substantially continuous linear sequence path extending between the first and second end of the substantially linearly elongated transfer chamber from a first processing module to a last processing module, the substantially linearly elongated transfer chamber being configured such that workpieces travel along the substantially continuous linear sequence path through the substantially linearly elongated transfer chamber for transfer to the processing modules;a front entry module coupled to the first processing module at the beginning of the substantially continuous linear sequence path at one of the first end and second end, the front entry module being configured to allow introduction of workpieces for sequential processing; andat least one access module in the substantially linearly elongated transfer chamber disposed within the substantially continuous linear sequence path substantially in-line with and between the first processing module and the last processing module and between the first end and second end of the substantially linearly elongated transfer chamber so that the continuous linear sequence path extends through the at least one access module, the at least one access module configured to provide an exit point for the workpieces from the substantially continuous linear sequence path, wherein the at least one access module is configured to cycle an atmosphere within the access module between a processing atmosphere of at least one of the processing modules and an atmosphere external to the substantially continuous linear sequence path and the exit point allows removal of the workpieces substantially independent of the substantially continuous linear sequence path. 15. A system comprising: a substantially linearly elongated transfer chamber having a first end and a second end;a plurality of processing modules connected to the substantially linearly elongated transfer chamber, each processing module performing one or more fabrication processes on a workpiece, the processing modules arranged for sequential processing of the workpiece in a sequence defining a substantially continuous linear sequence path extending between the first and second end of the substantially linearly elongated transfer chamber from a first processing module to a last processing module, the substantially linearly elongated transfer chamber being configured such that workpieces travel along the substantially continuous linear sequence path through the substantially linearly elongated transfer chamber for transfer to the processing modules;a back exit module coupled to the last processing module of the substantially continuous linear sequence path at one of the first end and second end, the back exit module being configured to provide an exit point for workpieces from the substantially continuous linear sequence path; andat least one access module in the substantially linearly elongated transfer chamber disposed within the linear sequence path substantially in-line with and between the first processing module and the last processing module and between the first end and second end of the substantially linearly elongated transfer chamber so that the continuous linear sequence path extends through the at least one access module, the at least one access module configured to provide an entry point for the workpieces into the substantially continuous linear sequence path, wherein the at least one access module is configured to cycle an atmosphere within the access module between a processing atmosphere of at least one of the processing modules and an atmosphere external to the substantially continuous linear sequence path and the entry point allows entry of the workpieces substantially independent of the substantially continuous linear sequence path. 16. A system comprising: a substantially linearly elongated transfer chamber having a first end and a second end;a plurality of processing modules connected to the substantially linearly elongated transfer chamber, each processing module performing one or more fabrication processes on a workpiece, the processing modules arranged for sequential processing of the workpiece in a sequence defining a substantially continuous linear sequence path extending between the first and second end of the substantially linearly elongated transfer chamber from a first processing module to a last processing module, the substantially linearly elongated transfer chamber being configured such that workpieces travel along the substantially continuous linear sequence path through the substantially linearly elongated transfer chamber for transfer to the processing modules;a front exit module coupled to the first processing module of the substantially continuous linear sequence path at one of the first end and second end, the front exit module being configured to provide an exit point for workpieces from the substantially continuous linear sequence path; andat least one access module in the substantially linearly elongated transfer chamber disposed within the substantially continuous linear sequence path substantially in-line with and between the first processing module and the last processing module and between the first end and second end of the substantially linearly elongated transfer chamber so that the continuous linear sequence path extends through the at least one access module, the at least one access module configured to provide an entry point for the workpieces into the substantially continuous linear sequence path, wherein the at least one access module is configured to cycle an atmosphere within the access module between a processing atmosphere of at least one of the processing modules and an atmosphere external to the substantially continuous linear sequence path and the entry point allows entry of the workpieces substantially independent of the substantially continuous linear sequence path. 17. A system comprising: a substantially linearly elongated transfer chamber having a first end and a second end;a plurality of processing modules, each processing module performing one or more fabrication processes on a workpiece, the processing modules arranged for sequential processing of the workpiece in a sequence defining a substantially continuous linear sequence path extending between the first and second end of the substantially linearly elongated transfer chamber from a first processing module to a last processing module, the substantially linearly elongated transfer chamber being configured such that workpieces travel along the substantially continuous linear sequence path through the substantially linearly elongated transfer chamber for transfer to the processing modules, where the first processing module is located at the first end of the substantially linearly elongated transfer chamber and the last processing module is located at the second end of the substantially linearly elongated transfer chamber, and the first processing module and the second processing module are configured to allow workpieces to enter or exit the substantially continuous linear sequence path; andat least one access module in the substantially linearly elongated transfer chamber disposed between the first end and second end within the substantially continuous linear sequence path substantially in-line with and between the first processing module and the last processing module so that the continuous linear sequence path extends through the at least one access module, the at least one access module configured to allow workpieces to enter or exit the substantially continuous linear sequence path at a point between the first processing module and the last processing module, where the at least one access module is configured to cycle an atmosphere within the access module between a processing atmosphere of at least one of the processing modules and an atmosphere external to the substantially continuous linear sequence path and the entry or exit of the workpieces through the at least one access module is substantially independent of the substantially continuous linear sequence path;wherein, workpieces enter the substantially continuous linear sequence path from one of the first processing module, second processing module and the at least one access module and exit the substantially continuous linear sequence path from a different one of the first processing module, second processing module and the at least one access module. 18. A system comprising: a substantially linearly elongated transfer chamber having a first end and a second end;a plurality of processing modules connected to the substantially linearly elongated transfer chamber, each processing module performing one or more fabrication processes on a workpiece, the processing modules arranged for sequential processing of the workpiece in a sequence defining a substantially continuous linear sequence path extending between the first and second end of the substantially linearly elongated transfer chamber from a first processing module located at the first end of the substantially linearly elongated transfer chamber to a last processing module located at the second end of the substantially linearly elongated transfer chamber, the substantially linearly elongated transfer chamber being configured such that workpieces travel along the substantially continuous linear sequence path through the substantially linearly elongated transfer chamber for transfer to the processing modules; and at least one mid-entry point in the substantially linearly elongated transfer chamber disposed within the substantially linear sequence path substantially in-line with and between the first processing module and the last processing module and between the first end and second end of the substantially linearly elongated transfer chamber so that the continuous linear sequence path extends through the at least one mid-entry point, the at least one mid-entry point configured to at least one of add the workpiece to the substantially linear sequence path and remove the workpiece from the substantially linear sequence path at the mid-entry point substantially independent of the substantially continuous linear sequence path. 19. A system comprising: a substantially linearly elongated transfer chamber having a first end and a second end;a plurality of processing modules connected to the substantially linearly elongated transfer chamber, each processing module performing one or more fabrication processes on a workpiece, the processing modules arranged for sequential processing of the workpiece in a sequence defining a substantially continuous linear sequence path extending between the first and second end of the substantially linearly elongated transfer chamber from a first processing module to a last processing module, the substantially linearly elongated transfer chamber being configured such that workpieces travel along the substantially continuous linear sequence path through the substantially linearly elongated transfer chamber for transfer to the processing modules; andat least one mid-entry point in the substantially linearly elongated transfer chamber disposed within the substantially linear sequence path substantially in-line with and between the first processing module and the last processing module and between the first end and second end of the substantially linearly elongated transfer chamber so that the continuous linear sequence path extends through the at least one mid-entry point, where the mid-entry point is a module that forms an opening within the substantially linear sequence path through which the workpiece is at least one of added, to the substantially linear sequence path, and removed, from the substantially linear sequence path, at the mid-entry point substantially independent of the substantially linear sequence path.