초록 ▼

A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive

A particle beam microscope comprises a magnetic lens 3 having an optical axis 53 and a pole piece 21. An object 5 to be examined is mounted at a point of intersection 51 between an optical axis 53 and the object plane 19. First and second X-ray detectors 33 have first and second radiation-sensitive substrates 35 arranged such that a first elevation angle β1 between a first straight line 551 extending through the point of intersection 51 and a center of the first substrate 351 and the object plane 19 differs from a second elevation angle β2 between a second straight line 552 extending through the point of intersection 51 and a center of the second substrate 352 and the object plane 19 by more than 14°.

대표청구항 ▼

1. A particle beam microscope having a beam path, the microscope comprising: a magnetic lens having an optical axis and at least one front pole piece arranged in the beam path along the optical axis at a distance upstream of an object plane;an object holder, which is configured for mounting an objec

1. A particle beam microscope having a beam path, the microscope comprising: a magnetic lens having an optical axis and at least one front pole piece arranged in the beam path along the optical axis at a distance upstream of an object plane;an object holder, which is configured for mounting an object to be inspected at a point of intersection between the optical axis and the object plane;a vacuum enclosure defining a vacuum space and having an opening, wherein the front pole piece of the magnetic lens and the object are located within the vacuum space; andan X-ray detection unit;wherein the X-ray detection unit comprises:a detector mount;a first X-ray detector mounted on the detector mount and having a first radiation-sensitive substrate;a second X-ray detector mounted on a detector mount and having a second radiation-sensitive substrate;a flange mounted on and sealed against the vacuum enclosure, wherein the flange carries the detector mount such that at least one of a portion of the flange and the detector mount extend through the opening of the vacuum enclosure;wherein the first and second X-ray detectors are arranged such that a first elevation angle between a first straight line extending through the point of intersection and a center of the first substrate and the object plane differs from a second elevation angle between a second straight line extending through the point of intersection and a center of the second substrate and the object plane by more than 14°; andwherein the flange and the opening have a diameter such that the X-ray detection unit can be removed from the particle beam microscope without dismantling the vacuum enclosure. 2. The particle beam microscope according to claim 1, wherein a central axis of the flange is oriented towards the point of intersection between the optical axis and the object plane. 3. The particle beam microscope according to claim 2, wherein a central axis of the flange intersects the point of intersection between the optical axis and the object plane. 4. The particle beam microscope according to claim 1, wherein the first elevation angle is within a range from −45° to −7° and the second elevation angle is within a range from +7° to +45°. 5. The particle beam microscope according to claim 4, wherein a distance of the first and second radiation-sensitive substrates from the point of intersection is between 12 mm and 20 mm. 6. The particle beam microscope according to claim 5, wherein a distance of the first and second radiation-sensitive substrates from the point of intersection is less than 12 mm. 7. The particle beam microscope according to claim 1, wherein the X-ray detection unit further comprises: a third X-ray detector mounted on the detector mount and having a third radiation-sensitive substrate, and a fourth X-ray detector mounted on the detector mount and having a fourth radiation-sensitive substrate. 8. The particle beam microscope according to claim 7, wherein the third and first X-ray detectors are arranged such that a first circumferential angle about the optical axis between a third straight line extending through the point of intersection and a center of the third substrate and the first straight line is greater than 14°; and wherein the fourth and second X-ray detectors are arranged such that a second circumferential angle about the optical axis between a fourth straight line extending through the point of intersection and a center of the fourth substrate and the second straight line is greater than 14°. 9. The particle beam microscope according to claim 8, wherein a third elevation angle between the third straight line and the object plane is equal to the first elevation angle; and wherein a fourth elevation angle between the fourth straight line and the object plane is equal to the second elevation angle. 10. The particle beam microscope according to claim 1, wherein the detector mount is displaceable relative to the flange such that the first and second X-ray detectors are displaceable from a measuring position near the point of intersection to a parking position farther away from the point of intersection. 11. The particle beam microscope according to claim 10, further comprising a displaceable shutter plate which is arranged between the first and second radiation-sensitive substrates and the point of intersection when the first and second X-ray detectors are positioned in the parking position, and which is not arranged between the first and second radiation-sensitive substrates and the point of intersection when the first and second X-ray detectors are positioned in the measuring position. 12. The particle beam microscope according to claim 10, wherein a distance of the first and second radiation-sensitive substrates from the point of intersection is between 12 mm and 20 mm when the first and second X-ray detectors are positioned in the measuring position. 13. The particle beam microscope according to claim 10, wherein a distance of the first and second radiation-sensitive substrates from the point of intersection is less than 12 mm when the first and second X-ray detectors are positioned in the measuring position. 14. The particle beam microscope according to claim 1, wherein the first and second substrates each have a substrate area of greater than 5 mm2. 15. The particle beam microscope according to claim 1, wherein the first and second radiation-sensitive substrates each have a substrate area of less than 50 mm2. 16. The particle beam microscope according to claim 1, wherein the first and second X-ray detectors are silicon drift detectors. 17. The particle beam microscope according to claim 1, wherein the first and second X-ray detectors comprises at least one Peltier element configured to cool the radiation-sensitive substrate. 18. The particle beam microscope according to claim 1, wherein the magnetic lens comprises a rear pole piece arranged in the beam path downstream of the object plane at a distance of less than 50 mm from the object plane. 19. The particle beam microscope according to claim 1, wherein the microscope comprises plural X-ray detection units distributed about the optical axis; wherein the vacuum enclosure has plural openings; andwherein at least one of a portion of the flange and the detector mount of each of the plural X-ray detection units extend through one of the plural openings of the vacuum enclosure.