Embodiments disclosed herein generally relate to an HVPE chamber. The chamber may have two separate precursor sources coupled thereto to permit two separate layers to be deposited. For example, a gallium source and a separate aluminum source may be coupled to the processing chamber to permit gallium
Embodiments disclosed herein generally relate to an HVPE chamber. The chamber may have two separate precursor sources coupled thereto to permit two separate layers to be deposited. For example, a gallium source and a separate aluminum source may be coupled to the processing chamber to permit gallium nitride and aluminum nitride to be separately deposited onto a substrate in the same processing chamber. The nitrogen may be introduced to the processing chamber at a separate location from the gallium and the aluminum and at a lower temperature. The different temperatures causes the gases to mix together, react and deposit on the substrate with little or no deposition on the chamber walls.
대표청구항▼
1. An apparatus for substrate processing, comprising: a vacuum chamber body; a first precursor source disposed adjacent to the vacuum chamber body and coupled to the vacuum chamber body, the first precursor source comprising: a first precursor source body; a first support liner disposed in the first
1. An apparatus for substrate processing, comprising: a vacuum chamber body; a first precursor source disposed adjacent to the vacuum chamber body and coupled to the vacuum chamber body, the first precursor source comprising: a first precursor source body; a first support liner disposed in the first precursor source body; a float liner coupled to the first support liner and disposed in the first precursor source body; and a float disposed in the first precursor source body and movable from a first position spaced a first distance from the float liner to a second position spaced a second distance from the float liner, the first distance greater than the second distance; and a second precursor source disposed adjacent the vacuum chamber body and coupled to the vacuum chamber body, the second precursor source separate from the first precursor source. 2. The apparatus of claim 1, wherein the first support liner comprises quartz. 3. The apparatus of claim 2, wherein the float liner comprises pyrolytic boron nitride. 4. The apparatus of claim 3, wherein the float comprises pyrolytic boron nitride. 5. The apparatus of claim 1, wherein the float has a plurality of grooves formed therein that face the float liner. 6. The apparatus of claim 5, wherein the plurality of grooves include: a center trunk groove extending in a radial direction from the substantial edge of the float; andone or more circular grooves extending from the center trunk groove. 7. The apparatus of claim 1, wherein the float liner comprises a center wall that extends substantially perpendicular to a bottom surface of the float liner, wherein the float comprises a central flange extending substantially parallel to the center wall of the float liner, and wherein the center wall of the float liner is disposed within the central flange of the float. 8. An apparatus for substrate processing, comprising: a vacuum chamber body; a first precursor source disposed adjacent to the vacuum chamber body and coupled to the vacuum chamber body, the first precursor source comprising: a first precursor source body; a first support liner disposed in the first precursor source body; and a showerhead disposed in the first precursor body and coupled to the first support liner; and a second precursor source disposed adjacent the vacuum chamber body and coupled to the vacuum chamber body, the second precursor source separate from the first precursor source. 9. The apparatus of claim 8, wherein the first support liner comprises quartz. 10. The apparatus of claim 9, wherein the showerhead comprises a ceramic material. 11. The apparatus of claim 8, wherein the showerhead comprises a showerhead body having a plurality of circular first grooves formed therein that each have a first width. 12. The apparatus of claim 11, wherein the showerhead body wherein each first groove has a second groove formed therein that has a second width that is less than the first width. 13. The apparatus of claim 12, wherein the showerhead body has one or more openings extending through the showerhead body from the second groove. 14. An apparatus for substrate processing, comprising: a vacuum chamber body; a first precursor source disposed adjacent to the vacuum chamber body and coupled to the vacuum chamber body, the first precursor source comprising: a first precursor source body; a first support liner disposed in the first precursor source body; a float liner coupled to the first support liner and disposed in the first precursor source body; and a float disposed in the first precursor source body and movable from a first position spaced a first distance from the float liner to a second position spaced a second distance from the float liner, the first distance greater than the second distance; and a second precursor source disposed adjacent the vacuum chamber body and coupled to the vacuum chamber body, the second precursor source separate from the first precursor source, the second precursor source comprising: a second precursor source body; a second support liner disposed in the first precursor source body; and a showerhead disposed in the first precursor body and coupled to the first support liner. 15. The apparatus of claim 14, wherein the first support liner comprises quartz, the float liner comprises pyrolytic boron nitride and the float comprises pyrolytic boron nitride. 16. The apparatus of claim 14, wherein the float has a plurality of grooves formed therein that face the float liner. 17. The apparatus of claim 16, wherein the plurality of grooves include: a center trunk groove extending in a radial direction from the substantial edge of the float; andone or more circular grooves extending from the center trunk groove. 18. The apparatus of claim 17, wherein the float liner comprises a center wall that extends substantially perpendicular to a bottom surface of the float liner, wherein the float comprises a central flange extending substantially parallel to the center wall of the float liner, and wherein the center wall of the float liner is disposed within the central flange of the float. 19. The apparatus of claim 14, wherein the first support liner comprises quartz and the showerhead comprises a ceramic material. 20. The apparatus of claim 14, wherein the showerhead comprises a showerhead body having a plurality of circular first grooves formed therein that each have a first width, wherein the showerhead body wherein each first groove has a second groove formed therein that has a second width that is less than the first width and wherein the showerhead body has one or more openings extending through the showerhead body from the second groove.
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