IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0740788
(2008-11-02)
|
등록번호 |
US-8508128
(2013-08-13)
|
우선권정보 |
IL-187107 (2007-11-01); IL-192228 (2008-06-16) |
국제출원번호 |
PCT/IL2008/001438
(2008-11-02)
|
§371/§102 date |
20101012
(20101012)
|
국제공개번호 |
WO2009/057122
(2009-05-07)
|
발명자
/ 주소 |
|
출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
0 인용 특허 :
23 |
초록
▼
In accordance with an aspect of the invention, there is provided a thermal radiation marker (10) adapted to emit radiation within the thermal portion of the infrared spectrum. According to some embodiments of the invention, the thermal radiation marker may include an incandescent filament (16) and a
In accordance with an aspect of the invention, there is provided a thermal radiation marker (10) adapted to emit radiation within the thermal portion of the infrared spectrum. According to some embodiments of the invention, the thermal radiation marker may include an incandescent filament (16) and a glass or quartz enclosure (12). The incandescent filament may be adapted to produce radiation at least within the thermal portion of the infrared spectrum. The glass or quartz enclosure may include at least a portion that is substantially thin, and may enclose pressurized inert (14) gas and the incandescent filament surrounded by the inert gas. At least a portion of the glass or quartz enclosure may be sufficiently thin so as to enable good transmittance therethrough for tli3rmal radiation approximately in the 3-5&mgr,-m wavelength band. The pressurized inert gas enclosed within the glass or quartz enclosure and surrounding the incandescent filament may enable a regenerative cycle to take place within the enclosure.
대표청구항
▼
1. A thermal radiation marker, comprising: an enclosure, made of glass or quartz;an incandescent filament for producing radiation at least within the thermal portion of the infrared spectrum;pressurized inert gas, wherein the pressurized inert gas and the incandescent filament are enclosed in the en
1. A thermal radiation marker, comprising: an enclosure, made of glass or quartz;an incandescent filament for producing radiation at least within the thermal portion of the infrared spectrum;pressurized inert gas, wherein the pressurized inert gas and the incandescent filament are enclosed in the enclosure, and the incandescent filament is surrounded by the inert gas; andat least a portion of the glass or quartz enclosure having a thickness of 1 mm or less provides good transmittance therethrough for thermal radiation in 3-5 μm wavelength band, andduring operation of the thermal radiation marker, the glass or quartz enclosure provides a significant radiance within 8-14 μm wavelength band. 2. The thermal radiation marker according to claim 1, wherein the glass or quartz enclosure is usable, including by virtue of its thickness, providing good transmittance therethrough for thermal radiation within the 3.4-4.8 μm atmospheric window. 3. The thermal radiation marker according to claim 1, wherein the thickness of at least a portion of the glass or quartz enclosure is 0.5 mm or less. 4. The thermal radiation marker according to claim 1, wherein the glass or quartz enclosure has reflective or absorptive particles incorporated thereinto, or the glass or quartz enclosure is coated with reflective or absorptive particles, and the reflective or absorptive particles are provided to increase the reflectance or absorption of the enclosure for radiation outside the 3-5 μm wavelength band, wherein the enclosure is provided to prevent a substantial portion of radiation within any one or more of the following bands to pass therethrough: the UV wavelength range (0.3-0.4 μm),the visible wavelength range (0.4-0.7 μm),the Near Infrared (NIR) wavelength range (0.7-1.0 μm),the Short Wave Infrared (SWIR) wavelength range (1-3 μm). 5. The thermal radiation marker according to claim 4, where during operation of the incandescent filament, an outer envelope of the enclosure reaches a temperature of at least 200° C. 6. The thermal radiation marker according to claim 1, further comprising a controller that is adapted to modulate a current which drives the incandescent filament at a rate between 0.2 Hz to 5 Hz, thereby pulsating the thermal radiation marker's output at least within the 3-5 μm wavelength band. 7. The thermal radiation marker according to claim 6, wherein said controller is adapted to pulsate the thermal radiation marker's output at least within the 3-5 μm wavelength band by causing the drive current that is applied to said incandescent filament to module between a maximum value and a minimum value. 8. The thermal radiation marker according to claim 7, wherein said minimum value is approximately half of said maximum value. 9. The thermal radiation marker according to claim 6, wherein said incandescent filament is characterized by an effective area of approximately 2.4 mm2 and emissivity of approximately 0.9. 10. The thermal radiation marker according to claim 9, wherein said incandescent filament is heated to approximately 3100° C. 11. The thermal radiation marker according to claim 1, wherein at least a portion of the enclosure is transparent to at least a portion of the visible light spectrum, and wherein said thermal radiation marker further includes a removable cover that is optically aligned with the portion of the enclosure that is transparent to at least a portion of the visible light spectrum, to thereby enable an operator of the marker to selectively expose the portion of the enclosure that is transparent to at least a portion of the visible light spectrum. 12. The thermal radiation marker according to claim 1, wherein the conditions within the enclosure enable a regenerative cycle. 13. The radiation marker according to claim 12, wherein said incandescent filament includes Tungsten and said inert gas includes Halogen, and wherein said regenerative cycle is a Halogen cycle. 14. The thermal radiation marker according to claim 12, further comprising a controller, which is adapted to control said filament in a manner to cause the filament to reach temperatures higher than a free-air oxidization temperature of the filament. 15. The thermal radiation marker according to claim 14, wherein said controller is adapted to cause said filament to reach temperatures well beyond 2000° C., and wherein the regenerative cycle substantially reduces degradation of the filament, thereby extending its service time. 16. The thermal radiation marker according to claim 15, further comprising a semiconductor electro-optical unit which is provided to emit radiation at least within the 8-14 μm wavelength band. 17. The thermal radiation marker according to claim 16, where said semiconductor electro-optical device is a Quantum Cascade Laser. 18. A runway illumination apparatus comprising: an; enclosure, made of glass or quartz;an incandescent filament for producing radiation at least within the thermal portion of the infrared spectrum;pressurized inert gas, wherein the pressurized inert gas and the incandescent filament are enclosed in the enclosure, and the incandescent filament is surrounded by the inert gas; andat least a portion of the glass or quartz enclosure having a thickness of 1 mm or less, providing good transmittance therethrough for thermal radiation in 3-5 μm wavelength band, andduring operation of the runway illumination apparatus, the glass or quartz enclosure provides a significant radiance within the 8-14 μm wavelength band. 19. The apparatus according to claim 18, wherein the glass or quartz enclosure is usable, by virtue of its thickness, providing good transmittance therethrough for thermal radiation within 3.4-4.8 μm atmospheric window. 20. The apparatus according to claim 18, wherein the thickness of at least a portion of the glass or quartz emission aperture is 0.5 mm or less.
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