초록 ▼

The present invention provides a reactor and a method for the production of high purity silicon granules. The reactor includes a reactor chamber; and the reaction chamber is equipped with a solid feeding port, auxiliary gas inlet, raw material gas inlet, and exhaust gas export. The reaction chamber

The present invention provides a reactor and a method for the production of high purity silicon granules. The reactor includes a reactor chamber; and the reaction chamber is equipped with a solid feeding port, auxiliary gas inlet, raw material gas inlet, and exhaust gas export. The reaction chamber is also equipped with an internal gas distributor; a heating unit; an external exhaust gas processing unit connected between a preheating unit and a gas inlet. The reaction chamber is further equipped with a surface finishing unit, a heating unit and a dynamics generating unit. The reaction is through decomposition of silicon containing gas in densely stacked high purity granular silicon layer reaction bed in relative motion, and to use remaining hear of exhaust gas for reheating. The present invention is to achieve a large scale, efficient, energy saving, continuous, low cost production of high purity silicon granules.

대표청구항 ▼

1. A reactor for the production of high purity granular silicon from particles that include large silicon particles, comprising: at least one reaction chamber system comprising a reaction chamber equipped with a solid feeding port for feeding a plurality of high purity granular silicon particles int

1. A reactor for the production of high purity granular silicon from particles that include large silicon particles, comprising: at least one reaction chamber system comprising a reaction chamber equipped with a solid feeding port for feeding a plurality of high purity granular silicon particles into the reaction chamber, an auxiliary gas inlet, a raw material gas inlet; and an exhaust gas outlet; wherein said reaction chamber is configured to allow said high purity granular silicon particles received inside the chamber to form a densely packed bed layer;wherein the reaction chamber has: (a) a wall portion comprising a gas distributor wall portion for the dispersion of at least one of an auxiliary gas comprising H2 or an inert gas and a raw material gas comprising a high purity silicon containing gas, through (and/or the extraction gas from) at least a portion of the densely packed bed layer inside the reaction chamber; the gas distributor being effective for preventing deposition on internal walls of the reaction chamber; and (b) a heating unit configured to provide heat to at least a portion of the densely packed bed layer,wherein the heating unit comprises an electric power supply configured to apply a voltage to at least a portion of the densely packed bed layer to effect electric resistance heating of the granular silicon particles; andwherein the wall portion of the reaction chamber further comprises at least one pair of electrode plates, for applying a current to the densely packed bed layer. 2. The reactor of claim 1, further comprising a preheating unit configured to receive the high purity granular silicon particles from the solid feeding port, and to allow the particles to form a densely packed bed layer; and said preheating unit being connected to the exhaust gas outlet to allow the exhaust gas to pass through the bed layer of the preheating unit for heating the particles in the bed layer and for separation and collection of high purity powder in the exhaust gas. 3. The reactor of claim 1, wherein said reaction chamber has at least two distributor wall portions disposed at opposite sides of the reaction chamber to allow gas cross-flow through the reaction chamber. 4. The reactor of claim 1, further comprising a pulverization device for breaking at least some of the silicon particles into smaller ones by rapidly heating the particles in vacuum or an inert gas. 5. The reactor of claim 1, wherein the reaction chamber has at least one generally cone shaped lower portion to allow the high purity granular silicon particles received inside the reaction chamber to form the densely packed bed layer with a filling rate greater than 50%. 6. The reactor of claim 1, wherein said distributor wall portion is adjacent to the heating unit. 7. The reactor of claim 1, wherein the gas distributor wall portion of the reaction chamber comprises one or more of high purity silicon, high purity silicon carbide, high purity silicon nitride, quartz or graphite.