초록 ▼

A self healing high energy glass capacitor is provided. The capacitor can have a glass layer with a top surface and a bottom surface. A top sacrificial layer can extend across the top surface and a bottom sacrificial layer can extend across the bottom surface. In addition, a top electrode can extend

A self healing high energy glass capacitor is provided. The capacitor can have a glass layer with a top surface and a bottom surface. A top sacrificial layer can extend across the top surface and a bottom sacrificial layer can extend across the bottom surface. In addition, a top electrode can extend across the top sacrificial layer and a bottom electrode can extend across the bottom sacrificial layer. In some instances the glass capacitor has an energy breakdown of at least 6 joules per cubic centimeter.

대표청구항 ▼

1. A self healing high energy glass capacitor comprising: an alkali-free glass layer having a top surface and a bottom surface;a top sacrificial layer extending across and in contact with said top surface;a bottom sacrificial layer extending across and in contact with said bottom surface;a top elect

1. A self healing high energy glass capacitor comprising: an alkali-free glass layer having a top surface and a bottom surface;a top sacrificial layer extending across and in contact with said top surface;a bottom sacrificial layer extending across and in contact with said bottom surface;a top electrode extending across said top sacrificial layer;a bottom electrode extending across said bottom sacrificial layer; andupon energy breakdown of said alkali-free glass layer at least one of said top sacrificial layer and said bottom sacrificial layer have a self healing property selected from the group consisting of selective ablation to promote self healing of said alkali-free glass layer, redox reacting to promote self healing of said alkali-free glass layer, and exothermic reacting to enhancing evaporation or phase change of at least one of said top electrode and said bottom electrode to clear a region around a failure location/defect and aiding in electrode removal from said fault region;said glass capacitor has an energy breakdown of at least 6 joules per cubic centimeter. 2. The high energy glass capacitor of claim 1, wherein said glass layer has a thickness of between 1 and 100 microns, inclusive. 3. The high energy glass capacitor of claim 1, wherein said top sacrificial layer and said bottom sacrificial layer has a thickness of between 10 nanometers and 5 microns, inclusive. 4. The high energy glass capacitor of claim 3, wherein said top sacrificial layer and/or said bottom sacrificial layer is an inorganic compound. 5. The high energy glass capacitor of claim 4, wherein said inorganic compound is selected from a group consisting of a metal oxide, a metal nitride, metal nitride/oxynitride, carbide, carbide/oxynitride and combinations thereof. 6. The high energy glass capacitor of claim 3, wherein said top sacrificial layer and/or said bottom sacrificial layer is a carbonaceous and/or graphitic compound. 7. The high energy glass capacitor of claim 3, wherein said top sacrificial layer and/or said bottom sacrificial layer is a polymer. 8. The high energy glass capacitor of claim 1, further comprising an interfacial bond layer between said glass layer and said top sacrificial layer and/or said bottom sacrificial layer. 9. The high energy glass capacitor of claim 8, wherein said interfacial bond layer contains a polar molecule. 10. The high energy glass capacitor of claim 9, wherein said polar molecule is selected from a group consisting of a high polar molecule and a low polar molecule. 11. The high energy glass capacitor of claim 9, wherein said polar molecule is selected from a group consisting of 3-aminopropyl-triethoxysilane (APTES) and heptadecafluoro-1,1,2,2-tetrahydrodecyltrimethoxysilane (HTDF). 12. The high energy glass capacitor of claim 8, wherein said interfacial bond layer is a polymer. 13. The high energy glass capacitor of claim 12, wherein said polymer is bonded to said glass layer using an interfacial silane coupling agent. 14. The high energy glass capacitor of claim 12, wherein said interfacial silane coupling agent is 3-mercapto-propyl-trimethoxy-silane (MPTMS). 15. The high energy glass capacitor of claim 1, wherein said top surface and/or said bottom surface of said alkali-free glass layer has a root mean square (RMS) surface roughness of less than 10 nm. 16. The high energy glass capacitor of claim 1, wherein said top surface and/or said bottom surface of said alkali-free glass layer has an RMS surface roughness of less than 6 nm. 17. The high energy glass capacitor of claim 1, wherein said top surface and/or said bottom surface of said alkali-free glass layer has an RMS surface roughness of less than 5 nm. 18. The high energy glass capacitor of claim 1, wherein said top surface and/or said bottom surface of said alkali-free glass layer has an RMS surface roughness of less than 4 mm.