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Remote plasma burn-in 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H01L-021/31
출원번호 US-0527877 (2012-06-20)
등록번호 US-8551891 (2013-10-08)
발명자 / 주소
  • Liang, Jingmei
  • Ji, Lili
  • Ingle, Nitin K.
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Kilpatrick Townsend & Stockton LLP
인용정보 피인용 횟수 : 73  인용 특허 : 164

초록

Methods of treating the interior of a plasma region are described. The methods include a preventative maintenance procedure or the start-up of a new substrate processing chamber having a remote plasma system. A new interior surface is exposed within the remote plasma system. The (new) interior surfa

대표청구항

1. A method of treating a remote plasma system fluidly coupled to a substrate processing region of a substrate processing chamber, the method comprising the sequential steps of: (1) flowing a hydrogen-containing precursor into the remote plasma system while forming a first plasma in the remote plasm

이 특허에 인용된 특허 (164)

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